Handbook of thin-film deposition processes and techniques: principles, methods, equipment and applications
Gespeichert in:
Bibliographische Detailangaben
Format: Elektronisch E-Book
Sprache:English
Veröffentlicht: Norwich, N.Y. Noyes Publications/William Andrew Pub. c2002
Ausgabe:2nd ed
Schriftenreihe:Materials science and process technology series
Schlagworte:
Online-Zugang:Volltext
Beschreibung:The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials
Includes bibliographical references and index
Beschreibung:1 Online-Ressource (xxviii, 629 p.)
ISBN:1591241936
9781591241935
9780815517788
0815517785
9780815514428
0815514425
9780815517764
0815517769

Es ist kein Print-Exemplar vorhanden.

Fernleihe Bestellen Achtung: Nicht im THWS-Bestand! Volltext öffnen