Shallow dopants in nanostructured and in isotopically engineered silicon:
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Bibliographic Details
Main Author: Stegner, Andre Rainer (Author)
Format: Thesis Book
Language:English
Published: Garching Verein zur Förderung des Walter Schottky Inst. der Techn. Univ. München e.V. 2011
Edition:1. Aufl.
Series:Selected topics of semiconductor physics and technology 123
Subjects:
Physical Description:VII, 185 S. Ill., graph. Darst.
ISBN:9783941650237

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