Two-dimensional nanostructures:
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Boca Raton, Fla. [u.a.]
CRC Press
2012
|
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | XIII, 307 S. Ill., graph. Darst. |
| ISBN: | 9781439866658 |
Internformat
MARC
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|---|---|---|---|
| 001 | BV040235766 | ||
| 003 | DE-604 | ||
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| 007 | t | ||
| 008 | 120605s2012 xxuad|| |||| 00||| eng d | ||
| 010 | |a 2012005186 | ||
| 020 | |a 9781439866658 |c hardback |9 978-1-4398-6665-8 | ||
| 035 | |a (OCoLC)796267016 | ||
| 035 | |a (DE-599)BVBBV040235766 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
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| 044 | |a xxu |c US | ||
| 049 | |a DE-20 |a DE-29T | ||
| 050 | 0 | |a TA418.9.N35 | |
| 082 | 0 | |a 620.1/15 | |
| 084 | |a ZN 3700 |0 (DE-625)157333: |2 rvk | ||
| 100 | 1 | |a Aliofkhazraei, Mahmood |e Verfasser |0 (DE-588)1058846957 |4 aut | |
| 245 | 1 | 0 | |a Two-dimensional nanostructures |c Mahmood Aliofkhazraei ; Nasar Ali |
| 264 | 1 | |a Boca Raton, Fla. [u.a.] |b CRC Press |c 2012 | |
| 300 | |a XIII, 307 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Includes bibliographical references and index | ||
| 650 | 4 | |a Nanostructured materials | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Material Science |2 bisacsh | |
| 650 | 0 | 7 | |a Nanostruktur |0 (DE-588)4204530-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Dimension 2 |0 (DE-588)4321721-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Nanostruktur |0 (DE-588)4204530-7 |D s |
| 689 | 0 | 1 | |a Dimension 2 |0 (DE-588)4321721-7 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Ali, Nasar |e Verfasser |4 aut | |
| 856 | 4 | 2 | |m HBZ Datenaustausch |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=025092077&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-025092077 | ||
Datensatz im Suchindex
| _version_ | 1804149225291776000 |
|---|---|
| adam_text | CONTENTS
PREFACE......................................................................................................................XI
1
SYNTHESIS,
PROCESSING,
AND
APPLICATION
OF
NANOSTRUCTURES...................1
1.1
INTRODUCTION
TO
NANOTECHNOLOGY........................................................1
1.2
HISTORY
OF
NANOTECHNOLOGY.................................................................2
1.3
WHAT
IS
A
NANOMATERIAL?......................................................................3
1.4
PROPERTIES
OF
NANOSTRUCTURED
MATERIALS...........................................6
1.4.1
PHYSICAL
PROPERTIES..................................................................9
1.4.1.1
DIFFUSION
COEFFICIENT................................................9
1.4.1.2
THERMAL
EXPANSION
COEFFICIENT............................12
1.4.1.3
ELECTRICAL
RESISTANCE...............................................14
1.4.1.4
SOLUBILITY
OF
ALLOY
ELEMENTS.................................15
1.4.1.5
MAGNETIC
PROPERTIES...............................................15
1.4.1.6
CORROSION
RESISTANCE.............................................17
1.4.1.7
HYDROGEN
CAPACITANCE
PROPERTIES.......................18
1.4.2
MECHANICAL
PROPERTIES..........................................................18
1.4.2.1
ELASTIC
PROPERTIES....................................................19
1.4.2.2
PLASTIC
PROPERTIES...................................................20
1.4.2.3
SUPERPLASTICITY........................................................27
1.5
THERMAL
STABILITY
OF
NANOSTRUCTURES...............................................31
1.6
NANOTECHNOLOGY
AND
FUTURE
PERSPECTIVES......................................36
1.7
SOME
APPLICATIONS
OF
NANOSTRUCTURES.............................................38
1.7.1
NANOELECTRONIC
AND
MOLECULAR
ELECTRONIC..........................38
1.7.2
NANOROBOTS.............................................................................38
1.7.3
BIOLOGICAL
APPLICATIONS.........................................................38
1.7.4
CATALYTIC
APPLICATIONS...........................................................39
REFERENCES.......................................................................................................39
2
CLASSIFICATION
OF
TWO-DIMENSIONAL
NANOSTRUCTURES.............................51
2.1
INTRODUCTION.........................................................................................51
2.2
VARIOUS
METHODS
FOR
PRODUCTION
OF
NANOSTRUCTURES.....................51
2.2.1
PRODUCING
NANOPARTICLES
BY
THE
SOL-GEL
PROCESS..............52
2.2.2
PRODUCTION
OF
NANOPARTICLES
BY
THE
CHEMICAL
DEPOSITION
METHOD................................................................52
2.2.3
PRODUCTION
OF
NANOPARTICLES
BY
THE
HYDROTHERMAL
METHOD...
53
2.2.4
PRODUCTION
OF
NANOPARTICLES
BY
THE
PYROLYSIS
METHOD....53
2.2.5
PRODUCTION
OF
NANOPARTICLES
BY
CHEMICAL
VAPOR
DEPOSITION
(CVD).......................................................54
2.2.6
SOLID-STATE
PROCESSES.............................................................54
2.2.7
ADVANCED
METHODS...............................................................54
VI
CONTENTS
2.3
PHYSICAL
AND
CHEMICAL
ANALYSIS
OF
NANOPARTICLES........................55
2.3.1
X-RAY
DIFFRACTION
(XRD).......................................................55
2.3.2
SCANNING
ELECTRON
MICROSCOPY
(SEM)................................56
2.3.3
TRANSMISSION
ELECTRON
MICROSCOPY
(TEM).........................56
2.3.4
OPTICAL
SPECTROMETRY............................................................56
2.3.5
ULTRAVIOLET
(UV)-VISIBLE
SPECTROSCOPY................................57
2.3.6
FLUORESCENCE...........................................................................57
2.3.7
FOURIER
TRANSFORM
INFRARED
SPECTROMETRY
(FTIR)............57
2.4
DIFFERENT
FORMS
OF
GROWTH................................................................58
2.5
RELATION
BETWEEN
GROWTH
AND
ENERGY
LEVEL..................................59
2.6
OVERATURATION
EFFECT
ON
GROWTH.......................................................60
2.7
QUANTITATIVE
DESCRIPTION
OF
INITIAL
STAGES
OF
FILM
GROWTH...........62
2.7.1
VOLMER-WEBER
THEORY..........................................................62
2.7.2
THREE-DIMENSIONAL
(3D)
ISLAND
GROWTH.............................62
2.7.3
TWO-DIMENSIONAL
(2D)
FILM
GROWTH..................................63
2.8
KINETIC
THEORY
OF
GROWTH..................................................................64
2.9
ORIENTATION
OF
THIN
FILMS..................................................................67
2.10
FILM
GROWTH
WITH
A
CERTAIN
ORIENTATION.........................................68
2.11
FILM-SUBSTRATE
INTERFACES...................................................................69
2.11.1
ABRUPT
INTERFACE
(SINGLE
LAYER
ON
SINGLE
LAYER)...............69
2.11.2
INTERFACE
WITH
CHEMICAL
BOND.............................................69
2.11.3
DISTRIBUTED
FILM-SUBSTRATE
INTERFACES................................69
2.11.4
SEMIDISTRIBUTION
FILM-MATERIAL
INTERFACE..........................70
2.11.5
MECHANICAL
FILM-SUBSTRATE
INTERFACE..................................71
REFERENCES.......................................................................................................71
3
CHARACTERIZATION
AND
FABRICATION
METHODS
OF
TWO-DIMENSIONAL
NANOSTRUCTURES..............................................................................................81
3.1
INTRODUCTION.........................................................................................81
3.2
SILICON
(SI).............................................................................................82
3.3
DIMER-ADATOM-STACKING
FAULT
(DAS)
MODEL..................................83
3.4
AUGER
ELECTRON
SPECTROMETRY
(AES).................................................84
3.5
LOW-ENERGY
ELECTRON
DIFFRACTION
(LEED)
TECHNIQUE....................85
3.6
X-RAY
PHOTOTRANSMISSION
SPECTROMETRY..........................................85
3.7
PHYSICAL
VAPOR
DEPOSITION
(PVD)
METHODS....................................86
3.7.1
THERMAL
EVAPORATION.............................................................86
3.7.2.
EVAPORATION
SOURCES..............................................................87
3.7.2.1
RESISTIVE
HEATING....................................................88
3.7.2.2
FLASH
EVAPORATION...................................................88
3.7.2.3
ARC
EVAPORATION......................................................89
3.7.2.4
LASER
EVAPORATION...................................................91
3.7.2.5
APPLICATION
OF
ELECTRON
BOMBARDMENT...............92
3.7.2.6
EVAPORATION
THROUGH
RADIO
FREQUENCY
(RF)
HEATING............................................................93
3.7.3
SPUTTERING
METHOD.................................................................93
CONTENTS
VU
3.7.3.1
REACTIVE
AND
NONREACTIVE
PROCESSES...................93
3.7.3.2
DIODE
SPUTTERING....................................................94
3.7.3.3
RF
SPUTTERING..........................................................94
3.7.3.4
TRIODE
SPUTTERING...................................................95
3.7.3.5
MAGNETRON
SPUTTERING...........................................96
3.7.3.6
UNBALANCED
MAGNETRON
SPUTTERING.....................98
3.8
CHEMICAL
VAPOR
DEPOSITION
(CVD)................................................101
3.8.1
INTRODUCTION..........................................................................101
3.8.2
CVD
SYSTEM
REQUIREMENTS................................................105
3.8.2.1
GAS
DISTRIBUTION
SYSTEM......................................105
3.8.2.2
CVD
REACTORS........................................................105
3.8.3
PLASMA-ASSISTED
CHEMICAL
VAPOR
DEPOSITION
(PACVD)
....109
3.8.3.1
ANALYSIS
OF
PHYSICAL
AND
CHEMICAL
ASPECTS
OF
ELECTRICAL
DISCHARGE.........................................109
3.8.3.2
MAIN
PROCESSES
OF
PLASMA
MEDIUM...................112
3.8.3.3
KINETIC
AND
THERMODYNAMIC
FACTORS................113
3.8.3.4
INTERACTIONS
BETWEEN
PLASMA
AND
SURFACE............115
3.8.4
DISCHARGE
SYSTEM................................................................
117
3.8.5
ADVANTAGES
OF
THE
CVD
METHOD.......................................117
3.8.6
LIMITATIONS
AND
DISADVANTAGES
OF
CVD...........................118
3.9
MOLECULAR
BEAM
EPITAXY
(MBE)......................................................119
3.9.1
ULTRAHIGH
(UHV)
SYSTEM....................................................119
3.9.2
SUBSTRATE
HEATER
AND
PRESERVER.........................................121
3.9.3
SOURCE
CELL
FOR
MBE.............................................................121
3.10
ION
BEAM
ASSISTED
FILM
DEPOSITION...............................................122
3.10.1
PARTIALLY
IONIZED
MOLECULAR
BEAM
EPITAXY
(PI-MBE).....122
3.10.2
IMPLANT-EPITAXY
RIG............................................................123
3.10.3
IVD
TECHNIQUE.....................................................................124
3.10.4
DOUBLE
IONIC
BEAM
(DIB)
TECHNIQUE.................................126
3.10.5
IONIZED
CLUSTER
BEAM
(ICB)................................................127
3.10.5.1
PHYSICAL
PROCESS....................................................127
3.10.5.2
ICB
RIG...................................................................127
3.10.5.3
ICB
ADVANTAGES
AND
SPECIFICATIONS...................127
3.11
PULSED
LASER
DEPOSITION
(PLD).......................................................129
3.12
CHEMICAL
BATH
DEPOSITION
(CBD)....................................................130
REFERENCES.....................................................................................................135
4
MECHANICAL
FABRICATION/PROPERTIES
OF
TWO-DIMENSIONAL
NANOSTRUCTURES............................................................................................141
4.1
INTRODUCTION.......................................................................................141
4.2
MULTIPLE-LAYER
COATINGS..................................................................142
4.3
FABRICATION
METHODS
OF
MULTIPLE-LAYER
COATINGS........................144
4.3.1
MULTIPLE-LAYER
ELECTRODEPOSITION
USING
A
SINGLE
BATH.....147
4.3.2
MECHANICAL
CLEAVAGE
FOR
SYNTHESIS
OF
GRAPHENE
LAYERS....149
4.3.3
CHEMOMECHANICAL
SYNTHESIS
OF
THIN
FILMS....................150
CONTENTS
4.3.3.1
HG
X
CD,_
X
SE
THIN
FILMS........................................150
4.3.3.2
CD^ZN^E
THIN
FILMS.........................................154
4.3.4
ACHIEVING
ENHANCED
MECHANICAL
PROPERTIES..................157
4.4
EXAMINING
THE
CHARACTERISTICS
OF
THE
MULTIPLE-LAYER
COATINGS....
161
4.4.1
MECHANICAL
PROPERTIES
OF
THE
MULTIPLE-LAYER
NANOSTRUCTURES....................................................................161
4.4.2
STRENGTHENING
THEORIES
IN
MULTIPLE-LAYER
SYSTEMS.......162
4.4.2.1
OROWAN
MECHANISM............................................162
4.4.2.2
HALL-PATCH
MECHANISM.......................................162
4.4.2.3
REINFORCING
BY
VIRTUAL
FORCES............................163
4.4.3
AN
EXAMPLE
FROM
CUBIC
BORON
NITRIDE
THIN
FILMS........164
4.4.4
THE
EFFECT
OF
THE
SUPERMODULE
IN
MULTILAYER
SYSTEMS....
169
4.4.5
TRIBOLOGICAL
BEHAVIOR
OF
THE
MULTILAYER
COATINGS...........170
4.5
EXAMPLES
OF
MECHANICAL
AFFECTED
PROPERTIES
OF
TWO-DIMENSIONAL
NANOSTRUCTURES...............................................
172
4.5.1
TIN/CRN
NANOMULTILAYER
THIN
FILM................................172
4.5.2
MECHANICAL
PROPERTIES
OF
THIN
FILMS
USING
INDENTATION
TECHNIQUES.......................................................175
4.5.3
NANOSTRUCTURED
CARBON
NITRIDE
THIN
FILMS...................177
4.5.4
AU-TI0
2
NANOCOMPOSITE
THIN
FILMS................................179
4.5.5
EFFECT
OF
INTERNAL
STRESS
ON
THE
MECHANICAL
PROPERTY
OF
THIN
CN
X
FILMS................................................................181
REFERENCES.....................................................................................................185
5
CHEMICAL/ELECTROCHEMICAL
FABRICATION/PROPERTIES
OF
TWO-DIMENSIONAL
NANOSTRUCTURES
..........................................................191
5.1
INTRODUCTION.......................................................................................191
5.2
HISTORY................................................................................................191
5.3
DIRECT
WRITING
OF
METAL
NANOSTRUCTURES.......................................193
5.4
THEORY
AND
THERMODYNAMIC
METHOD
OF
CODEPOSITION..............196
5.4.1
NUCLEATION.............................................................................196
5.4.2
GROWTH...................................................................................199
5.4.3
OSTWALD
RIPENING................................................................200
5.4.4
FINAL
GROWTH
AND
FORMATION
OF
STABLE
NANOPARTICLES......201
5.5
PHASE
TRANSITION
OF
TWO-DIMENSIONAL
NANOSTRUCTURE
BY
ELECTROCHEMICAL
POTENTIAL................................................................206
5.6
PROCUREMENT
OF
NANOMATERIALS
THROUGH
DEPOSITION...................210
5.6.1
PROCUREMENT
OF
METALS
FROM
AQUEOUS
SOLUTIONS............210
5.6.2
DEPOSITION
OF
METALS
BY
REDUCTION
OF
NONAQUEOUS
SOLUTIONS................................................................................213
5.6.3
DEPOSITION
OF
OXIDES
FROM
AQUEOUS
SOLUTIONS...............219
CONTENTS
IX
5.6.4
DEPOSITION
OF
OXIDES
FROM
NONAQUEOUS
SOLUTIONS........222
5.6.5
NANOIMPRINT
LITHOGRAPHY
FOR
FABRICATION
OF
PLASMONIC
ARRAYS.................................................................223
5.7
CONCLUSION..........................................................................................228
REFERENCES.....................................................................................................229
6
PHYSICAL
AND
OTHER
FABRICATION/PROPERTIES
OF
TWO-DIMENSIONAL
NANOSTRUCTURES............................................................................................235
6.1
INTRODUCTION.......................................................................................235
6.2
CONCEPTS
OF
NANOSTRUCTURED
THIN
FILMS.......................................235
6.3
IMPORTANT
PHYSICAL
FABRICATION
METHODS......................................239
6.3.1
EXCIMER
LASER.......................................................................239
6.3.2
MOLECULAR
BEAM
EPITAXY
(MBE).........................................239
6.3.3
ION
IMPLANTATION...................................................................240
6.3.4
FOCUSED
ION
BEAM
(FIB)
IN
NANOTECHNOLOGY...................241
6.3.5
FIB-SEM
DUAL
BEAM
SYSTEM..............................................241
6.3.6
LANGMUIR-BLODGETT
FILM
(LBF)..........................................242
6.3.7
ELECTROSPINNING....................................................................243
6.4
SPECIFICATION
OF
SCULPTURED
THIN
FILMS......................................
V
.
243
6.5
PHASE,
LENGTH,
AND
TIME
SANDWICH...............................................248
6.6
A
MODEL
TO
MAKE
A
RELATION
BETWEEN
FEATURES
AND
STRUCTURES
OF
DIELECTRIC
FLELICOIDAL
SCULPTURED
THIN
FILMS........257
6.7
ANALYSIS
OF
PRECISE
COUPLE
WAVE
FOR
THE
INCIDENT
TRANSVERSE
WAVE.....................................................266
6.8
PHYSICAL
PRINCIPLES
AND
APPLICATIONS
OF
DIFFERENT
FABRICATION
METHODS.........................................................................274
6.8.1
EXCIMER
LASER.......................................................................274
6.8.2
MOLECULAR
BEAM
EPITAXY
(MBE).........................................275
6.8.3
ION
IMPLANTATION...................................................................277
6.8.3.1
DOPING...................................................................278
6.8.3.2
MESOTAXY...............................................................279
6.8.3.3
SURFACE
OPERATIONS...............................................279
6.8.3.4
AMORPHOUS
FABRICATION.......................................280
6.8.4
FOCUSED
ION
BEAM
(FIB)
IN
NANOTECHNOLOGY...................280
6.8.5
FIB-SEM
DUAL
BEAM
SYSTEM..............................................281
6.8.6
LANGMUIR-BLODGETT
FILM
(LBF)..........................................281
6.8.7
ELECTROSPINNING....................................................................282
REFERENCES.....................................................................................................283
INDEX
293
|
| any_adam_object | 1 |
| author | Aliofkhazraei, Mahmood Ali, Nasar |
| author_GND | (DE-588)1058846957 |
| author_facet | Aliofkhazraei, Mahmood Ali, Nasar |
| author_role | aut aut |
| author_sort | Aliofkhazraei, Mahmood |
| author_variant | m a ma n a na |
| building | Verbundindex |
| bvnumber | BV040235766 |
| callnumber-first | T - Technology |
| callnumber-label | TA418 |
| callnumber-raw | TA418.9.N35 |
| callnumber-search | TA418.9.N35 |
| callnumber-sort | TA 3418.9 N35 |
| callnumber-subject | TA - General and Civil Engineering |
| classification_rvk | ZN 3700 |
| ctrlnum | (OCoLC)796267016 (DE-599)BVBBV040235766 |
| dewey-full | 620.1/15 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
| dewey-raw | 620.1/15 |
| dewey-search | 620.1/15 |
| dewey-sort | 3620.1 215 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV040235766 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T00:19:39Z |
| institution | BVB |
| isbn | 9781439866658 |
| language | English |
| lccn | 2012005186 |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-025092077 |
| oclc_num | 796267016 |
| open_access_boolean | |
| owner | DE-20 DE-29T |
| owner_facet | DE-20 DE-29T |
| physical | XIII, 307 S. Ill., graph. Darst. |
| publishDate | 2012 |
| publishDateSearch | 2012 |
| publishDateSort | 2012 |
| publisher | CRC Press |
| record_format | marc |
| spelling | Aliofkhazraei, Mahmood Verfasser (DE-588)1058846957 aut Two-dimensional nanostructures Mahmood Aliofkhazraei ; Nasar Ali Boca Raton, Fla. [u.a.] CRC Press 2012 XIII, 307 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Includes bibliographical references and index Nanostructured materials TECHNOLOGY & ENGINEERING / Material Science bisacsh Nanostruktur (DE-588)4204530-7 gnd rswk-swf Dimension 2 (DE-588)4321721-7 gnd rswk-swf Nanostruktur (DE-588)4204530-7 s Dimension 2 (DE-588)4321721-7 s DE-604 Ali, Nasar Verfasser aut HBZ Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=025092077&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Aliofkhazraei, Mahmood Ali, Nasar Two-dimensional nanostructures Nanostructured materials TECHNOLOGY & ENGINEERING / Material Science bisacsh Nanostruktur (DE-588)4204530-7 gnd Dimension 2 (DE-588)4321721-7 gnd |
| subject_GND | (DE-588)4204530-7 (DE-588)4321721-7 |
| title | Two-dimensional nanostructures |
| title_auth | Two-dimensional nanostructures |
| title_exact_search | Two-dimensional nanostructures |
| title_full | Two-dimensional nanostructures Mahmood Aliofkhazraei ; Nasar Ali |
| title_fullStr | Two-dimensional nanostructures Mahmood Aliofkhazraei ; Nasar Ali |
| title_full_unstemmed | Two-dimensional nanostructures Mahmood Aliofkhazraei ; Nasar Ali |
| title_short | Two-dimensional nanostructures |
| title_sort | two dimensional nanostructures |
| topic | Nanostructured materials TECHNOLOGY & ENGINEERING / Material Science bisacsh Nanostruktur (DE-588)4204530-7 gnd Dimension 2 (DE-588)4321721-7 gnd |
| topic_facet | Nanostructured materials TECHNOLOGY & ENGINEERING / Material Science Nanostruktur Dimension 2 |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=025092077&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT aliofkhazraeimahmood twodimensionalnanostructures AT alinasar twodimensionalnanostructures |