Chemical vapour deposition: Precursors, processes and applications
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Cambridge
Royal Society of Chemistry
2008
|
| Schlagworte: | |
| Online-Zugang: | BHS01 BSB01 BTU01 BTW01 DMM01 FAN01 FAW01 FAW02 FHA01 FHD01 FHM01 FHN01 FHR01 FKE01 FLA01 FWS01 FWS02 HWR01 LCO01 SAB01 SAM01 SBG01 SBR01 SND01 TUM01 UBA01 UBG01 UBM01 UBR01 UBT01 UBW01 UER01 UPA01 Volltext |
| Beschreibung: | A comprehensive overview on the key aspects of chemical vapour deposition processes written by practising CVD technologists who are also leading international experts, Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from these different research areas. The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few chapters. Then follows a detailed description of the use of a variety CVD techniques to deposit a wide range of materials, including semiconductors, metals, metal oxides and nitrides, protective coatings and functional coatings on glass. Finally and uniquely, for a technical volume, industrial and commercial aspects of CVD are also discussed together with possible future trends, which is an unusual, but very important aspect of the book. The book has been written with CVD practitioners in mind, such as the++ chemist who wishes to learn more about CVD processes, or the CVD technologist who wishes to gain an increased knowledge of precursor chemistry. The volume will prove particularly useful to those who have recently entered the field, and it will also make a valuable contribution to chemistry and materials science lecture courses at undergraduate and postgraduate level |
| Beschreibung: | 1 Online-Ressource (600 p.) 202 b&w, ill |
| ISBN: | 1847558798 9781847558794 |
Internformat
MARC
| LEADER | 00000nmm a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV037195471 | ||
| 003 | DE-604 | ||
| 005 | 20110519 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 110131s2008 xxk|||| o||u| ||||||eng d | ||
| 020 | |a 1847558798 |c : £229.94 |9 1-8475-5879-8 | ||
| 020 | |a 9781847558794 |c : £229.94 |9 978-1-8475-5879-4 | ||
| 035 | |a (OCoLC)873741604 | ||
| 035 | |a (DE-599)GBVNLM003692795 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 044 | |a xxk |c XA-GB | ||
| 049 | |a DE-12 |a DE-384 |a DE-473 |a DE-703 |a DE-29 |a DE-19 |a DE-91 |a DE-739 |a DE-355 |a DE-20 |a DE-Aug4 |a DE-1046 |a DE-1047 |a DE-1102 |a DE-1050 |a DE-859 |a DE-M347 |a DE-92 |a DE-898 |a DE-863 |a DE-862 |a DE-128 |a DE-54 |a DE-22 |a DE-150 |a DE-155 |a DE-210 |a DE-2070s |a DE-634 |a DE-526 |a DE-860 |a DE-70 |a DE-B768 | ||
| 084 | |a UP 7550 |0 (DE-625)146434: |2 rvk | ||
| 084 | |a ELT 279f |2 stub | ||
| 084 | |a FER 882f |2 stub | ||
| 245 | 1 | 0 | |a Chemical vapour deposition |b Precursors, processes and applications |c Edited by Anthony C. Jones, Michael L. Hitchman ; Contributions by Mikko Ritala [et al.] |
| 264 | 1 | |a Cambridge |b Royal Society of Chemistry |c 2008 | |
| 300 | |a 1 Online-Ressource (600 p.) |b 202 b&w, ill | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 500 | |a A comprehensive overview on the key aspects of chemical vapour deposition processes written by practising CVD technologists who are also leading international experts, Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from these different research areas. The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few chapters. Then follows a detailed description of the use of a variety CVD techniques to deposit a wide range of materials, including semiconductors, metals, metal oxides and nitrides, protective coatings and functional coatings on glass. Finally and uniquely, for a technical volume, industrial and commercial aspects of CVD are also discussed together with possible future trends, which is an unusual, but very important aspect of the book. The book has been written with CVD practitioners in mind, such as the++ | ||
| 500 | |a chemist who wishes to learn more about CVD processes, or the CVD technologist who wishes to gain an increased knowledge of precursor chemistry. The volume will prove particularly useful to those who have recently entered the field, and it will also make a valuable contribution to chemistry and materials science lecture courses at undergraduate and postgraduate level | ||
| 650 | 0 | 7 | |a CVD-Verfahren |0 (DE-588)4009846-1 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4143413-4 |a Aufsatzsammlung |2 gnd-content | |
| 689 | 0 | 0 | |a CVD-Verfahren |0 (DE-588)4009846-1 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Jones, Anthony C. |e Sonstige |4 oth | |
| 700 | 1 | |a Hitchman, Michael L. |e Sonstige |4 oth | |
| 700 | 1 | |a Ritala, Mikko |e Sonstige |4 oth | |
| 700 | 1 | |a Niinisto, Jaako |e Sonstige |4 oth | |
| 700 | 1 | |a Krumdieck, Susan |e Sonstige |4 oth | |
| 700 | 1 | |a Chalker, Paul |e Sonstige |4 oth | |
| 700 | 1 | |a Aspinall, Helen C. |e Sonstige |4 oth | |
| 700 | 1 | |a Pemble, Martyn E. |e Sonstige |4 oth | |
| 700 | 1 | |a Gladfelter, W.L. |e Sonstige |4 oth | |
| 700 | 1 | |a Leese, Barry |e Sonstige |4 oth | |
| 856 | 4 | 0 | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |x Verlag |3 Volltext |
| 912 | |a ZDB-1-RSE | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-021109833 | ||
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l BHS01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l BSB01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l BTU01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l BTW01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l DMM01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FAN01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FAW01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FAW02 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FHA01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FHD01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FHM01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FHN01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FHR01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FKE01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FLA01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FWS01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l FWS02 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l HWR01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l LCO01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l SAB01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l SAM01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l SBG01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l SBR01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l SND01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l TUM01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l UBA01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l UBG01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l UBM01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l UBR01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l UBT01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l UBW01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l UER01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
| 966 | e | |u http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |l UPA01 |p ZDB-1-RSE |x Verlag |3 Volltext | |
Datensatz im Suchindex
| DE-BY-FWS_katkey | 392641 |
|---|---|
| _version_ | 1806177861537628160 |
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV037195471 |
| classification_rvk | UP 7550 |
| classification_tum | ELT 279f FER 882f |
| collection | ZDB-1-RSE |
| ctrlnum | (OCoLC)873741604 (DE-599)GBVNLM003692795 |
| discipline | Chemie / Pharmazie Physik Elektrotechnik Fertigungstechnik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>08064nmm a2200913 c 4500</leader><controlfield tag="001">BV037195471</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20110519 </controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">110131s2008 xxk|||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1847558798</subfield><subfield code="c">: £229.94</subfield><subfield code="9">1-8475-5879-8</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781847558794</subfield><subfield code="c">: £229.94</subfield><subfield code="9">978-1-8475-5879-4</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)873741604</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBVNLM003692795</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="044" ind1=" " ind2=" "><subfield code="a">xxk</subfield><subfield code="c">XA-GB</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-12</subfield><subfield code="a">DE-384</subfield><subfield code="a">DE-473</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-29</subfield><subfield code="a">DE-19</subfield><subfield code="a">DE-91</subfield><subfield code="a">DE-739</subfield><subfield code="a">DE-355</subfield><subfield code="a">DE-20</subfield><subfield code="a">DE-Aug4</subfield><subfield code="a">DE-1046</subfield><subfield code="a">DE-1047</subfield><subfield code="a">DE-1102</subfield><subfield code="a">DE-1050</subfield><subfield code="a">DE-859</subfield><subfield code="a">DE-M347</subfield><subfield code="a">DE-92</subfield><subfield code="a">DE-898</subfield><subfield code="a">DE-863</subfield><subfield code="a">DE-862</subfield><subfield code="a">DE-128</subfield><subfield code="a">DE-54</subfield><subfield code="a">DE-22</subfield><subfield code="a">DE-150</subfield><subfield code="a">DE-155</subfield><subfield code="a">DE-210</subfield><subfield code="a">DE-2070s</subfield><subfield code="a">DE-634</subfield><subfield code="a">DE-526</subfield><subfield code="a">DE-860</subfield><subfield code="a">DE-70</subfield><subfield code="a">DE-B768</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 7550</subfield><subfield code="0">(DE-625)146434:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 279f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">FER 882f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Chemical vapour deposition</subfield><subfield code="b">Precursors, processes and applications</subfield><subfield code="c">Edited by Anthony C. Jones, Michael L. Hitchman ; Contributions by Mikko Ritala [et al.]</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Cambridge</subfield><subfield code="b">Royal Society of Chemistry</subfield><subfield code="c">2008</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (600 p.)</subfield><subfield code="b">202 b&w, ill</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">A comprehensive overview on the key aspects of chemical vapour deposition processes written by practising CVD technologists who are also leading international experts, Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from these different research areas. The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few chapters. Then follows a detailed description of the use of a variety CVD techniques to deposit a wide range of materials, including semiconductors, metals, metal oxides and nitrides, protective coatings and functional coatings on glass. Finally and uniquely, for a technical volume, industrial and commercial aspects of CVD are also discussed together with possible future trends, which is an unusual, but very important aspect of the book. The book has been written with CVD practitioners in mind, such as the++</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">chemist who wishes to learn more about CVD processes, or the CVD technologist who wishes to gain an increased knowledge of precursor chemistry. The volume will prove particularly useful to those who have recently entered the field, and it will also make a valuable contribution to chemistry and materials science lecture courses at undergraduate and postgraduate level</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)4143413-4</subfield><subfield code="a">Aufsatzsammlung</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Jones, Anthony C.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Hitchman, Michael L.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Ritala, Mikko</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Niinisto, Jaako</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Krumdieck, Susan</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chalker, Paul</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Aspinall, Helen C.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Pemble, Martyn E.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Gladfelter, W.L.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Leese, Barry</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-1-RSE</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-021109833</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">BHS01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">BSB01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">BTU01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">BTW01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">DMM01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FAN01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FAW02</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FHA01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FHM01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FHN01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FHR01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FKE01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FLA01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FWS01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">FWS02</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">HWR01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">LCO01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">SAB01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">SAM01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">SBG01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">SBR01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">SND01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">TUM01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">UBA01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">UBG01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">UBM01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">UBR01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">UBT01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">UBW01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">UER01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp</subfield><subfield code="l">UPA01</subfield><subfield code="p">ZDB-1-RSE</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| genre | (DE-588)4143413-4 Aufsatzsammlung gnd-content |
| genre_facet | Aufsatzsammlung |
| id | DE-604.BV037195471 |
| illustrated | Not Illustrated |
| indexdate | 2024-08-01T11:43:57Z |
| institution | BVB |
| isbn | 1847558798 9781847558794 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-021109833 |
| oclc_num | 873741604 |
| open_access_boolean | |
| owner | DE-12 DE-384 DE-473 DE-BY-UBG DE-703 DE-29 DE-19 DE-BY-UBM DE-91 DE-BY-TUM DE-739 DE-355 DE-BY-UBR DE-20 DE-Aug4 DE-1046 DE-1047 DE-1102 DE-1050 DE-859 DE-M347 DE-92 DE-898 DE-BY-UBR DE-863 DE-BY-FWS DE-862 DE-BY-FWS DE-128 DE-54 DE-22 DE-BY-UBG DE-150 DE-155 DE-BY-UBR DE-210 DE-2070s DE-634 DE-526 DE-860 DE-70 DE-B768 |
| owner_facet | DE-12 DE-384 DE-473 DE-BY-UBG DE-703 DE-29 DE-19 DE-BY-UBM DE-91 DE-BY-TUM DE-739 DE-355 DE-BY-UBR DE-20 DE-Aug4 DE-1046 DE-1047 DE-1102 DE-1050 DE-859 DE-M347 DE-92 DE-898 DE-BY-UBR DE-863 DE-BY-FWS DE-862 DE-BY-FWS DE-128 DE-54 DE-22 DE-BY-UBG DE-150 DE-155 DE-BY-UBR DE-210 DE-2070s DE-634 DE-526 DE-860 DE-70 DE-B768 |
| physical | 1 Online-Ressource (600 p.) 202 b&w, ill |
| psigel | ZDB-1-RSE |
| publishDate | 2008 |
| publishDateSearch | 2008 |
| publishDateSort | 2008 |
| publisher | Royal Society of Chemistry |
| record_format | marc |
| spellingShingle | Chemical vapour deposition Precursors, processes and applications CVD-Verfahren (DE-588)4009846-1 gnd |
| subject_GND | (DE-588)4009846-1 (DE-588)4143413-4 |
| title | Chemical vapour deposition Precursors, processes and applications |
| title_auth | Chemical vapour deposition Precursors, processes and applications |
| title_exact_search | Chemical vapour deposition Precursors, processes and applications |
| title_full | Chemical vapour deposition Precursors, processes and applications Edited by Anthony C. Jones, Michael L. Hitchman ; Contributions by Mikko Ritala [et al.] |
| title_fullStr | Chemical vapour deposition Precursors, processes and applications Edited by Anthony C. Jones, Michael L. Hitchman ; Contributions by Mikko Ritala [et al.] |
| title_full_unstemmed | Chemical vapour deposition Precursors, processes and applications Edited by Anthony C. Jones, Michael L. Hitchman ; Contributions by Mikko Ritala [et al.] |
| title_short | Chemical vapour deposition |
| title_sort | chemical vapour deposition precursors processes and applications |
| title_sub | Precursors, processes and applications |
| topic | CVD-Verfahren (DE-588)4009846-1 gnd |
| topic_facet | CVD-Verfahren Aufsatzsammlung |
| url | http://www.rsc.org/publishing/ebooks/2008/9780854044658.asp |
| work_keys_str_mv | AT jonesanthonyc chemicalvapourdepositionprecursorsprocessesandapplications AT hitchmanmichaell chemicalvapourdepositionprecursorsprocessesandapplications AT ritalamikko chemicalvapourdepositionprecursorsprocessesandapplications AT niinistojaako chemicalvapourdepositionprecursorsprocessesandapplications AT krumdiecksusan chemicalvapourdepositionprecursorsprocessesandapplications AT chalkerpaul chemicalvapourdepositionprecursorsprocessesandapplications AT aspinallhelenc chemicalvapourdepositionprecursorsprocessesandapplications AT pemblemartyne chemicalvapourdepositionprecursorsprocessesandapplications AT gladfelterwl chemicalvapourdepositionprecursorsprocessesandapplications AT leesebarry chemicalvapourdepositionprecursorsprocessesandapplications |