Optical lithography: here is why
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE Press
2010
|
| Schriftenreihe: | SPIE Press monograph
190 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Literaturangaben |
| Beschreibung: | XIV, 477 S. Ill., graph. Darst. |
| ISBN: | 9780819475602 |
Internformat
MARC
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| 010 | |a 2009049350 | ||
| 020 | |a 9780819475602 |9 978-0-8194-7560-2 | ||
| 035 | |a (OCoLC)699658631 | ||
| 035 | |a (DE-599)GBV613999207 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
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| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 100 | 1 | |a Lin, Burn Jeng |d 1942- |e Verfasser |0 (DE-588)143761455 |4 aut | |
| 245 | 1 | 0 | |a Optical lithography |b here is why |c Burn J. Lin |
| 264 | 1 | |a Bellingham, Wash. |b SPIE Press |c 2010 | |
| 300 | |a XIV, 477 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a SPIE Press monograph |v 190 | |
| 500 | |a Literaturangaben | ||
| 650 | 0 | 7 | |a Maskentechnik |0 (DE-588)4125845-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Laserstrahlätzen |0 (DE-588)4568583-6 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 0 | 1 | |a Laserstrahlätzen |0 (DE-588)4568583-6 |D s |
| 689 | 0 | 2 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |D s |
| 689 | 0 | 3 | |a Maskentechnik |0 (DE-588)4125845-9 |D s |
| 689 | 0 | |5 DE-604 | |
| 830 | 0 | |a SPIE Press monograph |v 190 |w (DE-604)BV011462585 |9 190 | |
| 856 | 4 | |m DE-601 |q pdf/application |u http://www.gbv.de/dms/ilmenau/toc/613999207.PDF |3 Inhaltsverzeichnis | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-027457851 | ||
Datensatz im Suchindex
| _version_ | 1804152431147220992 |
|---|---|
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| author | Lin, Burn Jeng 1942- |
| author_GND | (DE-588)143761455 |
| author_facet | Lin, Burn Jeng 1942- |
| author_role | aut |
| author_sort | Lin, Burn Jeng 1942- |
| author_variant | b j l bj bjl |
| building | Verbundindex |
| bvnumber | BV042016067 |
| classification_rvk | ZN 4170 |
| ctrlnum | (OCoLC)699658631 (DE-599)GBV613999207 |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV042016067 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T01:10:36Z |
| institution | BVB |
| isbn | 9780819475602 |
| language | English |
| lccn | 2009049350 |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027457851 |
| oclc_num | 699658631 |
| open_access_boolean | |
| owner | DE-83 |
| owner_facet | DE-83 |
| physical | XIV, 477 S. Ill., graph. Darst. |
| publishDate | 2010 |
| publishDateSearch | 2010 |
| publishDateSort | 2010 |
| publisher | SPIE Press |
| record_format | marc |
| series | SPIE Press monograph |
| series2 | SPIE Press monograph |
| spelling | Lin, Burn Jeng 1942- Verfasser (DE-588)143761455 aut Optical lithography here is why Burn J. Lin Bellingham, Wash. SPIE Press 2010 XIV, 477 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier SPIE Press monograph 190 Literaturangaben Maskentechnik (DE-588)4125845-9 gnd rswk-swf Laserstrahlätzen (DE-588)4568583-6 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s Laserstrahlätzen (DE-588)4568583-6 s Halbleitertechnologie (DE-588)4158814-9 s Maskentechnik (DE-588)4125845-9 s DE-604 SPIE Press monograph 190 (DE-604)BV011462585 190 DE-601 pdf/application http://www.gbv.de/dms/ilmenau/toc/613999207.PDF Inhaltsverzeichnis |
| spellingShingle | Lin, Burn Jeng 1942- Optical lithography here is why SPIE Press monograph Maskentechnik (DE-588)4125845-9 gnd Laserstrahlätzen (DE-588)4568583-6 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Halbleitertechnologie (DE-588)4158814-9 gnd |
| subject_GND | (DE-588)4125845-9 (DE-588)4568583-6 (DE-588)4191584-7 (DE-588)4158814-9 |
| title | Optical lithography here is why |
| title_auth | Optical lithography here is why |
| title_exact_search | Optical lithography here is why |
| title_full | Optical lithography here is why Burn J. Lin |
| title_fullStr | Optical lithography here is why Burn J. Lin |
| title_full_unstemmed | Optical lithography here is why Burn J. Lin |
| title_short | Optical lithography |
| title_sort | optical lithography here is why |
| title_sub | here is why |
| topic | Maskentechnik (DE-588)4125845-9 gnd Laserstrahlätzen (DE-588)4568583-6 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Halbleitertechnologie (DE-588)4158814-9 gnd |
| topic_facet | Maskentechnik Laserstrahlätzen Lithografie Halbleitertechnologie Halbleitertechnologie |
| url | http://www.gbv.de/dms/ilmenau/toc/613999207.PDF |
| volume_link | (DE-604)BV011462585 |
| work_keys_str_mv | AT linburnjeng opticallithographyhereiswhy |