Electromigration behavior of a multi-layer metallization:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | Undetermined |
| Veröffentlicht: |
Konstanz
Hartung-Gorre
1998
|
| Schlagworte: | |
| Beschreibung: | Zugl.: Zürich, Techn. Hochschule, Diss., 1998 |
| Beschreibung: | X, 137 S. Ill., graph. Darst. |
| ISBN: | 389649306X |
Internformat
MARC
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| 041 | |a und | ||
| 049 | |a DE-1050 | ||
| 100 | 1 | |a Schönbächler, Edgar Arthur |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Electromigration behavior of a multi-layer metallization |c Edgar Arthur Schönbächler |
| 264 | 1 | |a Konstanz |b Hartung-Gorre |c 1998 | |
| 300 | |a X, 137 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Zugl.: Zürich, Techn. Hochschule, Diss., 1998 | ||
| 650 | 0 | 7 | |a Elektromigration |0 (DE-588)4296761-2 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Mikrostruktur |0 (DE-588)4131028-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Zuverlässigkeit |0 (DE-588)4059245-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a CMOS |0 (DE-588)4010319-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Oberflächenanalyse |0 (DE-588)4172243-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Metallisieren |0 (DE-588)4169599-9 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 689 | 0 | 0 | |a CMOS |0 (DE-588)4010319-5 |D s |
| 689 | 0 | 1 | |a Zuverlässigkeit |0 (DE-588)4059245-5 |D s |
| 689 | 0 | 2 | |a Elektromigration |0 (DE-588)4296761-2 |D s |
| 689 | 0 | 3 | |a Metallisieren |0 (DE-588)4169599-9 |D s |
| 689 | 0 | 4 | |a Mikrostruktur |0 (DE-588)4131028-7 |D s |
| 689 | 0 | 5 | |a Oberflächenanalyse |0 (DE-588)4172243-7 |D s |
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Datensatz im Suchindex
| _version_ | 1804149430951084032 |
|---|---|
| any_adam_object | |
| author | Schönbächler, Edgar Arthur |
| author_facet | Schönbächler, Edgar Arthur |
| author_role | aut |
| author_sort | Schönbächler, Edgar Arthur |
| author_variant | e a s ea eas |
| building | Verbundindex |
| bvnumber | BV040386674 |
| ctrlnum | (OCoLC)634885790 (DE-599)BVBBV040386674 |
| format | Book |
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| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV040386674 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T00:22:55Z |
| institution | BVB |
| isbn | 389649306X |
| language | Undetermined |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-025240081 |
| oclc_num | 634885790 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | X, 137 S. Ill., graph. Darst. |
| publishDate | 1998 |
| publishDateSearch | 1998 |
| publishDateSort | 1998 |
| publisher | Hartung-Gorre |
| record_format | marc |
| spelling | Schönbächler, Edgar Arthur Verfasser aut Electromigration behavior of a multi-layer metallization Edgar Arthur Schönbächler Konstanz Hartung-Gorre 1998 X, 137 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Zugl.: Zürich, Techn. Hochschule, Diss., 1998 Elektromigration (DE-588)4296761-2 gnd rswk-swf Mikrostruktur (DE-588)4131028-7 gnd rswk-swf Zuverlässigkeit (DE-588)4059245-5 gnd rswk-swf CMOS (DE-588)4010319-5 gnd rswk-swf Oberflächenanalyse (DE-588)4172243-7 gnd rswk-swf Metallisieren (DE-588)4169599-9 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content CMOS (DE-588)4010319-5 s Zuverlässigkeit (DE-588)4059245-5 s Elektromigration (DE-588)4296761-2 s Metallisieren (DE-588)4169599-9 s Mikrostruktur (DE-588)4131028-7 s Oberflächenanalyse (DE-588)4172243-7 s DE-604 |
| spellingShingle | Schönbächler, Edgar Arthur Electromigration behavior of a multi-layer metallization Elektromigration (DE-588)4296761-2 gnd Mikrostruktur (DE-588)4131028-7 gnd Zuverlässigkeit (DE-588)4059245-5 gnd CMOS (DE-588)4010319-5 gnd Oberflächenanalyse (DE-588)4172243-7 gnd Metallisieren (DE-588)4169599-9 gnd |
| subject_GND | (DE-588)4296761-2 (DE-588)4131028-7 (DE-588)4059245-5 (DE-588)4010319-5 (DE-588)4172243-7 (DE-588)4169599-9 (DE-588)4113937-9 |
| title | Electromigration behavior of a multi-layer metallization |
| title_auth | Electromigration behavior of a multi-layer metallization |
| title_exact_search | Electromigration behavior of a multi-layer metallization |
| title_full | Electromigration behavior of a multi-layer metallization Edgar Arthur Schönbächler |
| title_fullStr | Electromigration behavior of a multi-layer metallization Edgar Arthur Schönbächler |
| title_full_unstemmed | Electromigration behavior of a multi-layer metallization Edgar Arthur Schönbächler |
| title_short | Electromigration behavior of a multi-layer metallization |
| title_sort | electromigration behavior of a multi layer metallization |
| topic | Elektromigration (DE-588)4296761-2 gnd Mikrostruktur (DE-588)4131028-7 gnd Zuverlässigkeit (DE-588)4059245-5 gnd CMOS (DE-588)4010319-5 gnd Oberflächenanalyse (DE-588)4172243-7 gnd Metallisieren (DE-588)4169599-9 gnd |
| topic_facet | Elektromigration Mikrostruktur Zuverlässigkeit CMOS Oberflächenanalyse Metallisieren Hochschulschrift |
| work_keys_str_mv | AT schonbachleredgararthur electromigrationbehaviorofamultilayermetallization |