Strain engineered MOSFETs:
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Buch |
Sprache: | English |
Veröffentlicht: |
Boca Raton, Fla. [u.a.]
CRC Press
2013
|
Schlagworte: | |
Beschreibung: | XIX, 300 S. Ill., graph. Darst |
ISBN: | 9781466500556 |
Internformat
MARC
LEADER | 00000nam a2200000 c 4500 | ||
---|---|---|---|
001 | BV040790380 | ||
003 | DE-604 | ||
005 | 20180730 | ||
007 | t | ||
008 | 130228s2013 ad|| |||| 00||| eng d | ||
010 | |a 2012031209 | ||
020 | |a 9781466500556 |9 978-1-466-50055-6 | ||
035 | |a (OCoLC)827774375 | ||
035 | |a (DE-599)GBV726402397 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
049 | |a DE-634 |a DE-83 | ||
082 | 0 | |a 621.3815284 | |
084 | |a ZN 4040 |0 (DE-625)157343: |2 rvk | ||
084 | |a ZN 4870 |0 (DE-625)157415: |2 rvk | ||
084 | |a ZN 4960 |0 (DE-625)157426: |2 rvk | ||
100 | 1 | |a Maiti, C. K. |e Verfasser |4 aut | |
245 | 1 | 0 | |a Strain engineered MOSFETs |c C. K. Maiti ; T. K. Maiti |
246 | 1 | 3 | |a Strain-engineered MOSFETs |
264 | 1 | |a Boca Raton, Fla. [u.a.] |b CRC Press |c 2013 | |
300 | |a XIX, 300 S. |b Ill., graph. Darst | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
650 | 4 | |a aMetal oxide semiconductor field-effect transistorsxReliability | |
650 | 4 | |a aIntegrated circuitsxFault tolerance | |
650 | 4 | |a aStrains and stresses | |
650 | 0 | 7 | |a Fehleranalyse |0 (DE-588)4016608-9 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Zuverlässigkeit |0 (DE-588)4059245-5 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a MOS-FET |0 (DE-588)4207266-9 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a MOS-FET |0 (DE-588)4207266-9 |D s |
689 | 0 | 1 | |a Zuverlässigkeit |0 (DE-588)4059245-5 |D s |
689 | 0 | 2 | |a Fehleranalyse |0 (DE-588)4016608-9 |D s |
689 | 0 | |5 DE-604 | |
700 | 1 | |a Maiti, T. K. |e Sonstige |4 oth | |
999 | |a oai:aleph.bib-bvb.de:BVB01-025768525 |
Datensatz im Suchindex
_version_ | 1804150122223763456 |
---|---|
any_adam_object | |
author | Maiti, C. K. |
author_facet | Maiti, C. K. |
author_role | aut |
author_sort | Maiti, C. K. |
author_variant | c k m ck ckm |
building | Verbundindex |
bvnumber | BV040790380 |
classification_rvk | ZN 4040 ZN 4870 ZN 4960 |
ctrlnum | (OCoLC)827774375 (DE-599)GBV726402397 |
dewey-full | 621.3815284 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.3815284 |
dewey-search | 621.3815284 |
dewey-sort | 3621.3815284 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01556nam a2200457 c 4500</leader><controlfield tag="001">BV040790380</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20180730 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">130228s2013 ad|| |||| 00||| eng d</controlfield><datafield tag="010" ind1=" " ind2=" "><subfield code="a">2012031209</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781466500556</subfield><subfield code="9">978-1-466-50055-6</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)827774375</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBV726402397</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-634</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815284</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4040</subfield><subfield code="0">(DE-625)157343:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4870</subfield><subfield code="0">(DE-625)157415:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4960</subfield><subfield code="0">(DE-625)157426:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Maiti, C. K.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Strain engineered MOSFETs</subfield><subfield code="c">C. K. Maiti ; T. K. Maiti</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">Strain-engineered MOSFETs</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Boca Raton, Fla. [u.a.]</subfield><subfield code="b">CRC Press</subfield><subfield code="c">2013</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XIX, 300 S.</subfield><subfield code="b">Ill., graph. Darst</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">aMetal oxide semiconductor field-effect transistorsxReliability</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">aIntegrated circuitsxFault tolerance</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">aStrains and stresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fehleranalyse</subfield><subfield code="0">(DE-588)4016608-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Zuverlässigkeit</subfield><subfield code="0">(DE-588)4059245-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">MOS-FET</subfield><subfield code="0">(DE-588)4207266-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">MOS-FET</subfield><subfield code="0">(DE-588)4207266-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Zuverlässigkeit</subfield><subfield code="0">(DE-588)4059245-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Fehleranalyse</subfield><subfield code="0">(DE-588)4016608-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Maiti, T. K.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-025768525</subfield></datafield></record></collection> |
id | DE-604.BV040790380 |
illustrated | Illustrated |
indexdate | 2024-07-10T00:33:54Z |
institution | BVB |
isbn | 9781466500556 |
language | English |
lccn | 2012031209 |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-025768525 |
oclc_num | 827774375 |
open_access_boolean | |
owner | DE-634 DE-83 |
owner_facet | DE-634 DE-83 |
physical | XIX, 300 S. Ill., graph. Darst |
publishDate | 2013 |
publishDateSearch | 2013 |
publishDateSort | 2013 |
publisher | CRC Press |
record_format | marc |
spelling | Maiti, C. K. Verfasser aut Strain engineered MOSFETs C. K. Maiti ; T. K. Maiti Strain-engineered MOSFETs Boca Raton, Fla. [u.a.] CRC Press 2013 XIX, 300 S. Ill., graph. Darst txt rdacontent n rdamedia nc rdacarrier aMetal oxide semiconductor field-effect transistorsxReliability aIntegrated circuitsxFault tolerance aStrains and stresses Fehleranalyse (DE-588)4016608-9 gnd rswk-swf Zuverlässigkeit (DE-588)4059245-5 gnd rswk-swf MOS-FET (DE-588)4207266-9 gnd rswk-swf MOS-FET (DE-588)4207266-9 s Zuverlässigkeit (DE-588)4059245-5 s Fehleranalyse (DE-588)4016608-9 s DE-604 Maiti, T. K. Sonstige oth |
spellingShingle | Maiti, C. K. Strain engineered MOSFETs aMetal oxide semiconductor field-effect transistorsxReliability aIntegrated circuitsxFault tolerance aStrains and stresses Fehleranalyse (DE-588)4016608-9 gnd Zuverlässigkeit (DE-588)4059245-5 gnd MOS-FET (DE-588)4207266-9 gnd |
subject_GND | (DE-588)4016608-9 (DE-588)4059245-5 (DE-588)4207266-9 |
title | Strain engineered MOSFETs |
title_alt | Strain-engineered MOSFETs |
title_auth | Strain engineered MOSFETs |
title_exact_search | Strain engineered MOSFETs |
title_full | Strain engineered MOSFETs C. K. Maiti ; T. K. Maiti |
title_fullStr | Strain engineered MOSFETs C. K. Maiti ; T. K. Maiti |
title_full_unstemmed | Strain engineered MOSFETs C. K. Maiti ; T. K. Maiti |
title_short | Strain engineered MOSFETs |
title_sort | strain engineered mosfets |
topic | aMetal oxide semiconductor field-effect transistorsxReliability aIntegrated circuitsxFault tolerance aStrains and stresses Fehleranalyse (DE-588)4016608-9 gnd Zuverlässigkeit (DE-588)4059245-5 gnd MOS-FET (DE-588)4207266-9 gnd |
topic_facet | aMetal oxide semiconductor field-effect transistorsxReliability aIntegrated circuitsxFault tolerance aStrains and stresses Fehleranalyse Zuverlässigkeit MOS-FET |
work_keys_str_mv | AT maitick strainengineeredmosfets AT maititk strainengineeredmosfets |