Reactive Sputter Deposition:
Gespeichert in:
Format: | Elektronisch E-Book |
---|---|
Sprache: | English |
Veröffentlicht: |
Berlin [u.a.]
Springer
2008
|
Schriftenreihe: | Springer Series in Materials Science
109 |
Schlagworte: | |
Online-Zugang: | BFB01 BHS01 BSB01 BTU01 BTW01 DMM01 FAN01 FAW01 FAW02 FCO01 FFW01 FHA01 FHD01 FHI01 FHM01 FHN01 FHR01 FKE01 FLA01 FWS01 FWS02 HTW01 HWR01 LCO01 SAB01 SAM01 SBG01 SBR01 SND01 TUM01 UBA01 UBG01 UBM01 UBR01 UBT01 UBW01 UBY01 UER01 UPA01 Volltext |
Beschreibung: | 1 Online-Ressource |
ISBN: | 9783540766643 |
DOI: | 10.1007/978-3-540-76664-3 |
Internformat
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Datensatz im Suchindex
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id | DE-604.BV036650863 |
illustrated | Not Illustrated |
indexdate | 2024-08-01T11:42:14Z |
institution | BVB |
isbn | 9783540766643 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-020570376 |
oclc_num | 315983623 |
open_access_boolean | |
owner | DE-526 DE-522 DE-634 DE-2070s DE-210 DE-155 DE-BY-UBR DE-150 DE-70 DE-22 DE-BY-UBG DE-54 DE-128 DE-863 DE-BY-FWS DE-862 DE-BY-FWS DE-898 DE-BY-UBR DE-92 DE-M347 DE-859 DE-573 DE-1028 DE-1050 DE-858 DE-1102 DE-1046 DE-1047 DE-Aug4 DE-706 DE-20 DE-739 DE-355 DE-BY-UBR DE-91 DE-BY-TUM DE-19 DE-BY-UBM DE-29 DE-703 DE-473 DE-BY-UBG DE-384 DE-12 DE-860 DE-B768 DE-523 |
owner_facet | DE-526 DE-522 DE-634 DE-2070s DE-210 DE-155 DE-BY-UBR DE-150 DE-70 DE-22 DE-BY-UBG DE-54 DE-128 DE-863 DE-BY-FWS DE-862 DE-BY-FWS DE-898 DE-BY-UBR DE-92 DE-M347 DE-859 DE-573 DE-1028 DE-1050 DE-858 DE-1102 DE-1046 DE-1047 DE-Aug4 DE-706 DE-20 DE-739 DE-355 DE-BY-UBR DE-91 DE-BY-TUM DE-19 DE-BY-UBM DE-29 DE-703 DE-473 DE-BY-UBG DE-384 DE-12 DE-860 DE-B768 DE-523 |
physical | 1 Online-Ressource |
psigel | ZDB-1-SCM |
publishDate | 2008 |
publishDateSearch | 2008 |
publishDateSort | 2008 |
publisher | Springer |
record_format | marc |
series | Springer Series in Materials Science |
series2 | Springer Series in Materials Science |
spellingShingle | Reactive Sputter Deposition Springer Series in Materials Science Chemical engineering Chemistry, Physical organic Condensed matter Surfaces (Physics) Magnetronsputtern (DE-588)4208514-7 gnd PVD-Verfahren (DE-588)4115673-0 gnd Reaktives Sputtern (DE-588)7625528-1 gnd |
subject_GND | (DE-588)4208514-7 (DE-588)4115673-0 (DE-588)7625528-1 |
title | Reactive Sputter Deposition |
title_auth | Reactive Sputter Deposition |
title_exact_search | Reactive Sputter Deposition |
title_full | Reactive Sputter Deposition Diederik Depla ; Stijn Mahieu, ed. |
title_fullStr | Reactive Sputter Deposition Diederik Depla ; Stijn Mahieu, ed. |
title_full_unstemmed | Reactive Sputter Deposition Diederik Depla ; Stijn Mahieu, ed. |
title_short | Reactive Sputter Deposition |
title_sort | reactive sputter deposition |
topic | Chemical engineering Chemistry, Physical organic Condensed matter Surfaces (Physics) Magnetronsputtern (DE-588)4208514-7 gnd PVD-Verfahren (DE-588)4115673-0 gnd Reaktives Sputtern (DE-588)7625528-1 gnd |
topic_facet | Chemical engineering Chemistry, Physical organic Condensed matter Surfaces (Physics) Magnetronsputtern PVD-Verfahren Reaktives Sputtern |
url | https://doi.org/10.1007/978-3-540-76664-3 |
volume_link | (DE-604)BV040385147 |
work_keys_str_mv | AT depladiederik reactivesputterdeposition AT mahieustijn reactivesputterdeposition |