Atomic layer deposition of nanostructured materials:
Gespeichert in:
| Weitere Verfasser: | |
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| Format: | Buch |
| Sprache: | English |
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Weinheim
Wiley-VCH
2012
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| Online-Zugang: | Inhaltstext Inhaltsverzeichnis |
| Beschreibung: | XXXVI, 435 S. Ill., graph. Darst. |
| ISBN: | 9783527327973 3527327975 |
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| 300 | |a XXXVI, 435 S. |b Ill., graph. Darst. | ||
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Datensatz im Suchindex
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IMAGE 1
IX
CONTENTS
FOREWORD V PREFACE XVII
INTRODUCTION XXI
LIST OF CONTRIBUTORS XXXIII
PART ONE INTRODUCTION TO ALD 1
1 THEORETICAL MODELING OF ALD PROCESSES 3 CHARLES B. MUSGRAVE 1.1
INTRODUCTION 3
1.2 OVERVIEW OF ATOMISTIC SIMULATIONS 3 1.2.1 QUANTUM SIMULATIONS 4
1.2.2 WAVE FUNCTION-BASED QUANTUM SIMULATIONS 5 1.2.3 DENSITY
FUNCTIONAL-BASED QUANTUM SIMULATIONS 6 1.2.4 FINITE AND EXTENDED QUANTUM
SIMULATIONS 8 1.2.5 BASIS SET EXPANSIONS 9
1.3 CALCULATION OF PROPERTIES USING QUANTUM SIMULATIONS 10 1.3.1
CALCULATION OF TRANSITION STATES AND ACTIVATION BARRIERS 10 1.3.2
CALCULATION OF RATES OF REACTION 12 1.4 PREDICTION OF ALD CHEMICAL
MECHANISMS 13
1.4.1 GAS-PHASE REACTIONS IN ALD 14 1.4.2 SURFACE REACTIONS IN ALD 14
1.4.2.1 ADSORPTION REACTIONS IN ALD 14 1.4.2.2 IIGAND EXCHANGE REACTIONS
15 1.5 EXAMPLE OF A CALCULATED ALD MECHANISM: ALD OF A1 2 O 3
USING TM A AND WATER 1 6
REFERENCES 20
2 STEP COVERAGE IN ALD 23
SOVAN KUMAR PANDA AND HYUNJUNG SHIN 2.1 INTRODUCTION 23
2.2 GROWTH TECHNIQUES 24
2.3 STEP COVERAGE MODELS IN ALD 28
BIBLIOGRAFISCHE INFORMATIONEN HTTP://D-NB.INFO/1012093832
DIGITALISIERT DURCH
IMAGE 2
CONTENTS
2.3.1 GORDON'S MODEL FOR STEP COVERAGE 28 2.3.1.1 PARAMETERS FOR STEP
COVERAGE 28 2.3.2 KIM'S MODEL FOR STEP COVERAGE 31 2.4 EXPERIMENTAL
VERIFICATIONS OF STEP COVERAGE MODELS 34 2.5 SUMMARY 38
REFERENCES 38
3 PRECURSORS FOR ALD PROCESSES 41 MATTI PUTKONEN 3.1 INTRODUCTION 41
3.2 GENERAL REQUIREMENTS FOR ALD PRECURSORS 42 3.3 METALLIC PRECURSORS
FOR ALD 42
3.3.1 INORGANIC PRECURSORS 44
3.3.1.1 ELEMENTAL PRECURSORS 44 3.3.1.2 HALIDES 44
3.3.1.3 OXYGEN-COORDINATED COMPOUNDS 44 3.3.1.4 NITROGEN-COORDINATED
PRECURSORS 46 3.3.1.5 PRECURSORS COORDINATED THROUGH OTHER INORGANIC
ELEMENTS 46 3.3.2 ORGANOMETALLIC ALD PRECURSORS 47
3.3.2.1 METAL ALKYLS 47 3.3.2.2 CYCLOPENTADIENYL-TYPE COMPOUNDS 47
3.3.2.3 OTHER ORGANOMETALLIC PRECURSORS 49 3.4 NONMETAL PRECURSORS FOR
ALD 49
3.4.1 REDUCING AGENTS 49
3.4.2 OXYGEN SOURCES 49
3.4.3 NITROGEN SOURCES 50
3.4.4 SULFUR ANT OTHER CHALCOGENIDE PRECURSORS 50 3.5 CONCLUSIONS 50
REFERENCES 51
4 SOL-GEL CHEMISTRY AND ATOMIC LAYER DEPOSITION 61 CUYLHAINE CLAVEL,
CATHERINE MARICHY, AND NICOLA PINNA 4.1 AQUEOUS AND NONAQUEOUS SOL-GEL
IN SOLUTION 61 4.1.1 AQUEOUS SOL-GEL 61
4.1.1.1 INTRODUCTION 61 4.1.1.2 DEVELOPMENT OF SOL-GEL CHEMISTRY 61
4.1.2 NONAQUEOUS SOL-GEL 62
4.1.2.1 INTRODUCTION 62 4.1.2.2 SYNTHESIS OF NANOMATERIALS 63 4.2
SOL-GEL AND ALD: AN OVERVIEW 63 4.2.1 METAL OXIDE FORMATION VIA
HYDROLYTIC ROUTES 64 4.2.1.1 REACTION WITH METAL HALIDES 64 4.2.1.2
REACTION WITH METAL ALKOXIDE 65 4.2.1.3 REACTION WITH ORGANOMETALLIC
COMPOUNDS 66 4.2.2 METAL OXIDE DEPOSITION UNDER NONAQUEOUS CONDITIONS 67
IMAGE 3
CONTENTS XI
4.2.2.1 ALKYL HALIDE ELIMINATION 67
4.2.2.2 ETHER ELIMINATION 68 4.2.2.3 ESTER ELIMINATION 68 4.2.2.4 OTHER
REACTIONS 69 4.2.3 CONCLUDING REMARKS 69 4.3 MECHANISTIC AND IN SITU
STUDIES 70
4.3.1 GENERAL CONSIDERATIONS 71 4.3.1.1 DIFFERENCES BETWEEN SOL-GEL IN
SOLUTION AND IN ALD 71 4.3.1.2 REACTION MECHANISM STUDY 71 4.3.2
COMPARISON OF SELECTED REACTIONS 72 4.3.2.1 CASE OF THE SILICA
DEPOSITION 72 4.3.2.2 CASE OF ALKYL HALIDE CONDENSATION 75 4.3.3
CONCLUSIONS 76
REFERENCES 76
5 MOLECULAR LAYER DEPOSITION OF HYBRID ORGANIC-INORGANIC FILMS 83 STEVEN
M. GEORGE, B. YOON, ROBERT A HALL, AZIZ I. ABDULAGATOV, ZACHARY M.
CIBBS, YOUNGHEE LEE, DRAGOS SEGHETE, AND BYOUNG H. LEE 5.1 INTRODUCTION
83
5.2 GENERAL ISSUES FOR MLD OF HYBRID ORGANIC-INORGANIC FILMS 85 5.3 MLD
USING TRIMETHYLALUMINUM AND ETHYLENE GLYCOL IN AN AB PROCESS 87 5.4
EXPANSION TO AN ABC PROCESS USING HETEROBIFUNCTIONAL AND
RING-OPENING PRECURSORS 89 5.5 USE OF A HOMOTRIFUNCTIONAL PRECURSOR TO
PROMOTE CROSS-LINKING IN AN AB PROCESS 93 5.6 USE OF A
HETEROBIFUNCTIONAL PRECURSOR IN AN ABC PROCESS 96 5.7 MLD OF HYBRID
ALUMINA-SILOXANE FILMS USING AN
ABCD PROCESS 99
5.8 FUTURE PROSPECTS FOR MLD OF HYBRID ORGANIC-INORGANIC FILMS 103
REFERENCES 106
6 LOW-TEMPERATURE ATOMIC LAYER DEPOSITION 109 JENS MEYER AND THOMAS
RIEDL 6.1 INTRODUCTION 109
6.2 CHALLENGES OF LT-ALD 110 6.3 MATERIALS AND PROCESSES 1 13
6.4 TOWARD NOVEL LT-ALD PROCESSES 115 6.5 THIN FILM GAS DIFFUSION
BARRIERS 117 6.6 ENCAPSULATION OF ORGANIC ELECTRONICS 119 6.6.1
ENCAPSULATION OF ORGANIC LIGHT EMITTING DIODES 119 6.6.2 ENCAPSULATION
OF ORGANIC SOLAR CELLS 123
6.7 CONCLUSIONS 125
REFERENCES 125
IMAGE 4
XII CONTENTS
7 PLASMA ATOMIC LAYER DEPOSITION 131
ERWIN KESSELS, HARALD PROFIJT, STEPHEN POTTS, AND RICHARD VAN DE SONDEN
7.1 INTRODUCTION 131
7.2 PLASMA BASICS 134
7.3 PLASMA ALD CONFIGURATIONS 139 7.4 MERITS OF PLASMA ALD 142
7.5 CHALLENGES FOR PLASMA ALD 149
7.6 CONCLUDING REMARKS AND OUTIOOK 153 REFERENCES 154
PART TWO NANOSTRUCTURES BY ALD 159
8 ATOMIC LAYER DEPOSITION FOR MICROELECTRONIC APPLICATIONS 161 CHEOL
SEONG HWANG 8.1 INTRODUCTION 161
8.2 ALD LAYERS FOR MEMORY DEVICES 162 8.2.1 MASS PRODUCTION LEVEL
MEMORIES 162 8.2.1.1 DYNAMIC RANDOM ACCESS MEMORY 163 8.2.1.2 FLASH
MEMORY 168 8.2.1.3 PHASE CHANGE MEMORY 172 8.2.2 EMERGING MEMORIES 174
8.2.2.1 FERROELECTRIC MEMORY 175 8.2.2.2 MAGNETIC RANDOM ACCESS MEMORY
178 8.2.2.3 RESISTIVE RANDOM ACCESS MEMORY 178 8.2.3 THREE-DIMENSIONAL
STACKED MEMORIES 179 8.3 ALD FOR LOGIC DEVICES 180
8.3.1 FRONT END OF THE LINE PROCESS 180
8.3.2 BACK END OF THE LINE PROCESS 185
8.4 CONCLUDING REMARKS 187
REFERENCES 188
9 NANOPATTERNING BY AREA-SELECTIVE ATOMIC LAYER DEPOSITION 193
HAN-BO-RAM LEE AND STACEY F. BENT 9.1 CONCEPT OF AREA-SELECTIVE ATOMIC
LAYER DEPOSITION 193 9.2 CHANGE OF SURFACE PROPERTIES 195
9.2.1 SELF-ASSEMBLED MONOLAYERS 195 9.2.2 POLYMERS 201
9.2.3 INHERENT SURFACE REACTIVITY 203 9.2.4 VAPOR-PHASE DEPOSITION 204
9.3 PATTERNING 205
9.3.1 SURFACE MODIFICATION WITHOUT PATTERNING 205 9.3.2 MICROCONTACT
PRINTING 205 9.3.3 PHOTOLITHOGRAPHY 207 9.3.4 NANOTEMPLATING 212
9.3.5 SCANNING PROBE MICROSCOPY 213
IMAGE 5
CONTENTS XIII
9.4 APPLICATIONS OF AS-ALD 215
9.5 CURRENT CHALLENGES 216
REFERENCES 218
10 COATINGS ON HIGH ASPECT RATIO STRUCTURES 227 JEFFREY W. ELAM 10.1
INTRODUCTION 227
10.2 MODELS AND ANALYSIS 228 10.2.1 ANALYTICAL METHOD 229 10.2.2 MONTE
CARLO SIMULATIONS 229 10.3 CHARACTERIZATION METHODS FOR ALD COATINGS IN
HIGH ASPECT
RATIO STRUCTURES 230 10.4 EXAMPLES OF ALD IN HIGH ASPECT RATIO
STRUCTURES 232 10.4.1 ASPECT RATIO OF 10 232 10.4.1.1 TRENCHES 232
10.4.1.2 MEMS 233 10.4.2 ASPECT RATIO OF 100 234 10.4.2.1 ANODIC
ALUMINUM OXIDE 234 10.4.2.2 INVERSE OPALS 237 10.4.3 ASPECT RATIO OF
1000 AND BEYOND 238 10.4.3.1 SILICA GEL 238 10.4.3.2 AEROGELS 240 10.5
NONIDEAL BEHAVIOR DURING ALD IN HIGH ASPECT
RATIOS 242
10.6 CONCLUSIONS AND FUTURE OUTLOOK 245 REFERENCES 246
11 COATINGS OF NANOPARTICLES AND NANOWIRES 251 HONG JIN FAN AND
KORNELIUS NIELSCH 11.1 ALD ON NANOPARTICLES 251 11.2 VAPOR-IIQUID-SOLID
GROWTH OF NANOWIRES BY ALD 254
11.3 ATOMIC LAYER EPITAXY ON NANOWIRES 256 11.4 ALD ON SEMICONDUCTOR NWS
FOR SURFACE PASSIVATION 257 11.5 ALD-ASSISTED FORMATION OF NANOPEAPODS
258 11.6 PHOTOCORROSION OF SEMICONDUCTOR NANOWIRES CAPPED BY
ALD SHELL 260
11.7 INTERFACE REACTION OF NANOWIRES WITH ALD SHELL 261 11.7.1 ZNO-AL 2
O 3 261
11.7.2 ZNO-TIO 2 262
11.7.3 ZNO-SIO 2 264
11.7.4 MGO-AL 2 O 3 265
11.8 ALD ZNO ON NWS/TUBES AS SEED LAYER FOR GROWTH OF HYPERBRANCH 265
11.9 CONCLUSIONS 267
REFERENCES 268
IMAGE 6
XIV CONTENTS
12 ATOMIC LAYER DEPOSITION ON SOFT MATERIALS 271
GREGORY N. PARSONS
12.1 INTRODUCTION 271
12.2 ALD ON POLYMERS FOR PASSIVATION, ENCAPSULATION, AND SURFACE
MODIFICATION 274 12.3 ALD FOR BULK MODIFICATION OF NATURAL AND SYNTHETIC
POLYMERS AND MOLECULES 279 12.4 ALD FOR POLYMER SACRIFICIAL TEMPLATING:
MEMBRANES, FIBERS,
AND BIOLOGICAL AND OPTICAL STRUCTURES 280 12.5 ALD NUCLEATION ON
PATTERNED AND PLANAR SAMS AND SURFACE OLIGOMERS 283 12.6 REACTIONS
DURING A1 2 O 3 ALD ON REPRESENTATIVE POLYMER
MATERIALS 286
12.6.1 A1 2 O 3 ALD ON POLYPROPYLENE 286 12.6.2 A1 2 O 3 ALD ON
POLYVINYL ALCOHOL 288 12.6.3 A1 2 O 3 ALD ON POLYAMIDE 6 289 12.6.4
MECHANISMS FOR A1 2 O 3 ALD ON PP, PVA, AND PA-6 290 12.7 SUMMARY 291
REFERENCES 292
13 APPLICATION OF ALD TO BIOMATERIALS AND BIOCOMPATIBLE COATINGS 301
MATO KNEZ 13.1 APPLICATION OF ALD TO BIOMATERIALS 302 13.1.1
PROTEIN-BASED NANOSTRUCTURES 302 13.1.1.1 TOBACCO MOSAIC VIRUS 302
13.1.1.2 FERRITIN AND APOFERRITIN 304 13.1.1.3 S-LAYERS 304 13.1.2
PEPTIDE ASSEMBLIES 305 13.1.3 NATURAL FIBERS 307 13.1.3.1 DNA 307
13.1.3.2 COLLAGEN 308 13.1.3.3 SPIDER SILK 308 13.1.3.4 CELLULOSE FIBERS
FROM PAPER 310
13.1.3.5 COTTON FIBERS 310 13.1.3.6 SEA MOUSE BRISTLES 311 13.1.4
PATTERNED BIOMATERIALS 312 13.1.4.1 BUTTERFLY WINGS 312
13.1.4.2 FLY EYES 314 13.1.4.3 LEGUMES 315 13.1.4.4 WATER STRIDER LEGS
315
13.1.5 BIOMINERALIZED STRUCTURES 316 13.2 BIOCOMPATIBLE COATINGS 317
13.2.1 BIOCOMPATIBILITY OF ALUMINA 317 13.2.2 BIOCOMPATIBILITY OF
TITANIA 318 13.2.3 BIOCOMPATIBILITY OF HYDROXYAPATITE 318
IMAGE 7
CONTENTS XV
13.2.4 BIOCOMPATIBILITY OF PT-, TIO 2 -, OR ZNO-COATED POROUS ALUMINA
318
13.2.5 BIOCOMPATIBILITY OF TIN-COATED COTTON FABRICS 319 13.3 SUMMARY
320
REFERENCES 321
14 COATING OF CARBON NANOTUBES 327 CATHERINE MARICHY, ANDREA PUCCI,
MARC-GEORG WILLINGER, AND NICOLA PINNA 14.1 INTRODUCTION 327
14.2 PURIFICATION AND SURFACE FUNCTIONALIZATION OF CARBON NANOTUBES 328
14.3 DECORATION/COATING OF CARBON NANOTUBES BY SOLUTION ROUTES 329
14.3.1 IN SITU COATING 329 14.3.2 ATTACHMENT OF PREFORMED NANOBUILDING
BLOCKS 330 14.4 DECORATION/COATING OF CARBON NANOTUBES BY GAS-PHASE
TECHNIQUES 330
14.5 ATOMIC LAYER DEPOSITION ON CARBON NANOTUBES 331 14.6 COATING OF
LARGE QUANTITY OF CNTS BY ALD 337 14.7 ALD COATING OF OTHER SP 2 -BONDED
CARBON MATERIALS 338 14.8 CONCLUSIONS 340
REFERENCES 340
15 INVERSE OPAL PHOTONICS 345 DAVY P. GAILLOT AND CHRISTOPHERJ. SUMMERS
15.1 INTRODUCTION AND BACKGROUND 345 15.2 PROPERTIES OF
THREE-DIMENSIONAL PHOTONIC BAND STRUCTURES 349 15.2.1 SYNTHETIC OPALS
AND INVERSE OPALS 349 15.3 LARGE-PORE AND NON-CLOSE-PACKED INVERSE OPALS
352
15.4 EXPERIMENTAL STUDIES 353 15.4.1 INVERSION OF OPAL STRUCTURES 353
15.4.2 ATOMIC LAYER DEPOSITION 357
15.4.3 MULTILAYER FABRICATION STEPS FOR ADVANCED PHOTONIC CRYSTALS 360
15.5 TUNABLE PC STRUCTURES 366 15.6 SUMMARY 369
REFERENCES 371
16 NANOLAMINATES 377
ADRIANA V. SZEGHALMI AND MATO KNEZ 16.1 INTRODUCTION 377
16.2 OPTICAL APPLICATIONS 377 16.2.1 INTERFERENCE OPTICS 377 16.2.2
DIFFRACTIVE OPTICAL ELEMENTS 381 16.3 THIN FILM ENCAPSULATION 383
16.4 APPLICATIONS IN ELECTRONICS 386 16.4.1 DIELECTRIC PROPERTIES OF
INORGANIC NANOLAMINATES 387 16.4.2 DIELECTRIC PROPERTIES OF
ORGANIC-INORGANIC NANOLAMINATES 390
IMAGE 8
XVI
CONTENTS
16.4.3 16.5 16.6 16.7 16.8
17
17.1 17.2 17.3 17.4 17.4.1
17.4.2 17.4.3 17.4.4 17.4.5 17.4.6 17.4.7 17.5 17.6 17.7
APPLICATIONS FOR MEMORIES 391 COPPER ELECTROPLATING APPLICATIONS 392
SOLID OXIDE FUEL CELLS 393 COMPLEX NANOSTRUCTURES 394
SUMMARY 395 REFERENCES 396
CHALLENGES IN ATOMIC LAYER DEPOSITION 401 MARKKU LESKELAE INTRODUCTION
401 METALS 402 NONMETAL ELEMENTS 404
BINARY COMPOUNDS 406 OXIDES 406 NITRIDES 408 OTHER III-V COMPOUNDS 410
CARBIDES 410
SUICIDES AND BORIDES 412 HALIDES 412 COMPOUNDS WITH OXOANIONS 413
TERNARY AND QUATERNARY COMPOUNDS 414 NUDEATION 415 CONCLUSIONS 416
REFERENCES 417
INDEX 423 |
| any_adam_object | 1 |
| author2 | Pinna, Nicola |
| author2_role | edt |
| author2_variant | n p np |
| author_facet | Pinna, Nicola |
| building | Verbundindex |
| bvnumber | BV039870044 |
| classification_rvk | UP 7550 |
| classification_tum | FER 882f WER 035f |
| ctrlnum | (OCoLC)768067387 (DE-599)DNB1012093832 |
| dewey-full | 671.735 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 671 - Metalworking & primary metal products |
| dewey-raw | 671.735 |
| dewey-search | 671.735 |
| dewey-sort | 3671.735 |
| dewey-tens | 670 - Manufacturing |
| discipline | Physik Werkstoffwissenschaften Fertigungstechnik Werkstoffwissenschaften / Fertigungstechnik |
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| id | DE-604.BV039870044 |
| illustrated | Illustrated |
| indexdate | 2024-07-21T00:23:41Z |
| institution | BVB |
| isbn | 9783527327973 3527327975 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-024729394 |
| oclc_num | 768067387 |
| open_access_boolean | |
| owner | DE-29T DE-11 DE-91G DE-BY-TUM DE-19 DE-BY-UBM DE-523 |
| owner_facet | DE-29T DE-11 DE-91G DE-BY-TUM DE-19 DE-BY-UBM DE-523 |
| physical | XXXVI, 435 S. Ill., graph. Darst. |
| publishDate | 2012 |
| publishDateSearch | 2012 |
| publishDateSort | 2012 |
| publisher | Wiley-VCH |
| record_format | marc |
| spelling | Atomic layer deposition of nanostructured materials ed. by Nicola Pinna ... Weinheim Wiley-VCH 2012 XXXVI, 435 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Nanostrukturiertes Material (DE-588)4342626-8 gnd rswk-swf Atomlagenabscheidung (DE-588)7712127-2 gnd rswk-swf Atomlagenabscheidung (DE-588)7712127-2 s Nanostrukturiertes Material (DE-588)4342626-8 s DE-604 Pinna, Nicola edt X:MVB text/html http://deposit.dnb.de/cgi-bin/dokserv?id=3830291&prov=M&dok_var=1&dok_ext=htm Inhaltstext DNB Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=024729394&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Atomic layer deposition of nanostructured materials Nanostrukturiertes Material (DE-588)4342626-8 gnd Atomlagenabscheidung (DE-588)7712127-2 gnd |
| subject_GND | (DE-588)4342626-8 (DE-588)7712127-2 |
| title | Atomic layer deposition of nanostructured materials |
| title_auth | Atomic layer deposition of nanostructured materials |
| title_exact_search | Atomic layer deposition of nanostructured materials |
| title_full | Atomic layer deposition of nanostructured materials ed. by Nicola Pinna ... |
| title_fullStr | Atomic layer deposition of nanostructured materials ed. by Nicola Pinna ... |
| title_full_unstemmed | Atomic layer deposition of nanostructured materials ed. by Nicola Pinna ... |
| title_short | Atomic layer deposition of nanostructured materials |
| title_sort | atomic layer deposition of nanostructured materials |
| topic | Nanostrukturiertes Material (DE-588)4342626-8 gnd Atomlagenabscheidung (DE-588)7712127-2 gnd |
| topic_facet | Nanostrukturiertes Material Atomlagenabscheidung |
| url | http://deposit.dnb.de/cgi-bin/dokserv?id=3830291&prov=M&dok_var=1&dok_ext=htm http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=024729394&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT pinnanicola atomiclayerdepositionofnanostructuredmaterials |