Chemical vapour deposition: precursors, processes and applications
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Cambrigde
RSC Publ.
2009
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | 1 Online-Ressource (XV, 582 S.) Ill., graph. Darst. |
| ISBN: | 9780854044658 9781621987031 |
Internformat
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| 020 | |a 9781621987031 |c Online |9 978-1-62198-703-1 | ||
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| 245 | 1 | 0 | |a Chemical vapour deposition |b precursors, processes and applications |c ed. by Anthony C. Jones ; Michael L. Hitchman |
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| 700 | 1 | |a Jones, Anthony C. |e Sonstige |4 oth | |
| 700 | 1 | |a Hitchman, Michael L. |e Sonstige |4 oth | |
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Datensatz im Suchindex
| _version_ | 1806054957785284608 |
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| discipline | Physik Elektrotechnik Fertigungstechnik |
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| genre_facet | Aufsatzsammlung |
| id | DE-604.BV041092707 |
| illustrated | Illustrated |
| indexdate | 2024-07-31T01:10:27Z |
| institution | BVB |
| isbn | 9780854044658 9781621987031 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-026069269 |
| oclc_num | 874341387 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM |
| owner_facet | DE-91 DE-BY-TUM |
| physical | 1 Online-Ressource (XV, 582 S.) Ill., graph. Darst. |
| psigel | ZDB-10-ESC |
| publishDate | 2009 |
| publishDateSearch | 2009 |
| publishDateSort | 2009 |
| publisher | RSC Publ. |
| record_format | marc |
| spelling | Chemical vapour deposition precursors, processes and applications ed. by Anthony C. Jones ; Michael L. Hitchman Cambrigde RSC Publ. 2009 1 Online-Ressource (XV, 582 S.) Ill., graph. Darst. txt rdacontent c rdamedia cr rdacarrier CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf (DE-588)4143413-4 Aufsatzsammlung gnd-content CVD-Verfahren (DE-588)4009846-1 s DE-604 Jones, Anthony C. Sonstige oth Hitchman, Michael L. Sonstige oth http://www.knovel.com/web/portal/browse/display?_EXT_KNOVEL_DISPLAY_bookid=5989 Volltext |
| spellingShingle | Chemical vapour deposition precursors, processes and applications CVD-Verfahren (DE-588)4009846-1 gnd |
| subject_GND | (DE-588)4009846-1 (DE-588)4143413-4 |
| title | Chemical vapour deposition precursors, processes and applications |
| title_auth | Chemical vapour deposition precursors, processes and applications |
| title_exact_search | Chemical vapour deposition precursors, processes and applications |
| title_full | Chemical vapour deposition precursors, processes and applications ed. by Anthony C. Jones ; Michael L. Hitchman |
| title_fullStr | Chemical vapour deposition precursors, processes and applications ed. by Anthony C. Jones ; Michael L. Hitchman |
| title_full_unstemmed | Chemical vapour deposition precursors, processes and applications ed. by Anthony C. Jones ; Michael L. Hitchman |
| title_short | Chemical vapour deposition |
| title_sort | chemical vapour deposition precursors processes and applications |
| title_sub | precursors, processes and applications |
| topic | CVD-Verfahren (DE-588)4009846-1 gnd |
| topic_facet | CVD-Verfahren Aufsatzsammlung |
| url | http://www.knovel.com/web/portal/browse/display?_EXT_KNOVEL_DISPLAY_bookid=5989 |
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