Verfügbarkeit: Production Planning and Control for Semiconductor Wafer Fabrication Facilities

Production Planning and Control for Semiconductor Wafer Fabrication Facilities: Modeling, Analysis, and Systems

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	Mönch, Lars 1967- (VerfasserIn), Fowler, John W. (VerfasserIn), Mason, Scott J. (VerfasserIn)
Format:	Elektronisch E-Book
Sprache:	English
Veröffentlicht:	New York, NY Springer 2013
Schriftenreihe:	Operations research, computer science interface series 52
Online-Zugang:	BTU01 FHA01 FHM01 FHN01 FHO01 FHR01 FKE01 FNU01 FWS01 FWS02 HWR01 UBG01 UBM01 UBT01 UBY01 UPA01 Volltext Inhaltsverzeichnis Abstract
Beschreibung:	1 Online-Ressource
ISBN:	9781461444718 9781461444725
DOI:	10.1007/978-1-4614-4472-5

Internformat

MARC


LEADER	00000nmm a2200000 cb4500
001	BV040544830
003	DE-604
005	20140321
007	cr\|uuu---uuuuu
008	121115s2013 \|\|\|\| o\|\|u\| \|\|\|\|\|\|eng d
020			\|a 9781461444718 \|9 978-1-4614-4471-8
020			\|a 9781461444725 \|c Online \|9 978-1-4614-4472-5
024	7		\|a 10.1007/978-1-4614-4472-5 \|2 doi
035			\|a (OCoLC)815197621
035			\|a (DE-599)GBV728221284
040			\|a DE-604 \|b ger \|e aacr
041	0		\|a eng
049			\|a DE-473 \|a DE-739 \|a DE-92 \|a DE-898 \|a DE-2070s \|a DE-M347 \|a DE-703 \|a DE-634 \|a DE-Aug4 \|a DE-19 \|a DE-1051 \|a DE-1049 \|a DE-859 \|a DE-863 \|a DE-862 \|a DE-706
050		0	\|a HD30.23
082	0		\|a 658.40301
100	1		\|a Mönch, Lars \|d 1967- \|e Verfasser \|0 (DE-588)115754857 \|4 aut
245	1	0	\|a Production Planning and Control for Semiconductor Wafer Fabrication Facilities \|b Modeling, Analysis, and Systems \|c Lars Mönch, John W. Fowler, Scott J. Mason
264		1	\|a New York, NY \|b Springer \|c 2013
300			\|a 1 Online-Ressource
336			\|b txt \|2 rdacontent
337			\|b c \|2 rdamedia
338			\|b cr \|2 rdacarrier
490	1		\|a Operations research, computer science interface series \|v 52
700	1		\|a Fowler, John W. \|e Verfasser \|4 aut
700	1		\|a Mason, Scott J. \|e Verfasser \|4 aut
830		0	\|a Operations research, computer science interface series \|v 52 \|w (DE-604)BV036750963 \|9 52
856	4	0	\|u https://doi.org/10.1007/978-1-4614-4472-5 \|x Verlag \|3 Volltext
856	4	2	\|m Springer Fremddatenuebernahme \|q application/pdf \|u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=025390670&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA \|3 Inhaltsverzeichnis
856	4	2	\|m Springer Fremddatenuebernahme \|q application/pdf \|u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=025390670&sequence=000003&line_number=0002&func_code=DB_RECORDS&service_type=MEDIA \|3 Abstract
912			\|a ZDB-2-SBE
999			\|a oai:aleph.bib-bvb.de:BVB01-025390670
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l BTU01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l FHA01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l FHM01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l FHN01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l FHO01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l FHR01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l FKE01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l FNU01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l FWS01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l FWS02 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l HWR01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l UBG01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l UBM01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l UBT01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l UBY01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-1-4614-4472-5 \|l UPA01 \|p ZDB-2-SBE \|x Verlag \|3 Volltext

Datensatz im Suchindex

DE-BY-FWS_katkey	498208
_version_	1806178867179683840
adam_text	PRODUCTION PLANNING AND CONTROL FOR SEMICONDUCTOR WAFER FABRICATION FACILITIES / MOENCH, LARS : 2013 TABLE OF CONTENTS / INHALTSVERZEICHNIS INTRODUCTION SEMICONDUCTOR MANUFACTURING PROCESS DESCRIPTION MODELING AND ANALYSIS TOOLS DISPATCHING APPROACHES DETERMINISTIC SCHEDULING APPROACHES ORDER RELEASE APPROACHES PRODUCTION PLANNING APPROACHES PRODUCTION PLANNING AND CONTROL SYSTEMS DIESES SCHRIFTSTUECK WURDE MASCHINELL ERZEUGT. PRODUCTION PLANNING AND CONTROL FOR SEMICONDUCTOR WAFER FABRICATION FACILITIES / MOENCH, LARS : 2013 ABSTRACT / INHALTSTEXT OVER THE LAST FIFTY-PLUS YEARS, THE INCREASED COMPLEXITY AND SPEED OF INTEGRATED CIRCUITS HAVE RADICALLY CHANGED OUR WORLD. TODAY, SEMICONDUCTOR MANUFACTURING IS PERHAPS THE MOST IMPORTANT SEGMENT OF THE GLOBAL MANUFACTURING SECTOR. AS THE SEMICONDUCTOR INDUSTRY HAS BECOME MORE COMPETITIVE, IMPROVING PLANNING AND CONTROL HAS BECOME A KEY FACTOR FOR BUSINESS SUCCESS. THIS BOOK IS DEVOTED TO PRODUCTION PLANNING AND CONTROL PROBLEMS IN SEMICONDUCTOR WAFER FABRICATION FACILITIES. IT IS THE FIRST BOOK THAT TAKES A COMPREHENSIVE LOOK AT THE ROLE OF MODELING, ANALYSIS, AND RELATED INFORMATION SYSTEMS FOR SUCH MANUFACTURING SYSTEMS. THE BOOK PROVIDES AN OPERATIONS RESEARCH- AND COMPUTER SCIENCE-BASED INTRODUCTION INTO THIS IMPORTANT FIELD OF SEMICONDUCTOR MANUFACTURING-RELATED RESEARCH DIESES SCHRIFTSTUECK WURDE MASCHINELL ERZEUGT.
any_adam_object	1
author	Mönch, Lars 1967- Fowler, John W. Mason, Scott J.
author_GND	(DE-588)115754857
author_facet	Mönch, Lars 1967- Fowler, John W. Mason, Scott J.
author_role	aut aut aut
author_sort	Mönch, Lars 1967-
author_variant	l m lm j w f jw jwf s j m sj sjm
building	Verbundindex
bvnumber	BV040544830
callnumber-first	H - Social Science
callnumber-label	HD30
callnumber-raw	HD30.23
callnumber-search	HD30.23
callnumber-sort	HD 230.23
callnumber-subject	HD - Industries, Land Use, Labor
collection	ZDB-2-SBE
ctrlnum	(OCoLC)815197621 (DE-599)GBV728221284
dewey-full	658.40301
dewey-hundreds	600 - Technology (Applied sciences)
dewey-ones	658 - General management
dewey-raw	658.40301
dewey-search	658.40301
dewey-sort	3658.40301
dewey-tens	650 - Management and auxiliary services
discipline	Wirtschaftswissenschaften
doi_str_mv	10.1007/978-1-4614-4472-5
format	Electronic eBook
fullrecord	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03499nmm a2200589 cb4500</leader><controlfield tag="001">BV040544830</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20140321 </controlfield><controlfield tag="007">cr\|uuu---uuuuu</controlfield><controlfield tag="008">121115s2013 \|\|\|\| o\|\|u\| \|\|\|\|\|\|eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781461444718</subfield><subfield code="9">978-1-4614-4471-8</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781461444725</subfield><subfield code="c">Online</subfield><subfield code="9">978-1-4614-4472-5</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/978-1-4614-4472-5</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)815197621</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBV728221284</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-473</subfield><subfield code="a">DE-739</subfield><subfield code="a">DE-92</subfield><subfield code="a">DE-898</subfield><subfield code="a">DE-2070s</subfield><subfield code="a">DE-M347</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-634</subfield><subfield code="a">DE-Aug4</subfield><subfield code="a">DE-19</subfield><subfield code="a">DE-1051</subfield><subfield code="a">DE-1049</subfield><subfield code="a">DE-859</subfield><subfield code="a">DE-863</subfield><subfield code="a">DE-862</subfield><subfield code="a">DE-706</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">HD30.23</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">658.40301</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Mönch, Lars</subfield><subfield code="d">1967-</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)115754857</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Production Planning and Control for Semiconductor Wafer Fabrication Facilities</subfield><subfield code="b">Modeling, Analysis, and Systems</subfield><subfield code="c">Lars Mönch, John W. Fowler, Scott J. Mason</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York, NY</subfield><subfield code="b">Springer</subfield><subfield code="c">2013</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Operations research, computer science interface series</subfield><subfield code="v">52</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Fowler, John W.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Mason, Scott J.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Operations research, computer science interface series</subfield><subfield code="v">52</subfield><subfield code="w">(DE-604)BV036750963</subfield><subfield code="9">52</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">Springer Fremddatenuebernahme</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=025390670&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">Springer Fremddatenuebernahme</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=025390670&sequence=000003&line_number=0002&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Abstract</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-SBE</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-025390670</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">BTU01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">FHA01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">FHM01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">FHN01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">FHO01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">FHR01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">FKE01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">FNU01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">FWS01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">FWS02</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">HWR01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">UBG01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">UBM01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">UBT01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">UBY01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-1-4614-4472-5</subfield><subfield code="l">UPA01</subfield><subfield code="p">ZDB-2-SBE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection>
id	DE-604.BV040544830
illustrated	Not Illustrated
indexdate	2024-08-01T11:59:55Z
institution	BVB
isbn	9781461444718 9781461444725
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-025390670
oclc_num	815197621
open_access_boolean
owner	DE-473 DE-BY-UBG DE-739 DE-92 DE-898 DE-BY-UBR DE-2070s DE-M347 DE-703 DE-634 DE-Aug4 DE-19 DE-BY-UBM DE-1051 DE-1049 DE-859 DE-863 DE-BY-FWS DE-862 DE-BY-FWS DE-706
owner_facet	DE-473 DE-BY-UBG DE-739 DE-92 DE-898 DE-BY-UBR DE-2070s DE-M347 DE-703 DE-634 DE-Aug4 DE-19 DE-BY-UBM DE-1051 DE-1049 DE-859 DE-863 DE-BY-FWS DE-862 DE-BY-FWS DE-706
physical	1 Online-Ressource
psigel	ZDB-2-SBE
publishDate	2013
publishDateSearch	2013
publishDateSort	2013
publisher	Springer
record_format	marc
series	Operations research, computer science interface series
series2	Operations research, computer science interface series
spellingShingle	Mönch, Lars 1967- Fowler, John W. Mason, Scott J. Production Planning and Control for Semiconductor Wafer Fabrication Facilities Modeling, Analysis, and Systems Operations research, computer science interface series
title	Production Planning and Control for Semiconductor Wafer Fabrication Facilities Modeling, Analysis, and Systems
title_auth	Production Planning and Control for Semiconductor Wafer Fabrication Facilities Modeling, Analysis, and Systems
title_exact_search	Production Planning and Control for Semiconductor Wafer Fabrication Facilities Modeling, Analysis, and Systems
title_full	Production Planning and Control for Semiconductor Wafer Fabrication Facilities Modeling, Analysis, and Systems Lars Mönch, John W. Fowler, Scott J. Mason
title_fullStr	Production Planning and Control for Semiconductor Wafer Fabrication Facilities Modeling, Analysis, and Systems Lars Mönch, John W. Fowler, Scott J. Mason
title_full_unstemmed	Production Planning and Control for Semiconductor Wafer Fabrication Facilities Modeling, Analysis, and Systems Lars Mönch, John W. Fowler, Scott J. Mason
title_short	Production Planning and Control for Semiconductor Wafer Fabrication Facilities
title_sort	production planning and control for semiconductor wafer fabrication facilities modeling analysis and systems
title_sub	Modeling, Analysis, and Systems
url	https://doi.org/10.1007/978-1-4614-4472-5 http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=025390670&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=025390670&sequence=000003&line_number=0002&func_code=DB_RECORDS&service_type=MEDIA
volume_link	(DE-604)BV036750963
work_keys_str_mv	AT monchlars productionplanningandcontrolforsemiconductorwaferfabricationfacilitiesmodelinganalysisandsystems AT fowlerjohnw productionplanningandcontrolforsemiconductorwaferfabricationfacilitiesmodelinganalysisandsystems AT masonscottj productionplanningandcontrolforsemiconductorwaferfabricationfacilitiesmodelinganalysisandsystems

Verfügbarkeit

Volltext öffnen

MARC

Datensatz im Suchindex

Ähnliche Einträge