Low pressure plasmas and microstructuring technology:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Berlin [u.a.]
Springer
2009
|
| Ausgabe: | [1. ed.] |
| Schlagworte: | |
| Beschreibung: | XXIV, 732 S. Ill., graph. Darst. |
| ISBN: | 9783540858485 9783540858492 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
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| 003 | DE-604 | ||
| 005 | 20100326 | ||
| 007 | t | ||
| 008 | 090812s2009 gw ad|| |||| 00||| eng d | ||
| 015 | |a 08,N45,0866 |2 dnb | ||
| 016 | 7 | |a 990866882 |2 DE-101 | |
| 020 | |a 9783540858485 |c Gb. : EUR 160.45 (freier Pr.), sfr 249.00 (freier Pr.) |9 978-3-540-85848-5 | ||
| 020 | |a 9783540858492 |c ebook |9 978-3-540-85849-2 | ||
| 024 | 3 | |a 9783540858485 | |
| 028 | 5 | 2 | |a 11780793 |
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| 041 | 0 | |a eng | |
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| 084 | |a 620 |2 sdnb | ||
| 100 | 1 | |a Franz, Gerhard |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Low pressure plasmas and microstructuring technology |c Gerhard Franz |
| 250 | |a [1. ed.] | ||
| 264 | 1 | |a Berlin [u.a.] |b Springer |c 2009 | |
| 300 | |a XXIV, 732 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 650 | 4 | |a Ionenstrahlbearbeitung | |
| 650 | 4 | |a Niederdruckplasma - Hochfrequenzentladung | |
| 650 | 4 | |a PECVD-Verfahren - Sputtern | |
| 650 | 4 | |a Plasmadiagnostik | |
| 650 | 4 | |a Plasmaätzen | |
| 650 | 4 | |a Plasma (Ionized gases) |x Industrial applications | |
| 650 | 4 | |a Plasma engineering | |
| 650 | 4 | |a Plasma etching | |
| 650 | 0 | 7 | |a Plasmaätzen |0 (DE-588)4174821-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Sputtern |0 (DE-588)4182614-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Plasmadiagnostik |0 (DE-588)4260997-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Hochfrequenzentladung |0 (DE-588)4298594-8 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Niederdruckplasma |0 (DE-588)4274388-6 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Ionenstrahlbearbeitung |0 (DE-588)4277034-8 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Niederdruckplasma |0 (DE-588)4274388-6 |D s |
| 689 | 0 | 1 | |a Hochfrequenzentladung |0 (DE-588)4298594-8 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Ionenstrahlbearbeitung |0 (DE-588)4277034-8 |D s |
| 689 | 1 | |5 DE-604 | |
| 689 | 2 | 0 | |a Plasmadiagnostik |0 (DE-588)4260997-5 |D s |
| 689 | 2 | |5 DE-604 | |
| 689 | 3 | 0 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |D s |
| 689 | 3 | 1 | |a Sputtern |0 (DE-588)4182614-0 |D s |
| 689 | 3 | |5 DE-604 | |
| 689 | 4 | 0 | |a Plasmaätzen |0 (DE-588)4174821-9 |D s |
| 689 | 4 | |5 DE-604 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-017728759 | ||
Datensatz im Suchindex
| _version_ | 1804139372027576320 |
|---|---|
| any_adam_object | |
| author | Franz, Gerhard |
| author_facet | Franz, Gerhard |
| author_role | aut |
| author_sort | Franz, Gerhard |
| author_variant | g f gf |
| building | Verbundindex |
| bvnumber | BV035674529 |
| callnumber-first | T - Technology |
| callnumber-label | TA2020 |
| callnumber-raw | TA2020 |
| callnumber-search | TA2020 |
| callnumber-sort | TA 42020 |
| callnumber-subject | TA - General and Civil Engineering |
| classification_rvk | UR 8000 ZM 7680 |
| ctrlnum | (OCoLC)277069476 (DE-599)DNB990866882 |
| dewey-full | 621.044 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.044 |
| dewey-search | 621.044 |
| dewey-sort | 3621.044 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Maschinenbau / Maschinenwesen Physik Werkstoffwissenschaften / Fertigungstechnik |
| edition | [1. ed.] |
| format | Book |
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| id | DE-604.BV035674529 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T21:43:02Z |
| institution | BVB |
| isbn | 9783540858485 9783540858492 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-017728759 |
| oclc_num | 277069476 |
| open_access_boolean | |
| owner | DE-703 DE-92 DE-M347 |
| owner_facet | DE-703 DE-92 DE-M347 |
| physical | XXIV, 732 S. Ill., graph. Darst. |
| publishDate | 2009 |
| publishDateSearch | 2009 |
| publishDateSort | 2009 |
| publisher | Springer |
| record_format | marc |
| spelling | Franz, Gerhard Verfasser aut Low pressure plasmas and microstructuring technology Gerhard Franz [1. ed.] Berlin [u.a.] Springer 2009 XXIV, 732 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Ionenstrahlbearbeitung Niederdruckplasma - Hochfrequenzentladung PECVD-Verfahren - Sputtern Plasmadiagnostik Plasmaätzen Plasma (Ionized gases) Industrial applications Plasma engineering Plasma etching Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Plasmadiagnostik (DE-588)4260997-5 gnd rswk-swf Hochfrequenzentladung (DE-588)4298594-8 gnd rswk-swf PECVD-Verfahren (DE-588)4267316-1 gnd rswk-swf Niederdruckplasma (DE-588)4274388-6 gnd rswk-swf Ionenstrahlbearbeitung (DE-588)4277034-8 gnd rswk-swf Niederdruckplasma (DE-588)4274388-6 s Hochfrequenzentladung (DE-588)4298594-8 s DE-604 Ionenstrahlbearbeitung (DE-588)4277034-8 s Plasmadiagnostik (DE-588)4260997-5 s PECVD-Verfahren (DE-588)4267316-1 s Sputtern (DE-588)4182614-0 s Plasmaätzen (DE-588)4174821-9 s |
| spellingShingle | Franz, Gerhard Low pressure plasmas and microstructuring technology Ionenstrahlbearbeitung Niederdruckplasma - Hochfrequenzentladung PECVD-Verfahren - Sputtern Plasmadiagnostik Plasmaätzen Plasma (Ionized gases) Industrial applications Plasma engineering Plasma etching Plasmaätzen (DE-588)4174821-9 gnd Sputtern (DE-588)4182614-0 gnd Plasmadiagnostik (DE-588)4260997-5 gnd Hochfrequenzentladung (DE-588)4298594-8 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Niederdruckplasma (DE-588)4274388-6 gnd Ionenstrahlbearbeitung (DE-588)4277034-8 gnd |
| subject_GND | (DE-588)4174821-9 (DE-588)4182614-0 (DE-588)4260997-5 (DE-588)4298594-8 (DE-588)4267316-1 (DE-588)4274388-6 (DE-588)4277034-8 |
| title | Low pressure plasmas and microstructuring technology |
| title_auth | Low pressure plasmas and microstructuring technology |
| title_exact_search | Low pressure plasmas and microstructuring technology |
| title_full | Low pressure plasmas and microstructuring technology Gerhard Franz |
| title_fullStr | Low pressure plasmas and microstructuring technology Gerhard Franz |
| title_full_unstemmed | Low pressure plasmas and microstructuring technology Gerhard Franz |
| title_short | Low pressure plasmas and microstructuring technology |
| title_sort | low pressure plasmas and microstructuring technology |
| topic | Ionenstrahlbearbeitung Niederdruckplasma - Hochfrequenzentladung PECVD-Verfahren - Sputtern Plasmadiagnostik Plasmaätzen Plasma (Ionized gases) Industrial applications Plasma engineering Plasma etching Plasmaätzen (DE-588)4174821-9 gnd Sputtern (DE-588)4182614-0 gnd Plasmadiagnostik (DE-588)4260997-5 gnd Hochfrequenzentladung (DE-588)4298594-8 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Niederdruckplasma (DE-588)4274388-6 gnd Ionenstrahlbearbeitung (DE-588)4277034-8 gnd |
| topic_facet | Ionenstrahlbearbeitung Niederdruckplasma - Hochfrequenzentladung PECVD-Verfahren - Sputtern Plasmadiagnostik Plasmaätzen Plasma (Ionized gases) Industrial applications Plasma engineering Plasma etching Sputtern Hochfrequenzentladung PECVD-Verfahren Niederdruckplasma |
| work_keys_str_mv | AT franzgerhard lowpressureplasmasandmicrostructuringtechnology |