Atomic layer deposition for semiconductors:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
New York [u.a.]
Springer
2014
|
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis Abstract |
| Beschreibung: | X, 263 S. Ill., graph. Darst. |
| ISBN: | 9781461480532 |
Internformat
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Datensatz im Suchindex
| _version_ | 1804151557687607296 |
|---|---|
| adam_text | ATOMIC LAYER DEPOSITION FOR SEMICONDUCTORS
/
: 2014
TABLE OF CONTENTS / INHALTSVERZEICHNIS
INTRODUCTION
PRECURSORS AND REACTION MECHANISMS
ALD SIMULATIONS
ALD FOR MASS-PRODUCTION MEMORIES (DRAM AND FLASH)
ALD FOR EMERGING MEMORIES
PCRAM
FERAM
FRONT END OF THE LINE PROCESS
BACK END OF THE LINE
ALD MACHINES
DIESES SCHRIFTSTUECK WURDE MASCHINELL ERZEUGT.
ATOMIC LAYER DEPOSITION FOR SEMICONDUCTORS
/
: 2014
ABSTRACT / INHALTSTEXT
ATOMIC LAYER DEPOSITION (ALD) WAS ORIGINALLY DESIGNED FOR DEPOSITING
UNIFORM PASSIVATION LAYERS OVER A VERY LARGE AREA FOR DISPLAY DEVICES
IN THE LATE 1970S. ONLY RECENTLY, IN THE 21ST CENTURY, HAS THE THIS
TECHNIQUE BECOME POPULAR FOR HIGH INTEGRATED SEMICONDUCTOR MEMORY
DEVICES. THIS BOOK DISCUSSES ALD FOR ALL MODERN SEMICONDUCTOR DEVICES,
THE BASIC CHEMISTRY OF ALD, AND MODELS OF ALD PROCESSES. THE BOOK ALSO
DETAILS ALD FOR BOTH MASS PRODUCED MEMORIES AND EMERGING MEMORIES. EACH
CHAPTER OF THE BOOK PROVIDES HISTORY, OPERATING PRINCIPLES, AND A FULL
EXPLANATION OF ALD PROCESSES FOR EACH DEVICE
DIESES SCHRIFTSTUECK WURDE MASCHINELL ERZEUGT.
|
| any_adam_object | 1 |
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| dewey-full | 541.37 |
| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 541 - Physical chemistry |
| dewey-raw | 541.37 |
| dewey-search | 541.37 |
| dewey-sort | 3541.37 |
| dewey-tens | 540 - Chemistry and allied sciences |
| discipline | Chemie / Pharmazie Physik |
| format | Book |
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| institution | BVB |
| isbn | 9781461480532 |
| language | English |
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| physical | X, 263 S. Ill., graph. Darst. |
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| spelling | Seong Hwang, Cheol Verfasser aut Atomic layer deposition for semiconductors Cheol Seong Hwang ... eds. New York [u.a.] Springer 2014 X, 263 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Chemie Chemistry Memory management (Computer science) Electronics Electric engineering Halbleiter (DE-588)4022993-2 gnd rswk-swf Halbleiter (DE-588)4022993-2 s DE-604 Erscheint auch als Online-Ausgabe 10.1007/978-1-4614-8054-9 978-1-4614-8054-9 Springer Fremddatenuebernahme application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=026886260&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis Springer Fremddatenuebernahme application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=026886260&sequence=000003&line_number=0002&func_code=DB_RECORDS&service_type=MEDIA Abstract |
| spellingShingle | Seong Hwang, Cheol Atomic layer deposition for semiconductors Chemie Chemistry Memory management (Computer science) Electronics Electric engineering Halbleiter (DE-588)4022993-2 gnd |
| subject_GND | (DE-588)4022993-2 |
| title | Atomic layer deposition for semiconductors |
| title_auth | Atomic layer deposition for semiconductors |
| title_exact_search | Atomic layer deposition for semiconductors |
| title_full | Atomic layer deposition for semiconductors Cheol Seong Hwang ... eds. |
| title_fullStr | Atomic layer deposition for semiconductors Cheol Seong Hwang ... eds. |
| title_full_unstemmed | Atomic layer deposition for semiconductors Cheol Seong Hwang ... eds. |
| title_short | Atomic layer deposition for semiconductors |
| title_sort | atomic layer deposition for semiconductors |
| topic | Chemie Chemistry Memory management (Computer science) Electronics Electric engineering Halbleiter (DE-588)4022993-2 gnd |
| topic_facet | Chemie Chemistry Memory management (Computer science) Electronics Electric engineering Halbleiter |
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