Unconventional nanopatterning techniques and applications:
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Hoboken, NJ
Wiley
2009
|
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Includes index. |
| Beschreibung: | XV, 598 S. Ill., graph. Darst. |
| ISBN: | 9780470099575 |
Internformat
MARC
| LEADER | 00000nam a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV035140140 | ||
| 003 | DE-604 | ||
| 005 | 20180601 | ||
| 007 | t | ||
| 008 | 081104s2009 xxuad|| |||| 00||| eng d | ||
| 010 | |a 2008021425 | ||
| 020 | |a 9780470099575 |c cloth |9 978-0-470-09957-5 | ||
| 035 | |a (OCoLC)228427382 | ||
| 035 | |a (DE-599)BVBBV035140140 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 044 | |a xxu |c US | ||
| 049 | |a DE-703 |a DE-29T |a DE-91 |a DE-11 | ||
| 050 | 0 | |a TA418.9.N35 | |
| 082 | 0 | |a 620/.5 | |
| 084 | |a VE 9850 |0 (DE-625)147163:253 |2 rvk | ||
| 084 | |a TEC 030f |2 stub | ||
| 100 | 1 | |a Rogers, John A. |d 1967- |e Verfasser |0 (DE-588)1104966468 |4 aut | |
| 245 | 1 | 0 | |a Unconventional nanopatterning techniques and applications |c John A. Rogers ; Hong H. Lee |
| 264 | 1 | |a Hoboken, NJ |b Wiley |c 2009 | |
| 300 | |a XV, 598 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Includes index. | ||
| 650 | 4 | |a Nanoparticles | |
| 650 | 4 | |a Nanostructured materials | |
| 650 | 0 | 7 | |a Nanopartikel |0 (DE-588)4333369-2 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4143413-4 |a Aufsatzsammlung |2 gnd-content | |
| 689 | 0 | 0 | |a Nanopartikel |0 (DE-588)4333369-2 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Lee, Hong H. |e Verfasser |4 aut | |
| 856 | 4 | 2 | |m Digitalisierung UB Bayreuth |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=016807537&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-016807537 | ||
Datensatz im Suchindex
| _version_ | 1804138123985158145 |
|---|---|
| adam_text | CONTENTS
PREFACE
xv
I NANOPATTERNING TECHNIQUES
1
1
INTRODUCTION
3
2
MATERIALS
7
2.1
Introduction
/ 7
2.2
Mold Materials and Mold Preparation
/ 8
2.2.1
Soft Molds
/ 8
2.2.2
Hard Molds
/ 19
2.2.3
Rigiflex Molds
/ 19
2.3
Surface Treatment and Modification
/ 21
References
/ 23
3
PATTERNING BASED ON NATURAL FORCE
27
3.1
Introduction
/ 27
3.2
Capillary Force
/ 28
3.2.1
Open-Ended Capillary
/ 29
3.2.2
Closed Permeable Capillary
/ 31
3.2.3
Completely Closed Capillary
/ 40
3.2.4
Fast Patterning
/ 43
3.2.5
Capillary Kinetics
/ 45
3.3
London Force and Liquid Filament Stability
/ 48
3.3.1
Patterning by Selective Dewetting
/ 49
3.3.2
Liquid Filament Stability: Filling and Patterning
/ 51
3.4
Mechanical Stress: Patterning of A Metal Surface
/ 56
References
/ 63
4
PATTERNING BASED ON WORK OF ADHESION
67
4.1
Introduction
/ 67
4.2
Work of Adhesion
/ 68
VÍ
CONTENTS
4.3
Kinetic Effects
/ 71
4.4
Transfer Patterning
/ 74
4.5
Subtractive Transfer Patterning
/ 79
4.6
Transfer Printing
/ 82
References
/91
5
PATTERNING BASED ON LIGHT: OPTICAL
SOFT LITHOGRAPHY
95
5.1
Introduction
/ 95
5.2
System Elements
/ 96
5.2.1
Overview
/ 96
5.2.2
Elastomeric Photomasks
/ 96
5.2.3
Photosensitive Materials
/ 99
5.3
Two-Dimensional Optical Soft Lithography (OSL)
/ 100
5.3.1
Two-Dimensional OSL with Phase Masks
/ 100
5.3.2
Two-Dimensional OSL with Embossed Masks
/ 104
5.3.3
Two-Dimensional OSL with Amplitude Masks
/ 105
5.3.4
Two-Dimensional OSL with Amplitude/Phase Masks
/ 109
5.4
Three-Dimensional Optical Soft Lithography
/110
5.4.1
Optics /111
5.4.2
Patterning Results
/ 112
5.5
Applications
/117
5.5.1
Low-Voltage Organic Electronics
/ 117
5.5.2
Filters and Mixers for Microfluidics
/118
5.5.3
High Energy Fusion Targets and Media for
Chemical Release
/118
5.5.4
Photonic
Bandgap
Materials
/ 120
References
/ 122
6
PATTERNING BASED ON EXTERNAL FORCE:
NANOIMPRINT LITHOGRAPHY
129
L. Jay Guo
6.1
Introduction
/ 129
6.2
NIL MOLD
/ 133
6.2.1
Mold Fabrication
/ 133
6.2.2
Mold Surface Preparation
/ 137
6.2.3
Flexible Fluoropolymer Mold
/ 137
6.3
NIL Resist
/ 138
6.3.1
Thermoplastic Resist
/ 139
6.3.2
Copolymer Thermoplastic Resists
/ 141
6.3.3
Thermal-Curable Resists
/ 142
6.3.4
UV-Curable Resist
/ 146
6.3.5
Other
Imprimable
Materials
/ 148
6.4
The Nanoimprint Process
/ 149
6.4.1
Cavity Fill Process
/ 149
CONTENTS
VÌI
6.5
Variations of NIL Processes
/ 152
6.5.1
Reverse Nanoimprint
/152
6.5.2
Combined Nanoimprint and Photolithography
/ 155
6.5.3
Roll-to-Roll Nanoimprint Lithography (R2RNIL)
/ 156
6.6
Conclusion
/ 159
References
/ 160
7
PATTERNING BASED ON EDGE EFFECTS:
EDGE LITHOGRAPHY
167
Matthias Geissler, Joseph M. McLellan, Eric P. Lee and Younan Xia
7.1
Introduction
/ 167
7.2
Topography-Directed Pattern Transfer
/ 169
7.2.1
Photolithography with Phase-Shifting Masks
/ 170
7.2.2
Use of Edge-Defined Defects in
S
AMs
/ 172
7.2.3
Controlled Undercutting
/ 175
7.2.4
Edge-Spreading Lithography
/ 176
7.2.5
Edge Transfer Lithography
/ 178
7.2.6
Step-Edge Decoration
/ 180
7.3
Exposure of Nanoscale Edges
/ 181
7.3.1
Fracturing of Thin Films
/ 182
7.3.2
Sectioning of Encapsulated Thin Films
/ 182
7.3.3
Thin Metallic Films along Sidewalls of
Patterned Stamps
/ 184
7.3.4
Topographic
Reorientation
/ 186
7.4
Conclusion and Outlook
/ 187
References
/ 188
8
PATTERNING WITH ELECTROLYTE: SOLID-STATE
SUPERIONIC STAMPING
195
Keng H. Hsu, Peter L.
Schultz,
Nicholas X. Fang, and Placid M.
Ferreira
8.1
Introduction
/ 195
8.2
Solid-State Superionic Stamping
/ 197
8.3
Process Technology
/ 199
8.4
Process Capabilities
/ 203
8.5
Examples of Electrochemically Imprinted Nanostructures
Using the S4 Process
/ 208
Acknowledgments
/211
References
/ 211
9
PATTERNING WITH GELS: LATTICE-GAS MODELS
215
Paul
J
.
Wesson and
Bartosz
A. Grzybowski
9.1
Introduction
/215
9.2
The RDF Method
/218
VIU
CONTENTS
9.3
Microlenses:
Fabrication
/218
9.4
Microlenses:
Modeling Aspects
/ 220
9.4.1
Modeling Using PDEs
/ 220
9.4.2
Modeling Using Lattice-Gas Method
/ 221
9.5
RDF at the Nanoscale
/ 222
9.5.1
Nanoscopic Features from Counter-Propagating
RD Fronts
/ 222
9.5.2
Failure of Continuum Description
/ 225
9.5.3
Lattice-Gas Models at the Nanoscale
/ 227
9.6
Summary and Outlook
/ 229
References
/ 230
10
PATTERNING WITH BLOCK COPOLYMERS
233
Jia-Yu Wang. Wei Chen, and Thomas P. Russell
10.1
Introduction
/ 233
10.2
Orientation
/ 235
10.2.1
Self-Assembling
/ 235
10.2.2
Self-Directing
/ 247
10.3
Long-Range
/ 254
10.3.1
Solvent Annealing
/ 254
10.3.2
Graphoepitaxy
/ 256
10.3.3
Sequential, Orthogonal Fields
/ 260
10.4
Nanoporous BCP Films
/ 262
10.4.1
Ozonolysis
/ 264
10.4.2
Thermal Degradation
/ 264
10.4.3
UV Degradation
/ 267
10.4.4
Selective Extraction
/ 271
10.4.5
Soft Chemical Etch
/ 272
10.4.6
Cleavable Junction
/ 272
10.4.7
Solvent-Induced Film Reconstruction
/ 274
References
/
276
11
PERSPECTIVE ON APPLICATIONS
291
11 APPLICATIONS
293
12
SOFT LITHOGRAPHY FOR MICROFLUIDIC
MICROELECTROMECHANICAL SYSTEMS (MEMS)
AND OPTICAL DEVICES
295
Svetlana M.
Mitrovski, Shraddha Avasthy, Evan M. Erickson,
Matthew E. Stewart. John A. Rogers, and Ralph G. Nuzzo
12.1
Introduction
/ 295
12.2
Microfluidic Devices for Concentration Gradients
/ 297
CONTENTS
ІХ
12.3 Electrochemistry and Microfluidics / 300
12.4 PDMS and Electrochemistry / 302
12.5
Optics and
Microfluidics / 306
12.6
Unconventional Soft
Lithographie
Fabrication
of Optical
Sensors /314
Acknowledgments
/317
References
/318
13
UNCONVENTIONAL PATTERNING METHODS FOR BioNEMS
325
Pilnam Kim, Yanan
Du,
AH Khademhosseini, Robert
Langer,
and Kahp Y.
Suh
13.1
Introduction
/ 325
13.2
Fabrication of Nanofluidic System for
Biological Applications
/ 326
13.2.1
Unconventional Methods for Fabrication of
Nanochannel
/ 326
13.2.2
Application of Nanofluidic System
/ 332
13.3
Fabrication of Biomolecular Nanoarrays for Biological
Applications
/ 338
13.3.1 DNA
Nanoarray
/ 338
13.3.2
Protein Arrays
/ 340
13.3.3
Lipid
Array
/ 345
13.4
Fabrication of Nanoscale Topographies for Tissue Engineering
Applications
/ 347
13.4.1
Nanotopography-Induced Changes in Cell
Adhesion
/ 347
13.4.2
Nanotopography-Induced Changes in Cell
Morphology
/ 348
References
/ 349
14
MICRO TOTAL ANALYSIS SYSTEM
359
Yuki Tanaka and Takehiko Kitamori
14.1
Introduction
/ 359
14.1.1
Historical Backgrounds
/ 359
14.2
Fundamentals on Microchip Chemistry
/ 361
14.2.1
Characteristics of Liquid Microspace
/ 361
14.2.2
Liquid Handling
/ 362
14.2.3
Concepts of Micro Unit Operation and Continuous-Flow
Chemical Processing
/ 362
14.3
Key Technologies
/ 365
14.3.1
Fabrication of Microchips
/ 365
14.3.2
Patterning for Fluid Control
/ 366
14.3.3
Detection
/ 366
14.4
Applications
/ 368
14.4.1
Synthesis
/ 368
CONTENTS
14.4.2
Cell Adhesion Control
/ 369
14.4.3
Liquid Handling: Valve Using Wettability
/ 370
References
/ 372
15
COMBINATIONS OF TOP-DOWN AND BOTTOM-UP
NANOFABRICATION TECHNIQUES AND THEIR
APPLICATION TO CREATE FUNCTIONAL DEVICES
379
Pascale
Машу,
David
N.
Reinhoudt, and Jurriaan Huskens
15.1
Introduction
/ 379
15.2
Top-Down and Bottom-Up Techniques
/ 380
15.2.1
Тор
-Down
Techniques
/ 380
15.2.2
Bottom-Up Techniques
/ 383
15.2.3
Mixed Techniques
/ 384
15.3
Combining
Тор
-Down
and Bottom-Up Techniques for High
Resolution Patterning
/ 385
15.3.1
Тор
-Down
Nanofabrication and
Polymerization
/ 386
15.3.2
Top-Down Nanofabrication and Micelles
/ 387
15.3.3
Тор
-Down
Nanofabrication and Block Copolymer
Assembly
/ 387
15.3.4
Top-Down Nanofabrication and NP Assembly
/389
15.3.5
Top-Down Nanofabrication and Layer-by-Layer
Assembly
/ 392
15.4
Applicaion of Combined
Тор
-Down
and Bottom-Up
Nanofabrication for Creating Functional Devices
/ 397
15.4.1
Photonic Crystal Devices
/ 397
15.4.2
Protein Assays
/ 400
References
/ 406
16
ORGANIC ELECTRONIC DEVICES
419
16.1
Introduction
/419
16.2
Organic Light-Emitting Diodes
/ 420
16.3
Organic Thin Film Transistors
/ 429
References
/ 439
17
INORGANIC ELECTRONIC DEVICES
445
17.1
Introduction
/ 445
17.2
Inorganic Semiconductor Materials for Flexible
Electronics
/ 446
17.2.1
Bottom-Up Approaches
/ 447
17.2.2
Top-Down Approaches
/ 449
CONTENTS
XI
17.3
Soft Lithography Techniques for Generating Inorganic
Electronic Systems
/ 452
17.3.1
Micromolding
in Capillaries
/ 453
17.3.2
Imprint Lithography
/ 454
17.3.3
Dry Transfer Printing
/ 454
17.4
Fabrication of Electronic Devices
/ 459
17.4.1
Transistors on Rigid Substrates via
MIMIC Processing
/ 459
17.4.2
Flexible Inorganic Transistors
/ 459
17.4.3
Flexible Integrated Circuits
/ 463
17.4.4
Heterogeneous Electronics
/ 466
17.4.5
Stretchable Electronics
/ 469
References
/ 475
18
MECHANICS OF STRETCHABLE SILICON FILMS ON
ELASTOMERIC SUBSTRATES
483
Hanqing Jiang, Jizhou Song, Yonggang Huang, and John A. Rogers
18.1
Introduction
/ 483
18.2
Buckling Analysis of Stiff Thin Ribbons on
Compliant Substrates
/ 484
18.3
Finite-Deformation Buckling Analysis of Stiff Thin Ribbons
on Compliant Substrates
/ 488
18.4
Edge Effects
/ 495
18.5
Effect of Ribbon Width and Spacing
/ 498
18.6
Buckling Analysis of Stiff Thin Membranes on Compliant
Substrates
/ 502
18.6.1
One-Dimensional Buckling Mode
/ 504
18.6.2
Checkerboard Buckling Mode
/ 506
18.6.3
Herrington
Buckling Mode
/ 506
18.7
Precisely Controlled Buckling of Stiff Thin Ribbons
on Compliant Substrates
/ 507
18.8
Concluding Remarks
/512
Acknowledgments
/512
References
/512
19
MULTISCALE FABRICATION OF PLASMONIC STRUCTURES
515
Joel Henzie,
Min H.
Lee, and
Teri
W. Odom
19.1
Introduction
/515
19.1.1
Brief Primer on Surface Plasmons
/517
19.1.2
Conventional Methods to Plasmonic Structures
/518
19.2
Soft Lithography and Metal Nanostructures
/518
19.3
A Platform for Multiscale Patterning
/ 520
XU CONTENTS
19.3.1
Soft Interference Lithography: Patterns on a Nanoscale
Pitch
/ 520
19.3.2
Phase-Shifting Photolithography: Patterns on a
Microscale
Pitch
/ 520
19.3.3
PEEL: Transferring Photoresist Patterns to Plasmonic
Materials
/ 521
19.4
Subwavelength Arrays of Nanoholes: Plasmonic
Materials
/ 522
19.4.1
Infinite Arrays of Nanoholes
/ 523
19.4.2
Finite Arrays (Patches) of Nanoholes
/ 525
19.5
Microscale
Arrays of Nanoscale Holes
/ 526
19.6
Plasmonic Particle Arrays
/ 528
19.6.1
Metal and Dielectric Nanoparticles
/ 528
19.6.2 Anisotropie
Nanoparticles
/ 531
19.6.3
Pyramidal Nanostructures
/ 531
Acknowledgments
/ 533
References
/ 533
20
A RIGIFLEX MOLD AND ITS APPLICATIONS
539
Se-Jin Choi, Tae-Wan Kim, and Seung-Jun Baek
20.1
Introduction
/ 539
20.2
Modulus-Tunable Rigiflex Mold
/ 540
20.3
Applications of Rigiflex Mold
/ 544
20.3.1
From Nanoimprint to
Microcontact
Printing
/ 544
20.3.2
Rapid Flash Patterning for Residue-Free
Patterning
/ 547
20.3.3
Continuous Rigiflex Imprinting
/ 549
20.3.4
Soft Molding Application
/ 553
20.3.5
Capillary Force Lithography Applications
/ 556
20.3.6
Transfer Fabrication Technique
/ 558
References
/ 561
21
NANOIMPRINT TECHNOLOGY FOR FUTURE LIQUID
CRYSTAL DISPLAY
565
Jong M. Kim, Hwan Y. Choi, Moon-G. Lee, Seungho Nam, Jin H. Kim,
Seongmo Whang,
Soo
M.
Lee, Byoung
H.
Cheong,
Нуик
Kim,
Ji
M. Lee,
and In
T. Han
21.1
Introduction
/ 565
21.2
Holographic LGP
/ 569
21.2.1
Design and Properties of Holographic LGP
/ 570
21.2.2 N1
Technology for the Holographic LGP
/ 572
21.3
Polarized LGP
/ 573
21.3.1
Design and Properties of Polarized LGP
/ 574
CONTENTS
ХІІІ
21.3.2
Fabrication
of the Polarized LGP
/ 575
21.3.3
Optical Performance of the Polarized LGP
/ 576
21.4
Reflective Polarizer: Wire Grid Polarizer
/ 579
21.4.1
Design and Properies of WGP
/ 580
21.4.2
Fabrication and Applications
/ 581
21.5
Transflective Display
/ 585
21.5.1
Design and Optical Properties of Reflecting Pattern
/ 587
21.5.2
Fabrication of the Reflecting Pattern
/ 588
References
/ 592
INDEX
595
|
| adam_txt |
CONTENTS
PREFACE
xv
I NANOPATTERNING TECHNIQUES
1
1
INTRODUCTION
3
2
MATERIALS
7
2.1
Introduction
/ 7
2.2
Mold Materials and Mold Preparation
/ 8
2.2.1
Soft Molds
/ 8
2.2.2
Hard Molds
/ 19
2.2.3
Rigiflex Molds
/ 19
2.3
Surface Treatment and Modification
/ 21
References
/ 23
3
PATTERNING BASED ON NATURAL FORCE
27
3.1
Introduction
/ 27
3.2
Capillary Force
/ 28
3.2.1
Open-Ended Capillary
/ 29
3.2.2
Closed Permeable Capillary
/ 31
3.2.3
Completely Closed Capillary
/ 40
3.2.4
Fast Patterning
/ 43
3.2.5
Capillary Kinetics
/ 45
3.3
London Force and Liquid Filament Stability
/ 48
3.3.1
Patterning by Selective Dewetting
/ 49
3.3.2
Liquid Filament Stability: Filling and Patterning
/ 51
3.4
Mechanical Stress: Patterning of A Metal Surface
/ 56
References
/ 63
4
PATTERNING BASED ON WORK OF ADHESION
67
4.1
Introduction
/ 67
4.2
Work of Adhesion
/ 68
VÍ
CONTENTS
4.3
Kinetic Effects
/ 71
4.4
Transfer Patterning
/ 74
4.5
Subtractive Transfer Patterning
/ 79
4.6
Transfer Printing
/ 82
References
/91
5
PATTERNING BASED ON LIGHT: OPTICAL
SOFT LITHOGRAPHY
95
5.1
Introduction
/ 95
5.2
System Elements
/ 96
5.2.1
Overview
/ 96
5.2.2
Elastomeric Photomasks
/ 96
5.2.3
Photosensitive Materials
/ 99
5.3
Two-Dimensional Optical Soft Lithography (OSL)
/ 100
5.3.1
Two-Dimensional OSL with Phase Masks
/ 100
5.3.2
Two-Dimensional OSL with Embossed Masks
/ 104
5.3.3
Two-Dimensional OSL with Amplitude Masks
/ 105
5.3.4
Two-Dimensional OSL with Amplitude/Phase Masks
/ 109
5.4
Three-Dimensional Optical Soft Lithography
/110
5.4.1
Optics /111
5.4.2
Patterning Results
/ 112
5.5
Applications
/117
5.5.1
Low-Voltage Organic Electronics
/ 117
5.5.2
Filters and Mixers for Microfluidics
/118
5.5.3
High Energy Fusion Targets and Media for
Chemical Release
/118
5.5.4
Photonic
Bandgap
Materials
/ 120
References
/ 122
6
PATTERNING BASED ON EXTERNAL FORCE:
NANOIMPRINT LITHOGRAPHY
129
L. Jay Guo
6.1
Introduction
/ 129
6.2
NIL MOLD
/ 133
6.2.1
Mold Fabrication
/ 133
6.2.2
Mold Surface Preparation
/ 137
6.2.3
Flexible Fluoropolymer Mold
/ 137
6.3
NIL Resist
/ 138
6.3.1
Thermoplastic Resist
/ 139
6.3.2
Copolymer Thermoplastic Resists
/ 141
6.3.3
Thermal-Curable Resists
/ 142
6.3.4
UV-Curable Resist
/ 146
6.3.5
Other
Imprimable
Materials
/ 148
6.4
The Nanoimprint Process
/ 149
6.4.1
Cavity Fill Process
/ 149
CONTENTS
VÌI
6.5
Variations of NIL Processes
/ 152
6.5.1
Reverse Nanoimprint
/152
6.5.2
Combined Nanoimprint and Photolithography
/ 155
6.5.3
Roll-to-Roll Nanoimprint Lithography (R2RNIL)
/ 156
6.6
Conclusion
/ 159
References
/ 160
7
PATTERNING BASED ON EDGE EFFECTS:
EDGE LITHOGRAPHY
167
Matthias Geissler, Joseph M. McLellan, Eric P. Lee and Younan Xia
7.1
Introduction
/ 167
7.2
Topography-Directed Pattern Transfer
/ 169
7.2.1
Photolithography with Phase-Shifting Masks
/ 170
7.2.2
Use of Edge-Defined Defects in
S
AMs
/ 172
7.2.3
Controlled Undercutting
/ 175
7.2.4
Edge-Spreading Lithography
/ 176
7.2.5
Edge Transfer Lithography
/ 178
7.2.6
Step-Edge Decoration
/ 180
7.3
Exposure of Nanoscale Edges
/ 181
7.3.1
Fracturing of Thin Films
/ 182
7.3.2
Sectioning of Encapsulated Thin Films
/ 182
7.3.3
Thin Metallic Films along Sidewalls of
Patterned Stamps
/ 184
7.3.4
Topographic
Reorientation
/ 186
7.4
Conclusion and Outlook
/ 187
References
/ 188
8
PATTERNING WITH ELECTROLYTE: SOLID-STATE
SUPERIONIC STAMPING
195
Keng H. Hsu, Peter L.
Schultz,
Nicholas X. Fang, and Placid M.
Ferreira
8.1
Introduction
/ 195
8.2
Solid-State Superionic Stamping
/ 197
8.3
Process Technology
/ 199
8.4
Process Capabilities
/ 203
8.5
Examples of Electrochemically Imprinted Nanostructures
Using the S4 Process
/ 208
Acknowledgments
/211
References
/ 211
9
PATTERNING WITH GELS: LATTICE-GAS MODELS
215
Paul
J
.
Wesson and
Bartosz
A. Grzybowski
9.1
Introduction
/215
9.2
The RDF Method
/218
VIU
CONTENTS
9.3
Microlenses:
Fabrication
/218
9.4
Microlenses:
Modeling Aspects
/ 220
9.4.1
Modeling Using PDEs
/ 220
9.4.2
Modeling Using Lattice-Gas Method
/ 221
9.5
RDF at the Nanoscale
/ 222
9.5.1
Nanoscopic Features from Counter-Propagating
RD Fronts
/ 222
9.5.2
Failure of Continuum Description
/ 225
9.5.3
Lattice-Gas Models at the Nanoscale
/ 227
9.6
Summary and Outlook
/ 229
References
/ 230
10
PATTERNING WITH BLOCK COPOLYMERS
233
Jia-Yu Wang. Wei Chen, and Thomas P. Russell
10.1
Introduction
/ 233
10.2
Orientation
/ 235
10.2.1
Self-Assembling
/ 235
10.2.2
Self-Directing
/ 247
10.3
Long-Range
/ 254
10.3.1
Solvent Annealing
/ 254
10.3.2
Graphoepitaxy
/ 256
10.3.3
Sequential, Orthogonal Fields
/ 260
10.4
Nanoporous BCP Films
/ 262
10.4.1
Ozonolysis
/ 264
10.4.2
Thermal Degradation
/ 264
10.4.3
UV Degradation
/ 267
10.4.4
Selective Extraction
/ 271
10.4.5
"Soft" Chemical Etch
/ 272
10.4.6
Cleavable Junction
/ 272
10.4.7
Solvent-Induced Film Reconstruction
/ 274
References
/
276
11
PERSPECTIVE ON APPLICATIONS
291
11 APPLICATIONS
293
12
SOFT LITHOGRAPHY FOR MICROFLUIDIC
MICROELECTROMECHANICAL SYSTEMS (MEMS)
AND OPTICAL DEVICES
295
Svetlana M.
Mitrovski, Shraddha Avasthy, Evan M. Erickson,
Matthew E. Stewart. John A. Rogers, and Ralph G. Nuzzo
12.1
Introduction
/ 295
12.2
Microfluidic Devices for Concentration Gradients
/ 297
CONTENTS
ІХ
12.3 Electrochemistry and Microfluidics / 300
12.4 PDMS and Electrochemistry / 302
12.5
Optics and
Microfluidics / 306
12.6
Unconventional Soft
Lithographie
Fabrication
of Optical
Sensors /314
Acknowledgments
/317
References
/318
13
UNCONVENTIONAL PATTERNING METHODS FOR BioNEMS
325
Pilnam Kim, Yanan
Du,
AH Khademhosseini, Robert
Langer,
and Kahp Y.
Suh
13.1
Introduction
/ 325
13.2
Fabrication of Nanofluidic System for
Biological Applications
/ 326
13.2.1
Unconventional Methods for Fabrication of
Nanochannel
/ 326
13.2.2
Application of Nanofluidic System
/ 332
13.3
Fabrication of Biomolecular Nanoarrays for Biological
Applications
/ 338
13.3.1 DNA
Nanoarray
/ 338
13.3.2
Protein Arrays
/ 340
13.3.3
Lipid
Array
/ 345
13.4
Fabrication of Nanoscale Topographies for Tissue Engineering
Applications
/ 347
13.4.1
Nanotopography-Induced Changes in Cell
Adhesion
/ 347
13.4.2
Nanotopography-Induced Changes in Cell
Morphology
/ 348
References
/ 349
14
MICRO TOTAL ANALYSIS SYSTEM
359
Yuki Tanaka and Takehiko Kitamori
14.1
Introduction
/ 359
14.1.1
Historical Backgrounds
/ 359
14.2
Fundamentals on Microchip Chemistry
/ 361
14.2.1
Characteristics of Liquid Microspace
/ 361
14.2.2
Liquid Handling
/ 362
14.2.3
Concepts of Micro Unit Operation and Continuous-Flow
Chemical Processing
/ 362
14.3
Key Technologies
/ 365
14.3.1
Fabrication of Microchips
/ 365
14.3.2
Patterning for Fluid Control
/ 366
14.3.3
Detection
/ 366
14.4
Applications
/ 368
14.4.1
Synthesis
/ 368
CONTENTS
14.4.2
Cell Adhesion Control
/ 369
14.4.3
Liquid Handling: Valve Using Wettability
/ 370
References
/ 372
15
COMBINATIONS OF TOP-DOWN AND BOTTOM-UP
NANOFABRICATION TECHNIQUES AND THEIR
APPLICATION TO CREATE FUNCTIONAL DEVICES
379
Pascale
Машу,
David
N.
Reinhoudt, and Jurriaan Huskens
15.1
Introduction
/ 379
15.2
Top-Down and Bottom-Up Techniques
/ 380
15.2.1
Тор
-Down
Techniques
/ 380
15.2.2
Bottom-Up Techniques
/ 383
15.2.3
Mixed Techniques
/ 384
15.3
Combining
Тор
-Down
and Bottom-Up Techniques for High
Resolution Patterning
/ 385
15.3.1
Тор
-Down
Nanofabrication and
Polymerization
/ 386
15.3.2
Top-Down Nanofabrication and Micelles
/ 387
15.3.3
Тор
-Down
Nanofabrication and Block Copolymer
Assembly
/ 387
15.3.4
Top-Down Nanofabrication and NP Assembly
/389
15.3.5
Top-Down Nanofabrication and Layer-by-Layer
Assembly
/ 392
15.4
Applicaion of Combined
Тор
-Down
and Bottom-Up
Nanofabrication for Creating Functional Devices
/ 397
15.4.1
Photonic Crystal Devices
/ 397
15.4.2
Protein Assays
/ 400
References
/ 406
16
ORGANIC ELECTRONIC DEVICES
419
16.1
Introduction
/419
16.2
Organic Light-Emitting Diodes
/ 420
16.3
Organic Thin Film Transistors
/ 429
References
/ 439
17
INORGANIC ELECTRONIC DEVICES
445
17.1
Introduction
/ 445
17.2
Inorganic Semiconductor Materials for Flexible
Electronics
/ 446
17.2.1
"Bottom-Up" Approaches
/ 447
17.2.2
"Top-Down" Approaches
/ 449
CONTENTS
XI
17.3
Soft Lithography Techniques for Generating Inorganic
Electronic Systems
/ 452
17.3.1
Micromolding
in Capillaries
/ 453
17.3.2
Imprint Lithography
/ 454
17.3.3
Dry Transfer Printing
/ 454
17.4
Fabrication of Electronic Devices
/ 459
17.4.1
Transistors on Rigid Substrates via
MIMIC Processing
/ 459
17.4.2
Flexible Inorganic Transistors
/ 459
17.4.3
Flexible Integrated Circuits
/ 463
17.4.4
Heterogeneous Electronics
/ 466
17.4.5
Stretchable Electronics
/ 469
References
/ 475
18
MECHANICS OF STRETCHABLE SILICON FILMS ON
ELASTOMERIC SUBSTRATES
483
Hanqing Jiang, Jizhou Song, Yonggang Huang, and John A. Rogers
18.1
Introduction
/ 483
18.2
Buckling Analysis of Stiff Thin Ribbons on
Compliant Substrates
/ 484
18.3
Finite-Deformation Buckling Analysis of Stiff Thin Ribbons
on Compliant Substrates
/ 488
18.4
Edge Effects
/ 495
18.5
Effect of Ribbon Width and Spacing
/ 498
18.6
Buckling Analysis of Stiff Thin Membranes on Compliant
Substrates
/ 502
18.6.1
One-Dimensional Buckling Mode
/ 504
18.6.2
Checkerboard Buckling Mode
/ 506
18.6.3
Herrington
Buckling Mode
/ 506
18.7
Precisely Controlled Buckling of Stiff Thin Ribbons
on Compliant Substrates
/ 507
18.8
Concluding Remarks
/512
Acknowledgments
/512
References
/512
19
MULTISCALE FABRICATION OF PLASMONIC STRUCTURES
515
Joel Henzie,
Min H.
Lee, and
Teri
W. Odom
19.1
Introduction
/515
19.1.1
Brief Primer on Surface Plasmons
/517
19.1.2
Conventional Methods to Plasmonic Structures
/518
19.2
Soft Lithography and Metal Nanostructures
/518
19.3
A Platform for Multiscale Patterning
/ 520
XU CONTENTS
19.3.1
Soft Interference Lithography: Patterns on a Nanoscale
Pitch
/ 520
19.3.2
Phase-Shifting Photolithography: Patterns on a
Microscale
Pitch
/ 520
19.3.3
PEEL: Transferring Photoresist Patterns to Plasmonic
Materials
/ 521
19.4
Subwavelength Arrays of Nanoholes: Plasmonic
Materials
/ 522
19.4.1
Infinite Arrays of Nanoholes
/ 523
19.4.2
Finite Arrays (Patches) of Nanoholes
/ 525
19.5
Microscale
Arrays of Nanoscale Holes
/ 526
19.6
Plasmonic Particle Arrays
/ 528
19.6.1
Metal and Dielectric Nanoparticles
/ 528
19.6.2 Anisotropie
Nanoparticles
/ 531
19.6.3
Pyramidal Nanostructures
/ 531
Acknowledgments
/ 533
References
/ 533
20
A RIGIFLEX MOLD AND ITS APPLICATIONS
539
Se-Jin Choi, Tae-Wan Kim, and Seung-Jun Baek
20.1
Introduction
/ 539
20.2
Modulus-Tunable Rigiflex Mold
/ 540
20.3
Applications of Rigiflex Mold
/ 544
20.3.1
From Nanoimprint to
Microcontact
Printing
/ 544
20.3.2
Rapid Flash Patterning for Residue-Free
Patterning
/ 547
20.3.3
Continuous Rigiflex Imprinting
/ 549
20.3.4
Soft Molding Application
/ 553
20.3.5
Capillary Force Lithography Applications
/ 556
20.3.6
Transfer Fabrication Technique
/ 558
References
/ 561
21
NANOIMPRINT TECHNOLOGY FOR FUTURE LIQUID
CRYSTAL DISPLAY
565
Jong M. Kim, Hwan Y. Choi, Moon-G. Lee, Seungho Nam, Jin H. Kim,
Seongmo Whang,
Soo
M.
Lee, Byoung
H.
Cheong,
Нуик
Kim,
Ji
M. Lee,
and In
T. Han
21.1
Introduction
/ 565
21.2
Holographic LGP
/ 569
21.2.1
Design and Properties of Holographic LGP
/ 570
21.2.2 N1
Technology for the Holographic LGP
/ 572
21.3
Polarized LGP
/ 573
21.3.1
Design and Properties of Polarized LGP
/ 574
CONTENTS
ХІІІ
21.3.2
Fabrication
of the Polarized LGP
/ 575
21.3.3
Optical Performance of the Polarized LGP
/ 576
21.4
Reflective Polarizer: Wire Grid Polarizer
/ 579
21.4.1
Design and Properies of WGP
/ 580
21.4.2
Fabrication and Applications
/ 581
21.5
Transflective Display
/ 585
21.5.1
Design and Optical Properties of Reflecting Pattern
/ 587
21.5.2
Fabrication of the Reflecting Pattern
/ 588
References
/ 592
INDEX
595 |
| any_adam_object | 1 |
| any_adam_object_boolean | 1 |
| author | Rogers, John A. 1967- Lee, Hong H. |
| author_GND | (DE-588)1104966468 |
| author_facet | Rogers, John A. 1967- Lee, Hong H. |
| author_role | aut aut |
| author_sort | Rogers, John A. 1967- |
| author_variant | j a r ja jar h h l hh hhl |
| building | Verbundindex |
| bvnumber | BV035140140 |
| callnumber-first | T - Technology |
| callnumber-label | TA418 |
| callnumber-raw | TA418.9.N35 |
| callnumber-search | TA418.9.N35 |
| callnumber-sort | TA 3418.9 N35 |
| callnumber-subject | TA - General and Civil Engineering |
| classification_rvk | VE 9850 |
| classification_tum | TEC 030f |
| ctrlnum | (OCoLC)228427382 (DE-599)BVBBV035140140 |
| dewey-full | 620/.5 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
| dewey-raw | 620/.5 |
| dewey-search | 620/.5 |
| dewey-sort | 3620 15 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Chemie / Pharmazie Technik |
| discipline_str_mv | Chemie / Pharmazie Technik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01589nam a2200433zc 4500</leader><controlfield tag="001">BV035140140</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20180601 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">081104s2009 xxuad|| |||| 00||| eng d</controlfield><datafield tag="010" ind1=" " ind2=" "><subfield code="a">2008021425</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780470099575</subfield><subfield code="c">cloth</subfield><subfield code="9">978-0-470-09957-5</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)228427382</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV035140140</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="044" ind1=" " ind2=" "><subfield code="a">xxu</subfield><subfield code="c">US</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-703</subfield><subfield code="a">DE-29T</subfield><subfield code="a">DE-91</subfield><subfield code="a">DE-11</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TA418.9.N35</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620/.5</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">VE 9850</subfield><subfield code="0">(DE-625)147163:253</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">TEC 030f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Rogers, John A.</subfield><subfield code="d">1967-</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)1104966468</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Unconventional nanopatterning techniques and applications</subfield><subfield code="c">John A. Rogers ; Hong H. Lee</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Hoboken, NJ</subfield><subfield code="b">Wiley</subfield><subfield code="c">2009</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XV, 598 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes index.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Nanoparticles</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Nanostructured materials</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Nanopartikel</subfield><subfield code="0">(DE-588)4333369-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)4143413-4</subfield><subfield code="a">Aufsatzsammlung</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Nanopartikel</subfield><subfield code="0">(DE-588)4333369-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Lee, Hong H.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">Digitalisierung UB Bayreuth</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=016807537&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-016807537</subfield></datafield></record></collection> |
| genre | (DE-588)4143413-4 Aufsatzsammlung gnd-content |
| genre_facet | Aufsatzsammlung |
| id | DE-604.BV035140140 |
| illustrated | Illustrated |
| index_date | 2024-07-02T22:26:52Z |
| indexdate | 2024-07-09T21:23:12Z |
| institution | BVB |
| isbn | 9780470099575 |
| language | English |
| lccn | 2008021425 |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-016807537 |
| oclc_num | 228427382 |
| open_access_boolean | |
| owner | DE-703 DE-29T DE-91 DE-BY-TUM DE-11 |
| owner_facet | DE-703 DE-29T DE-91 DE-BY-TUM DE-11 |
| physical | XV, 598 S. Ill., graph. Darst. |
| publishDate | 2009 |
| publishDateSearch | 2009 |
| publishDateSort | 2009 |
| publisher | Wiley |
| record_format | marc |
| spelling | Rogers, John A. 1967- Verfasser (DE-588)1104966468 aut Unconventional nanopatterning techniques and applications John A. Rogers ; Hong H. Lee Hoboken, NJ Wiley 2009 XV, 598 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Includes index. Nanoparticles Nanostructured materials Nanopartikel (DE-588)4333369-2 gnd rswk-swf (DE-588)4143413-4 Aufsatzsammlung gnd-content Nanopartikel (DE-588)4333369-2 s DE-604 Lee, Hong H. Verfasser aut Digitalisierung UB Bayreuth application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=016807537&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Rogers, John A. 1967- Lee, Hong H. Unconventional nanopatterning techniques and applications Nanoparticles Nanostructured materials Nanopartikel (DE-588)4333369-2 gnd |
| subject_GND | (DE-588)4333369-2 (DE-588)4143413-4 |
| title | Unconventional nanopatterning techniques and applications |
| title_auth | Unconventional nanopatterning techniques and applications |
| title_exact_search | Unconventional nanopatterning techniques and applications |
| title_exact_search_txtP | Unconventional nanopatterning techniques and applications |
| title_full | Unconventional nanopatterning techniques and applications John A. Rogers ; Hong H. Lee |
| title_fullStr | Unconventional nanopatterning techniques and applications John A. Rogers ; Hong H. Lee |
| title_full_unstemmed | Unconventional nanopatterning techniques and applications John A. Rogers ; Hong H. Lee |
| title_short | Unconventional nanopatterning techniques and applications |
| title_sort | unconventional nanopatterning techniques and applications |
| topic | Nanoparticles Nanostructured materials Nanopartikel (DE-588)4333369-2 gnd |
| topic_facet | Nanoparticles Nanostructured materials Nanopartikel Aufsatzsammlung |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=016807537&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT rogersjohna unconventionalnanopatterningtechniquesandapplications AT leehongh unconventionalnanopatterningtechniquesandapplications |