Laser processing and chemistry:
Gespeichert in:
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| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Berlin [u.a.]
Springer
2011
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| Ausgabe: | 4. ed. |
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| Online-Zugang: | Inhaltstext Inhaltsverzeichnis |
| Beschreibung: | XXII, 851 S. Ill., graph. Darst. |
| ISBN: | 9783642176128 3642176127 |
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Datensatz im Suchindex
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IMAGE 1
CONTENTS
PART I OVERVIEW AND FUNDAMENTALS
1 INTRODUCTION 3
1 .1 CONVENTIONAL LASER PROCESSING 4
1.2 LASER CHEMICAL PROCESSING 7
1.2.1 THERMAL ACTIVATION 7
1.2.2 NON-THERMAL ACTIVATION 9
1.2.3 LOCAL AND LARGE-AREA PROCESSING 10
1.2.4 COMPARISON OF TECHNIQUES 10
1.2.5 PLANAR AND NON-PLANAR PROCESSING 12
2 THERMAL, PHOTOPHYSICAL, AND PHOTOCHEMICAL PROCESSES 13 2.1 EXCITATION
MECHANISMS, RELAXATION TIMES 13
2.1.1 THERMAL PROCESSES 15
2.1.2 PHOTOCHEMICAL PROCESSES 16
2.1.3 PHOTOPHYSICAL PROCESSES 17
2.1.4 A SIMPLE MODEL 17
2.1.5 CHEMICAL RELAXATION 18
2.2 THE HEAT EQUATION 19
2.2.1 THE SOURCE TERM 19
2.2.2 DIMENSIONALITY OF HEAT FLOW 21
2.2.3 KIRCHHOFF AND CRANK TRANSFORMS 21
2.2.4 PHASE CHANGES 22
2.2.5 LIMITS OF VALIDITY 23
2.3 SELECTIVE EXCITATIONS OF MOLECULES 25
2.3.1 ELECTRONIC EXCITATIONS 26
2.3.2 INFRARED VIBRATIONAL EXCITATIONS 29
2.4 SURFACE EXCITATIONS 35
2.4.1 EXTERNAL PHOTOEFFECT 35
2.4.2 INTERNAL PHOTOEFFECT 35
2.4.3 ELECTROMAGNETIC FIELD ENHANCEMENT, CATALYTIC EFFECTS 37
2.4.4 ADSORBED MOLECULES 37
BIBLIOGRAFISCHE INFORMATIONEN HTTP://D-NB.INFO/1008091057
DIGITALISIERT DURCH
IMAGE 2
CONTENTS
3 REACTION KINETICS AND TRANSPORT OF SPECIES 39
3. 1 PHOTOTHERMAL REACTIONS 41
3.2 PHOTOCHEMICAL REACTIONS 43
3.3 THE CONCENTRATION OF SPECIES 45
3.3.1 BASIC EQUATIONS 45
3.3.2 DEPENDENCE OF COEFFICIENTS ON TEMPERATURE AND CONCENTRATION 49
3.4 HETEROGENEOUS REACTIONS 51
3.4.1 STATIONARY EQUATIONS 52
3.4.2 TRANSPORT LIMITATIONS 53
3.4.3 DYNAMIC SOLUTIONS 57
3.4.4 HETEROGENEOUS VERSUS HOMOGENEOUS ACTIVATION 59 3.5 COMBINED
HETEROGENEOUS AND HOMOGENEOUS REACTIONS 59 3.5.1 THE BOUNDARY-VALUE
PROBLEM 60
3.5.2 APPROXIMATE SOLUTIONS 61
3.6 HOMOGENEOUS PHOTOCHEMICAL ACTIVATION 62
4 NUCLEATION AND CLUSTER FORMATION 63
4.1 HOMOGENEOUS PROCESSES 63
4.1.1 CLASSICAL KINETICS 64
4.1.2 DROPLETS WITHIN A LASER BEAM 66
4.1.3 TRANSPORT OF CLUSTERS, THERMOPHORESIS, CHEMOPHORESIS 70
4.1.4 FRAGMENTATION OF PARTICLES 70
4.2 NANOPARTICLE FORMATION BY PULSED-LASER ABLATION 71
4.2.1 GASEOUS AMBIENT 71
4.2.2 LIQUID AMBIENT 76
4.3 HETEROGENEOUS PROCESSES 76
4.3.1 NUCLEATION IN LCVD 77
4.3.2 CONDENSATION OF CLUSTERS FROM VAPOR/PLASMA PLUMES . 79 4.3.3
NANOTUBE FORMATION BY LASER-CVD 82
4.3.4 SHAPING OF NANOPARTICLES 83
4.3.5 CLUSTER FORMATION WITHIN SOLID SURFACES 83
5 LASERS, EXPERIMENTAL ASPECTS, SPATIAL CONFINEMENT 85
5.1 LASERS 85
5.1.1 CW LASERS, GAUSSIAN BEAMS 85
5.1.2 PULSED AND HIGH-POWER CW LASERS 87
5.1.3 SEMICONDUCTOR LASERS 89
5.2 EXPERIMENTAL ASPECTS 90
5.2.1 MICRO'/NANOPROCESSING 90
5.2.2 THE REACTION CHAMBER; TYPICAL SETUP 95
5.2.3 LARGE-AREA PROCESSING 96
5.2.4 SUBSTRATES 98
5.3 CONFINEMENT OF THE EXCITATION 98
5.3.1 THE THERMAL FIELD 99
5.3.2 NON-THERMAL SUBSTRATE EXCITATIONS 99
IMAGE 3
CONTENTS XI
5.3.3 GAS-, LIQUID- AND ADSORBED-PHASE EXCITATIONS 99 5.3.4 PLASMA
FORMATION 100
5.3.5 MATERIAL DAMAGES 100
5.3.6 NON-LINEARITIES 100
5.3.7 OPTICAL NEAR-FIELD AND FIELD-ENHANCEMENT EFFECTS . . 104
PART II TEMPERATURE DISTRIBUTIONS AND SURFACE MELTING
6 GENERAL SOLUTIONS OF THE HEAT EQUATION I LL
6.1 THE BOUNDARY-VALUE PROBLEM I LL
6.1.1 THE ATTENUATION FUNCTION, F(Z) 112
6.1.2 BOUNDARY AND INITIAL CONDITIONS 113
6.2 ANALYTICAL SOLUTIONS 116
6.3 PULSE SHAPES 118
6.3.1 SINGLE RECTANGULAR PULSE 118
6.3.2 TRIANGULAR PULSE 120
6.3.3 SMOOTH PULSE 120
6.3.4 MULTIPLE-PULSE IRRADIATION 121
6.4 BEAM SHAPES 122
6.4.1 CIRCULAR BEAM 122
6.4.2 RECTANGULAR BEAM 123
6.4.3 UNIFORM ILLUMINATION 123
6.5 CHARACTERISTICS OF TEMPERATURE DISTRIBUTIONS 123
6.5.1 CENTER-TEMPERATURE RISE 124
6.5.2 WIDTH OF DISTRIBUTION 124
6.6 NUMERICAL TECHNIQUES 126
7 SEMI-INFINITE SUBSTRATES 127
7.1 THE CENTER-TEMPERATURE RISE 127
7.1.1 GAUSSIAN BEAM 127
7.1.2 CIRCULAR LASER BEAM 128
7.1.3 RECTANGULAR BEAM 128
7.2 STATIONARY SOLUTIONS FOR TEMPERATURE-INDEPENDENT PARAMETERS . 129
7.2.1 SURFACE ABSORPTION 130
7.2.2 FINITE ABSORPTION 131
7.3 STATIONARY SOLUTIONS FOR TEMPERATURE-DEPENDENT PARAMETERS . . 134
7.4 SCANNED CW-LASER BEAM 137
7.5 PULSED-LASER IRRADIATION 139
7.5.1 GAUSSIAN INTENSITY PROFILE 139
7.5.2 UNIFORM IRRADIATION 141
7.6 DYNAMIC SOLUTIONS FOR TEMPERATURE-DEPENDENT PARAMETERS . . . 142
8 INFINITE SLABS 147
8.1 STRONG ABSORPTION 147
8.1.1 THERMALLY THIN FILM 147
8.1.2 SCANNED CW LASER 148
IMAGE 4
XII CONTENTS
8.2 THE INFLUENCE OF INTERFERENCES 151
8.3 COUPLING OF OPTICAL AND THERMAL PROPERTIES 153
9 NON-UNIFORM MEDIA 155
9. 1 CONTINUOUS CHANGES IN OPTICAL PROPERTIES 155
9.2 ABSORPTION OF LIGHT IN MULTILAYER STRUCTURES 157
9.2.1 THIN FILMS 157
9.2.2 TWO-LAYER STRUCTURES 159
9.2.3 THREE-LAYER SYSTEMS 160
9.3 TEMPERATURE DISTRIBUTIONS FOR LARGE-AREA IRRADIATION 160 9.3.1
STATIONARY SOLUTIONS FOR THIN FILMS 160
9.3.2 DYNAMIC SOLUTIONS 162
9.4 TEMPERATURE DISTRIBUTIONS FOR FOCUSED IRRADIATION 163
9.4.1 STRONG FILM ABSORPTION 164
9.4.2 FINITE FILM ABSORPTION 165
9.5 THE AMBIENT MEDIUM 167
9.5.1 INFLUENCE ON SUBSTRATE TEMPERATURE 168
9.5.2 INDIRECT HEATING 170
9.5.3 FREE CONVECTION 170
9.5.4 TEMPERATURE JUMP 173
10 SURFACE MELTING 177
10.1 TEMPERATURE DISTRIBUTIONS, INTERFACE VELOCITIES 178
10.1.1 BOUNDARY CONDITIONS 181
10.1.2 TEMPERATURE DEPENDENCE OF PARAMETERS 186
10.2 SOLIDIFICATION 186
10.3 PROCESS OPTIMIZATION 189
10.4 CONVECTION 190
10.5 SURFACE DEFORMATIONS 192
10.5.1 SURFACE PATTERNING 193
10.6 WELDING 194
10.6.1 ULTRASHORT-PULSE LASER WELDING 196
10.7 LIQUID-PHASE EXPULSION 196
PART III MATERIAL REMOVAL
11 VAPORIZATION, PLASMA FORMATION 201
11.1 ENERGY BALANCE 203
11.2 ONE-DIMENSIONAL MODEL 204
11.2.1 STATIONARY EVAPORATION 207
11.2.2 NON-STATIONARY EVAPORATION 212
11.2.3 OPTIMAL CONDITIONS 214
11.3 KNUDSEN LAYER, THE RECOIL PRESSURE 215
11.4 INFLUENCE OF A LIQUID LAYER 217
11.5 LIMITATIONS OF MODEL CALCULATIONS 220
11.6 PLASMA FORMATION 221
IMAGE 5
CONTENTS XIII
11.6.1 IONIZATION 222
11.6.2 OPTICAL PROPERTIES OF PLASMAS 223
11.6.3 OPTICAL BREAKDOWN 225
11.7 LASER-SUPPORTED ABSORPTION WAVES (LS AW) 227
11.7.1 LASER-SUPPORTED COMBUSTION WAVES (LSCW): / P / /D 227
11.7.2 LASER-SUPPORTED DETONATION WAVES ( L S D W ) : / /D . 229
11.7.3 SUPERDETONATION 230
11.8 ABRASIVE LASER MACHINING 231
11.8.1 CUTTING, DRILLING, SHAPING 231
11.8.2 NON-METALS 233
11.8.3 SCRIBING, MARKING, ENGRAVING 234
11.8.4 COMPARISON OF TECHNIQUES 234
12 NANOSECOND-LASER ABLATION 237
12.1 SURFACE PATTERNING 238
12.2 ABLATION MECHANISMS 242
12.2.1 MODELS 244
12.3 PHOTOTHERMAL SURFACE ABLATION 247
12.3.1 INFLUENCE OF SCREENING 249
12.3.2 POST-PULSE ABLATION 250
12.4 INTERACTIONS BELOW THRESHOLD 251
12.5 THE THRESHOLD FLUENCE, (P TH 253
12.5.1 THIN FILMS 256
12.6 ABLATION RATES 256
12.6.1 DEPENDENCE ON PHOTON ENERGY AND FLUENCE 256 12.6.2 DEPENDENCE ON
PULSE DURATION 259
12.6.3 INFLUENCE OF SPOT SIZE, SCREENING 260
12.6.4 DEPENDENCE ON PULSE NUMBER 261
12.6.5 INFLUENCE OF AN AMBIENT ATMOSPHERE 263
12.7 PHOTOTHERMAL VOLUME DECOMPOSITION 265
12.8 PHOTOCHEMICAL ABLATION 266
12.8.1 DISSOCIATION OF POLYMER BONDS 267
12.8.2 DEFECT-RELATED PROCESSES, INCUBATION 268
12.9 PHOTOPHYSICAL ABLATION 270
12.9.1 LONG PULSES 271
12.9.2 SHORT PULSES 272
12.9.3 THERMAL VERSUS PHOTOCHEMICAL AND PHOTOPHYSICAL ABLATION 272
12.10 THERMO- AND PHOTOMECHANICAL ABLATION 273
12.10.1 BASIC EQUATIONS 274
12.11 MATERIAL DAMAGE, DEBRIS 276
12.11.1 STRONG ABSORPTION 276
12.11.2 FINITE ABSORPTION 277
12.11.3 DEBRIS 278
IMAGE 6
XIV CONTENTS
13 ULTRASHORT-PULSE LASER ABLATION 279
13.1 MATERIAL PATTERNING AND DAMAGE 279
13.1.1 WIDE-BANDGAP MATERIALS, GLASSES, POLYMERS 281 13.1.2
NANOSTRUCTURES 283
13.2 OVERVIEW ON INTERACTION MECHANISMS , 283
13.3 LOW FLUENCE PHOTOEXCITATIONS 285
13.3.1 THERMAL VOLUME DECOMPOSITION 286
13.3.2 THERMAL VERSUS PHOTOPHYSICAL ABLATION 287
13.3.3 ABLATION DYNAMICS 288
13.4 MOLECULAR DYNAMICS (MD) SIMULATIONS 288
13.5 THE TWO-TEMPERATURE MODEL 292
13.5.1 ELECTRON TRANSPORT, DAMAGE THRESHOLDS 296
13.5.2 MELTING, SURFACE DEFORMATION AND ABLATION 298 13.5.3 PROCESSING
OF METALS AND SEMICONDUCTORS 301
13.6 MULTIPHOTON- AND AVALANCHE IONIZATION 302
13.6.1 DIELECTRICS 303
13.6.2 COULOMB EXPLOSION 306
13.6.3 PROCESSING OF DIELECTRICS 308
13.7 COMPARISON OF NANOSECOND AND ULTRASHORT-PULSED LASER ABLATION 311
14 ETCHING OF METALS AND INSULATORS 315
14.1 PHOTOCHEMISTRY OF PRECURSOR MOLECULES 317
14.1.1 HALIDES 317
14.1.2 HALOGEN COMPOUNDS 319
14.2 CONCENTRATION OF REACTIVE SPECIES 320
14.2.1 BALLISTIC APPROXIMATION 321
14.2.2 DIFFUSION 323
14.2.3 INFLUENCE OF THE REACTION CHAMBER 324
14.2.4 GAS-PHASE RECOMBINATION 326
14.2.5 GAS-PHASE HEATING 327
14.3 DRY-ETCHING OF METALS 327
14.3.1 SPONTANEOUS ETCHING SYSTEMS 328
14.3.2 DIFFUSIVE ETCHING SYSTEMS 329
14.3.3 PASSIVATING REACTION SYSTEMS 329
14.4 DRY-ETCHING OF INORGANIC INSULATORS 332
14.4.1 SIO 2 GLASSES 332
14.4.2 OXIDES 333
14.5 WET-ETCHING 334
14.5.1 FRONT-SIDE ETCHING 335
14.5.2 BACKSIDE ETCHING 335
15 ETCHING OF SEMICONDUCTORS 339
15.1 DARK ETCHING 339
15.2 LASER-INDUCED ETCHING OF SI IN CL 2 342
IMAGE 7
CONTENTS XV
15.2.1 SURFACE PATTERNING 342
15.2.2 PHOTOCHEMICAL AND THERMAL ETCHING 343
15.2.3 CHLORINE RADICALS 345
15.2.4 ELECTRON-HOLE PAIRS 346
15.2.5 CRYSTAL ORIENTATION AND DOPING 348
15.2.6 NANOPATTERNING 349
15.3 SI IN HALOGEN COMPOUNDS 350
15.3.1 SI IN XEF 2 350
15.3.2 SI IN SF 6 351
15.4 MICROSCOPIC MECHANISMS 352
15.4.1 PHOTOCHEMICAL ETCHING 353
15.4.2 COMBINED PHOTOCHEMICAL AND THERMAL ETCHING 354 15.4.3 THERMAL
ETCHING 354
15.5 DRY-ETCHING OF COMPOUND SEMICONDUCTORS 354
15.5.1 III-V COMPOUNDS 354
15.5.2 LASER ETCHING OF ATOMIC LAYERS 357
15.5.3 DOPANTS, IMPURITIES, AND DEFECTS 357
15.6 WET-ETCHING 357
15.6.1 SILICON 358
15.6.2 COMPOUND SEMICONDUCTORS 359
15.6.3 INTERPRETATION OF RESULTS 360
15.6.4 SPATIAL RESOLUTION, WAVEGUIDING 364
PART IV MATERIAL DEPOSITION
16 LASER-CVD OF MICROSTRUCTURES 369
16.1 PRECURSOR MOLECULES 369
16.2 PYROLYTIC LCVD OF SPOTS 370
16.2.1 DEPOSITION FROM HALIDES 370
16.2.2 DEPOSITION FROM CARBONYLS 375
16.3 MODELLING OF PYROLYTIC LCVD 375
16.3.1 GAS-PHASE PROCESSES 376
16.3.2 THE COUPLING BETWEEN T(X) AND H(X) 379
16.4 TEMPERATURE DISTRIBUTIONS ON CIRCULAR DEPOSITS 382
16.5 SIMULATION OF PYROLYTIC GROWTH 385
16.6 PHOTOLYTIC LCVD 389
16.6.1 METALS 389
16.6.2 OTHER MATERIALS 392
16.6.3 PROCESS LIMITATIONS 392
17 GROWTH OF FIBERS 393
17.1 IN SITU TEMPERATURE MEASUREMENTS 394
17.2 MICROSTRUCTURE AND PHYSICAL PROPERTIES 395
17.3 KINETIC STUDIES 397
IMAGE 8
XVI CONTENTS
17.3.1 SILICON 398
17.3.2 CARBON 398
17.4 GAS-PHASE TRANSPORT 399
17.4.1 THE COUPLING OF FLUXES 399
17.4.2 THERMAL DIFFUSION (SORET EFFECT) 402
17.5 SIMULATION OF GROWTH 405
18 DIRECT WRITING 407
18.1 CHARACTERISTICS OF PYROLYTIC DIRECT WRITING 407
18.1.1 DEPENDENCE ON LASER PARAMETERS AND SUBSTRATE MATERIAL 408
18.1.2 ELECTRICAL PROPERTIES 410
18.2 TEMPERATURE DISTRIBUTIONS IN DIRECT WRITING 411
18.2.1 CENTER-TEMPERATURE RISE 411
18.2.2 ID APPROACH, K* » 1 413
18.2.3 NUMERICAL SOLUTIONS 414
18.3 SIMULATION OF DIRECT WRITING 415
18.3.1 ID MODEL 415
18.3.2 COMPARISON WITH EXPERIMENTAL DATA 417
18.3.3 2D MODEL 421
18.4 PHOTOPHYSICAL LCVD 422
18.5 APPLICATIONS OF LCVD IN MICROFABRICATION 424
18.5.1 PLANAR SUBSTRATES 424
18.5.2 NON-PLANAR SUBSTRATES, 3D OBJECTS 426
19 THIN-FILM FORMATION BY LASER-CVD 429
19.1 DIRECT HEATING 430
19.1.1 STATIONARY SOLUTIONS 430
19.1.2 NON-STATIONARY SOLUTIONS 434
19.2 PYROLYTIC PROCESSING RATES 434
19.2.1 DIFFUSION 435
19.2.2 RECOMBINATION 437
19.3 PHOTOLYTIC PROCESSING RATES 438
19.4 METALS 439
19.4.1 DEPOSITION FROM METAL HALIDES 439
19.4.2 DEPOSITION FROM ALKYLS AND CARBONYLS 442
19.5 SEMICONDUCTORS 443
19.5.1 PHOTODECOMPOSITION OF SILANES 444
19.5.2 CRYSTALLINE GE AND SI 446
19.5.3 AMORPHOUS HYDROGENATED SILICON (A-SI:H) 446 19.5.4 COMPOUND
SEMICONDUCTORS 450
19.5.5 CARBON 451
19.6 INSULATORS 451
19.6.1 OXIDES 452
19.6.2 NITRIDES 452
19.7 HETEROSTRUCTURES 453
19.8 COMPARISON OF LCVD AND STANDARD TECHNIQUES 454
IMAGE 9
CONTENTS XVII
20 ADSORBED LAYERS, LASER-MBE 457
20.1 FUNDAMENTAL ASPECTS 458
20.1.1 INFLUENCE OF LASER LIGHT 462
20.2 DEPOSITION FROM ADSORBED LAYERS 463
20.2.1 VACUUM 463
20.2.2 GASEOUS AMBIENT 466
20.3 COMBINED LASER AND MOLECULAR/ATOMIC BEAMS 470
20.3.1 LASER-MBE 471
20.3.2 LASER-ALE 472
20.3.3 LASER-OMBD 473
20.3.4 LASER-FOCUSED ATOMIC DEPOSITION 474
21 LIQUID-PHASE DEPOSITION, ELECTROPLATING 477
21.1 LIQUID-PHASE PROCESSING WITHOUT AN EXTERNAL EMF 477 21.1.1 THERMAL
DECOMPOSITION 477
21.1.2 ELECTROLESS PLATING 480
21.1.3 METAL-LIQUID INTERFACES 481
21.1.4 SEMICONDUCTOR-LIQUID INTERFACES 483
21.1.5 FURTHER EXPERIMENTAL EXAMPLES 484
21.2 ELECTROCHEMICAL PLATING 484
21.2.1 JET-PLATING 486
22 THIN-FILM FORMATION BY PULSED-LASER DEPOSITION AND LASER-INDUCED
EVAPORATION 489
22.1 EXPERIMENTAL REQUIREMENTS 490
22.1.1 CONGRUENT AND INCONGRUENT ABLATION 493
22.1.2 TARGETS 494
22.1.3 UNIFORM ABLATION 495
22.1.4 CROSS-BEAM PLD 497
22.2 VOLUME AND SURFACE PROCESSES, FILM GROWTH 497
22.2.1 PLASMA AND GAS-PHASE REACTIONS 498
22.2.2 SUBSTRATE TEMPERATURE, LASER-PULSE-REPETITION RATE . 499 22.2.3
ENERGY OF SPECIES 500
22.2.4 PARTICULATES 501
22.2.5 CHEMICAL COMPOSITION AND THICKNESS OF FILMS 504 22.3 OVERVIEW OF
MATERIALS AND FILM PROPERTIES 505
22.4 HIGH-TEMPERATURE SUPERCONDUCTORS 506
22.4.1 NON-REACTIVE DEPOSITION 507
22.4.2 REACTIVE DEPOSITION 507
22.4.3 HETEROSTRUCTURES 508
22.4.4 METASTABLE COMPOUNDS, MIXED SYSTEMS 510
22.4.5 FILMS WITH STEP-LIKE MORPHOLOGY 512
22.4.6 BUFFER LAYERS, APPLICATIONS 513
22.5 METALS, SEMICONDUCTORS, AND INSULATORS 515
22.5.1 METALS 515
22.5.2 SEMICONDUCTORS 515
IMAGE 10
XVIII CONTENTS
22.5.3 CARBON FILMS 517
22.5.4 INSULATORS 519
22.5.5 HETEROSTRUCTURES 521
22.6 NANOSTRUCTURED MATERIALS 521
22.6.1 NANOPARTICLE FILMS 522
22.6.2 NANOCOMPOSITES 522
22.7 ORGANIC MATERIALS 524
22.7.1 MAPLE 527
22.8 LASER-INDUCED FORWARD TRANSFER 528
22.8.1 TRANSFER FILMS 530
PART V MATERIAL TRANSFORMATIONS, SYNTHESIS AND STRUCTURE FORMATION
23 MATERIAL TRANSFORMATIONS, LASER CLEANING 535
23.1 TRANSFORMATION HARDENING 535
23.2 LASER ANNEALING, RECRYSTALLIZATION 537
23.2.1 ION-IMPLANTED SEMICONDUCTORS 537
23.2.2 THIN FILMS 540
23.3 GLAZING 541
23.4 SHOCK HARDENING 542
23.5 SURFACE POLISHING 542
23.6 TRANSFORMATIONS WITHIN BULK MATERIALS 544
23.6.1 NON-ERASABLE MARKING 545
23.6.2 GRATINGS 545
23.6.3 WAVEGUIDES 546
23.6.4 3D-OPTICAL STORAGE 547
23.7 LASER CLEANING 549
23.7.1 ADHESION FORCES 550
23.7.2 DRY CLEANING 552
23.7.3 STEAM CLEANING 557
23.7.4 WET CLEANING 558
23.7.5 MATRIX CLEANING 559
24 DOPING 561
24.1 SOLID-PHASE DIFFUSION 562
24.2 LIQUID-PHASE TRANSPORT 565
24.3 SHEET DOPING 565
24.3.1 SILICON 566
24.3.2 COMPOUND SEMICONDUCTORS 569
24.4 LOCAL DOPING 570
24.5 LASER IMPLANTATION 571
25 CLADDING, ALLOYING, AND SYNTHESIS 573
25.1 LASER-ASSISTED CLADDING AND SINTERING 573
25.1.1 3D RAPID PROTOTYPING 575
25.2 ALLOYING 575
IMAGE 11
CONTENTS XIX
25.2.1 LASER-SURFACE ALLOYING 575
25.2.2 FORMATION OF METASTABLE MATERIALS 576
25.2.3 SUICIDES 576
25.3 SYNTHESIS 577
25.3.1 THIN FILMS 577
25.3.2 FIBERS 578
26 OXIDATION, NITRIDATION, AND REDUCTION 581
26.1 BASIC MECHANISMS 582
26.1.1 VERY THIN FILMS 583
26.1.2 THIN FILMS 583
26.1.3 THICKFILMS 585
26.1.4 INFLUENCE OF LASER LIGHT 585
26.2 METALS 587
26.2.1 PHOTOTHERMAL OXIDATION 587
26.2.2 PHOTOCHEMICAL CONTRIBUTIONS 589
26.2.3 OXIDATION BY PULSED-LASER PLASMA CHEMISTRY 590 26.2.4 NITRIDATION
591
26.3 ELEMENTAL SEMICONDUCTORS 592
26.3.1 PHOTOTHERMAL OXIDATION OF SI 592
26.3.2 PHOTOCHEMICALLY ENHANCED OXIDATION OF SI 594 26.3.3 NITRIDATION
OF SILICON 596
26.4 COMPOUND SEMICONDUCTORS 596
26.4.1 SUMMARY 597
26.5 OXIDE TRANSFORMATION, REOXIDATION 597
26.5.1 SILICON OXIDE 597
26.6 REDUCTION AND METALLIZATION OF OXIDES 598
26.6.1 QUALITATIVE DESCRIPTION 599
26.6.2 OXIDIC PEROVSKITES AND RELATED MATERIALS 600
26.6.3 SUPERCONDUCTORS 602
27 TRANSFORMATION AND FUNCTIONALIZATION OF ORGANIC MATERIALS 605 27.1
SURFACE MODIFICATION OF POLYMERS 605
27.1.1 LASER-ENHANCED ADHESION 605
27.1.2 SWELLING, AMORPHIZATION, CRYSTALLIZATION 607 27.1.3 PHOTOCHEMICAL
EXCHANGE OF SPECIES 608
27.1.4 CHEMICAL DEGRADATION 609
27.2 CHEMICAL TRANSFORMATIONS WITHIN THIN FILMS AND BULK MATERIALS 611
27.2.1 LASER LITHOGRAPHY 613
27.2.2 MASKLESS TECHNIQUES 616
27.2.3 DECOMPOSITION OF PRECURSOR FILMS 617
27.2.4 3-D PHOTOPOLYMERIZATION 619
27.3 LASER-LIGA, LAN 620
IMAGE 12
XX CONTENTS
28 INSTABILITIES AND STRUCTURE FORMATION 623
28.1 COHERENT AND NON-COHERENT STRUCTURES 623
28.1.1 EQUATIONS 624
28.1.2 STABILITY 625
28.1.3 COHERENT STRUCTURES 626
28.1.4 NON-COHERENT STRUCTURES 626
28.2 RIPPLE FORMATION 626
28.2.1 INTERFERENCE PATTERN 627
28.2.2 DISTRIBUTION OF ENERGY 632
28.2.3 FEEDBACK 634
28.2.4 COMPARISON OF EXPERIMENTAL AND THEORETICAL RESULTS . 635 28.2.5
RIPPLES GENERATED BY ULTRASHORT-LASER PULSES 638 28.2.6 EMBEDDED
PERIODIC STRUCTURES 643
28.3 SPATIO-TEMPORAL OSCILLATIONS 644
28.3.1 ZERO ISOCLINES 645
28.3.2 INSTABILITIES IN LASER-INDUCED OXIDATION 646
28.3.3 EXPLOSIVE CRYSTALLIZATION 647
28.3.4 EXOTHERMAL REACTIONS 648
28.3.5 INSTABILITIES IN DIRECT WRITING 649
28.3.6 DISCONTINUOUS DEPOSITION AND BISTABILITIES 652 28.4 INSTABILITIES
AND STRUCTURE FORMATION IN LASER ABLATION 655 28.4.1 FUNDAMENTAL ASPECTS
655
28.4.2 CONICAL AND COLUMNAR STRUCTURES 659
28.5 HYDRODYNAMIC INSTABILITIES 664
28.5.1 KELVIN-HELMHOLTZ INSTABILITIES 664
28.5.2 RAYLEIGH-TAYLOR INSTABILITIES 666
28.5.3 SURFACE CORRUGATIONS, DROPLETS 668
28.6 STRESS-RELATED INSTABILITIES 671
28.7 TECHNOLOGICAL ASPECTS 676
PART VI DIAGNOSTIC TECHNIQUES, PLASMAS
29 DIAGNOSTIC TECHNIQUES 681
29.1 CHARACTERIZATION OF LASER-BEAM PROFILES 681
29.2 HOMOGENIZATION OF LASER BEAMS 681
29.2.1 DIFFRACTIVE METHODS 682
29.2.2 REFLECTIVE METHODS 682
29.2.3 REFRACTIVE METHODS 683
29.3 DEPOSITION, ETCH, AND ABLATION RATES 683
29.3.1 OPTICAL TECHNIQUES 683
29.3.2 OTHER TECHIQUES 686
29.4 TEMPERATURE MEASUREMENTS 689
29.4.1 PHOTOELECTRIC PYROMETRY 689
29.4.2 OTHER OPTICAL TECHNIQUES 693
29.4.3 OTHER TECHNIQUES 693
IMAGE 13
CONTENTS XXI
29.5 ANALYSIS OF SURFACES AND THIN FILMS 694
29.5.1 SURFACE TOPOLOGIES, MICROSTRUCTURES 694
29.5.2 TRANSPORT MEASUREMENTS 695
30 ANALYSIS OF SPECIES AND PLASMAS 697
30.1 PRECURSOR AND PRODUCT SPECIES 697
30.1.1 OPTICAL SPECTROSCOPY 697
30.1.2 MASS SPECTROMETRY 699
30.1.3 MALDI, LAESI 701
30.2 SPECIES IN VAPOR AND PLASMA PLUMES 702
30.2.1 SPECIES AT SUBTHRESHOLD FLUENCES 702
30.2.2 ATOMIC AND MOLECULAR NEUTRALS 703
30.2.3 ELECTRONS AND IONS 704
30.2.4 PLASMA RADIATION, X-RAYS 705
30.2.5 CLUSTERS AND FRAGMENTS 705
30.3 PLUME EXPANSION IN VACUUM 706
30.3.1 SPHERICAL PLUME 706
30.3.2 ELLIPTICAL PLUME 707
30.3.3 MASS- AND ION-FLUX MEASUREMENTS 708
30.4 PLUME EXPANSION IN GASES, SHOCK WAVES 708
30.4.1 POINT BLAST MODEL 710
30.4.2 COMBINED PROPAGATION OF PLUME AND SW 711
30.4.3 FORMATION OF NANOPARTICLES 713
30.4.4 COMPARISON WITH EXPERIMENTAL INVESTIGATIONS 715 30.5 OPTICAL
BREAKDOWN IN LIQUIDS, CAVITATION 719
30.5.1 ABSORBING TARGETS 720
30.5.2 TRANSPARENT MEDIA 721
PART VII LASERS IN MEDICINE, BIOTECHNOLOGY AND ARTS
31 LASERS IN MEDICINE AND BIOTECHNOLOGY 727
31.1 MEDICAL APPLICATIONS 728
31.1.1 OPHTHALMOLOGY 728
31.1.2 DERMATOLOGY AND SURGERY 728
31.1.3 PHOTODYNAMICAL THERAPY 729
31.1.4 PROSTHESIS 729
31.2 BIOTECHNOLOGY 729
31.2.1 LASER MICRODISSECTION 729
31.2.2 MICRO-/NANOSURGERY AND MANIPULATION 730
31.2.3 BIOPOLYMERS 730
31.3 INTERACTION MECHANISMS 731
31.3.1 CHEMICAL EFFECTS 733
32 RESTORATION AND CONSERVATION OF ARTWORKS 735
32.1 CULTURAL HERITAGES 735
32.1.1 METAL ARTWORKS 736
32.1.2 OIL-PAINTINGS, FRESCOS 736
IMAGE 14
XXII CONTENTS
32.2 ANALYSIS AND ORIGIN OF ARTWORKS 737
32.3 ARCHITECTURE, MODERN ARTWORK 737
APPENDIX A DEFINITIONS AND SYMBOLS 739
A.I SYMBOLS AND CONVERSION FACTORS 739
A.2 ABBREVIATIONS, ACRONYMS 745
APPENDIX B MATHEMATICAL FUNCTIONS AND RELATIONS 749
APPENDIX C TABLES 757
REFERENCES 783
INDEX 843 |
| any_adam_object | 1 |
| author | Bäuerle, Dieter 1940-2023 |
| author_GND | (DE-588)10728040X |
| author_facet | Bäuerle, Dieter 1940-2023 |
| author_role | aut |
| author_sort | Bäuerle, Dieter 1940-2023 |
| author_variant | d b db |
| building | Verbundindex |
| bvnumber | BV037373531 |
| classification_rvk | UH 5720 UH 5721 UH 5750 UH 5790 VE 9670 VG 8850 |
| classification_tum | FER 786f FER 899f CHE 189f |
| ctrlnum | (OCoLC)760112066 (DE-599)DNB1008091057 |
| dewey-full | 621.366 670 541.35 |
| dewey-hundreds | 600 - Technology (Applied sciences) 500 - Natural sciences and mathematics |
| dewey-ones | 621 - Applied physics 670 - Manufacturing 541 - Physical chemistry |
| dewey-raw | 621.366 670 541.35 |
| dewey-search | 621.366 670 541.35 |
| dewey-sort | 3621.366 |
| dewey-tens | 620 - Engineering and allied operations 670 - Manufacturing 540 - Chemistry and allied sciences |
| discipline | Chemie / Pharmazie Maschinenbau / Maschinenwesen Physik Chemie Fertigungstechnik Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik |
| edition | 4. ed. |
| format | Book |
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| id | DE-604.BV037373531 |
| illustrated | Illustrated |
| indexdate | 2024-07-20T11:06:38Z |
| institution | BVB |
| isbn | 9783642176128 3642176127 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-022526821 |
| oclc_num | 760112066 |
| open_access_boolean | |
| owner | DE-11 DE-634 DE-92 DE-91G DE-BY-TUM |
| owner_facet | DE-11 DE-634 DE-92 DE-91G DE-BY-TUM |
| physical | XXII, 851 S. Ill., graph. Darst. |
| publishDate | 2011 |
| publishDateSearch | 2011 |
| publishDateSort | 2011 |
| publisher | Springer |
| record_format | marc |
| spelling | Bäuerle, Dieter 1940-2023 Verfasser (DE-588)10728040X aut Laser processing and chemistry Dieter Bäuerle 4. ed. Berlin [u.a.] Springer 2011 XXII, 851 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Laserchemie (DE-588)4034613-4 gnd rswk-swf Lasertechnologie (DE-588)4166821-2 gnd rswk-swf Materialbearbeitung (DE-588)4139082-9 gnd rswk-swf Chemie (DE-588)4009816-3 gnd rswk-swf Laser (DE-588)4034610-9 gnd rswk-swf Chemische Reaktion (DE-588)4009853-9 gnd rswk-swf Technische Chemie (DE-588)4078178-1 gnd rswk-swf Lasertechnologie (DE-588)4166821-2 s Laserchemie (DE-588)4034613-4 s DE-604 Laser (DE-588)4034610-9 s Technische Chemie (DE-588)4078178-1 s 1\p DE-604 Materialbearbeitung (DE-588)4139082-9 s 2\p DE-604 Chemie (DE-588)4009816-3 s 3\p DE-604 Chemische Reaktion (DE-588)4009853-9 s 4\p DE-604 X:MVB text/html http://deposit.dnb.de/cgi-bin/dokserv?id=3557214&prov=M&dok_var=1&dok_ext=htm Inhaltstext DNB Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=022526821&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 4\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Bäuerle, Dieter 1940-2023 Laser processing and chemistry Laserchemie (DE-588)4034613-4 gnd Lasertechnologie (DE-588)4166821-2 gnd Materialbearbeitung (DE-588)4139082-9 gnd Chemie (DE-588)4009816-3 gnd Laser (DE-588)4034610-9 gnd Chemische Reaktion (DE-588)4009853-9 gnd Technische Chemie (DE-588)4078178-1 gnd |
| subject_GND | (DE-588)4034613-4 (DE-588)4166821-2 (DE-588)4139082-9 (DE-588)4009816-3 (DE-588)4034610-9 (DE-588)4009853-9 (DE-588)4078178-1 |
| title | Laser processing and chemistry |
| title_auth | Laser processing and chemistry |
| title_exact_search | Laser processing and chemistry |
| title_full | Laser processing and chemistry Dieter Bäuerle |
| title_fullStr | Laser processing and chemistry Dieter Bäuerle |
| title_full_unstemmed | Laser processing and chemistry Dieter Bäuerle |
| title_short | Laser processing and chemistry |
| title_sort | laser processing and chemistry |
| topic | Laserchemie (DE-588)4034613-4 gnd Lasertechnologie (DE-588)4166821-2 gnd Materialbearbeitung (DE-588)4139082-9 gnd Chemie (DE-588)4009816-3 gnd Laser (DE-588)4034610-9 gnd Chemische Reaktion (DE-588)4009853-9 gnd Technische Chemie (DE-588)4078178-1 gnd |
| topic_facet | Laserchemie Lasertechnologie Materialbearbeitung Chemie Laser Chemische Reaktion Technische Chemie |
| url | http://deposit.dnb.de/cgi-bin/dokserv?id=3557214&prov=M&dok_var=1&dok_ext=htm http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=022526821&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT bauerledieter laserprocessingandchemistry |