Microlithography: science and technology
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Boca Raton, Fla. [u.a.]
CRC Press
2007
|
| Ausgabe: | 2. ed. |
| Schriftenreihe: | Optical science and engineering
126 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis Publisher description Inhaltsverzeichnis Inhaltsverzeichnis |
| Beschreibung: | Literaturangaben |
| Beschreibung: | 848 S. Ill., graph. Darst. |
| ISBN: | 0824790243 9780824790240 |
Internformat
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV035138572 | ||
| 003 | DE-604 | ||
| 005 | 20090330 | ||
| 007 | t | ||
| 008 | 081104s2007 ad|| |||| 00||| eng d | ||
| 010 | |a 2006031516 | ||
| 020 | |a 0824790243 |c alk. paper |9 0-8247-9024-3 | ||
| 020 | |a 9780824790240 |c alk. paper |9 978-0-8247-9024-0 | ||
| 035 | |a (OCoLC)71581976 | ||
| 035 | |a (DE-599)GBV518027945 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-703 |a DE-634 |a DE-11 | ||
| 050 | 0 | |a TK7836 | |
| 082 | 0 | |a 621.3815/31 |2 22 | |
| 084 | |a ZN 4150 |0 (DE-625)157360: |2 rvk | ||
| 245 | 1 | 0 | |a Microlithography |b science and technology |c ed. by Kazuaki Suzuki... |
| 250 | |a 2. ed. | ||
| 264 | 1 | |a Boca Raton, Fla. [u.a.] |b CRC Press |c 2007 | |
| 300 | |a 848 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Optical science and engineering |v 126 | |
| 500 | |a Literaturangaben | ||
| 650 | 0 | |a Microlithography / Industrial applications | |
| 650 | 0 | |a Integrated circuits / Masks | |
| 650 | 0 | |a Metal oxide semiconductors, Complementary / Design and construction | |
| 650 | 0 | |a Manufacturing processes | |
| 650 | 4 | |a Circuits intégrés - Masques | |
| 650 | 4 | |a Fabrication | |
| 650 | 4 | |a MOS complémentaires - Conception et construction | |
| 650 | 4 | |a Microlithographie - Applications industrielles | |
| 650 | 4 | |a Integrated circuits |x Masks | |
| 650 | 4 | |a Manufacturing processes | |
| 650 | 4 | |a Metal oxide semiconductors, Complementary |x Design and construction | |
| 650 | 4 | |a Microlithography |x Industrial applications | |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Maskentechnik |0 (DE-588)4125845-9 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 0 | 1 | |a Maskentechnik |0 (DE-588)4125845-9 |D s |
| 689 | 0 | |8 1\p |5 DE-604 | |
| 700 | 1 | |a Suzuki, Kazuaki |e Sonstige |4 oth | |
| 830 | 0 | |a Optical science and engineering |v 126 |w (DE-604)BV021746449 |9 126 | |
| 856 | 4 | |u http://www.gbv.de/dms/ilmenau/toc/518027945.PDF |z lizenzfrei |3 Inhaltsverzeichnis | |
| 856 | 4 | |u http://www.loc.gov/catdir/enhancements/fy0701/2006031516-d.html |z Publisher description |z lizenzfrei | |
| 856 | 4 | |u http://www.loc.gov/catdir/toc/ecip071/2006031516.html |z lizenzfrei |3 Inhaltsverzeichnis | |
| 856 | 4 | 2 | |m GBV Datenaustausch |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=016805991&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-016805991 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
Datensatz im Suchindex
| _version_ | 1804138121767419904 |
|---|---|
| adam_text | MICSSOLITHOCRAPHY SCIENCE AND TECHNOLOGY SECOND EDITION EDITED BY KAZUAKI
SUZUKI BRUCE W. SMITH CRC PRESS TAYLOR &. FRANCIS GROUP BOCA RATON
LONDON NEW YORK CRC PRESS IS AN IMPRINT OF THE TAYLOR & FRANCIS GROUP,
AN INFORMA BUSINESS CONTENTS PART I EXPOSURE SYSTEM 1. SYSTEM OVERVIEW
OF OPTICAL STEPPERS AND SCANNERS 3 MICHAEL S. HIBBS 2. OPTICAL
LITHOGRAPHY MODELING 97 CHRIS A. MACK 3. OPTICS FOR PHOTOLITHOGRAPHY 149
BRUCE W. SMITH 4. EXCIMER LASER FOR ADVANCED MICROLITHOGRAPHY 243 PALASH
DAS 5. ALIGNMENT AND OVERLAY 287 GREGG M. GALLATIN 6. ELECTRON BEAM
LITHOGRAPHY SYSTEMS 329 KAZUAKI SUZUKI 7. X-RAY LITHOGRAPHY 361 TAKUMI
UENO 8. EUV LITHOGRAPHY 383 STEFAN WURM AND CHARLES GWYN 9. IMPRINT
LITHOGRAPHY 465 DOUGLAS }. RESNICK PART II RESISTS AND PROCESSING 10.
CHEMISTRY OF PHOTORESIST MATERIALS 503 TAKUMI UENO AND ROBERT D. ALLEN
11. RESIST PROCESSING 587 BRUCE W. SMITH 12. MULTILAYER RESIST
TECHNOLOGY 637 BRUCE W. SMITH AND MAUREEN HANRATTY 13. DRY ETCHING OF
PHOTORESISTS 675 RODERICK R. KUNZ PART III METROLOGY AND NANOLITHOGRAPHY
14. CRITICAL-DIMENSIONAL METROLOGY FOR INTEGRATED-CIRCUIT TECHNOLOGY
.... 701 HERSCHEL M. MARCHMAN, GIAN LORUSSO, MIKE ADEL, AND SANJAY YEDUR
15. ELECTRON BEAM NANOLITHOGRAPHY 799 ELIZABETH A. DOBISZ, ZVONIMIR Z.
BAENDLE, AND MARTIN C. PEEKERAR INDEX 837
|
| adam_txt |
MICSSOLITHOCRAPHY SCIENCE AND TECHNOLOGY SECOND EDITION EDITED BY KAZUAKI
SUZUKI BRUCE W. SMITH CRC PRESS TAYLOR &. FRANCIS GROUP BOCA RATON
LONDON NEW YORK CRC PRESS IS AN IMPRINT OF THE TAYLOR & FRANCIS GROUP,
AN INFORMA BUSINESS CONTENTS PART I EXPOSURE SYSTEM 1. SYSTEM OVERVIEW
OF OPTICAL STEPPERS AND SCANNERS 3 MICHAEL S. HIBBS 2. OPTICAL
LITHOGRAPHY MODELING 97 CHRIS A. MACK 3. OPTICS FOR PHOTOLITHOGRAPHY 149
BRUCE W. SMITH 4. EXCIMER LASER FOR ADVANCED MICROLITHOGRAPHY 243 PALASH
DAS 5. ALIGNMENT AND OVERLAY 287 GREGG M. GALLATIN 6. ELECTRON BEAM
LITHOGRAPHY SYSTEMS 329 KAZUAKI SUZUKI 7. X-RAY LITHOGRAPHY 361 TAKUMI
UENO 8. EUV LITHOGRAPHY 383 STEFAN WURM AND CHARLES GWYN 9. IMPRINT
LITHOGRAPHY 465 DOUGLAS }. RESNICK PART II RESISTS AND PROCESSING 10.
CHEMISTRY OF PHOTORESIST MATERIALS 503 TAKUMI UENO AND ROBERT D. ALLEN
11. RESIST PROCESSING 587 BRUCE W. SMITH 12. MULTILAYER RESIST
TECHNOLOGY 637 BRUCE W. SMITH AND MAUREEN HANRATTY 13. DRY ETCHING OF
PHOTORESISTS 675 RODERICK R. KUNZ PART III METROLOGY AND NANOLITHOGRAPHY
14. CRITICAL-DIMENSIONAL METROLOGY FOR INTEGRATED-CIRCUIT TECHNOLOGY
. 701 HERSCHEL M. MARCHMAN, GIAN LORUSSO, MIKE ADEL, AND SANJAY YEDUR
15. ELECTRON BEAM NANOLITHOGRAPHY 799 ELIZABETH A. DOBISZ, ZVONIMIR Z.
BAENDLE, AND MARTIN C. PEEKERAR INDEX 837 |
| any_adam_object | 1 |
| any_adam_object_boolean | 1 |
| building | Verbundindex |
| bvnumber | BV035138572 |
| callnumber-first | T - Technology |
| callnumber-label | TK7836 |
| callnumber-raw | TK7836 |
| callnumber-search | TK7836 |
| callnumber-sort | TK 47836 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | ZN 4150 |
| ctrlnum | (OCoLC)71581976 (DE-599)GBV518027945 |
| dewey-full | 621.3815/31 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| discipline_str_mv | Elektrotechnik / Elektronik / Nachrichtentechnik |
| edition | 2. ed. |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02732nam a2200625 cb4500</leader><controlfield tag="001">BV035138572</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20090330 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">081104s2007 ad|| |||| 00||| eng d</controlfield><datafield tag="010" ind1=" " ind2=" "><subfield code="a">2006031516</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0824790243</subfield><subfield code="c">alk. paper</subfield><subfield code="9">0-8247-9024-3</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780824790240</subfield><subfield code="c">alk. paper</subfield><subfield code="9">978-0-8247-9024-0</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)71581976</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBV518027945</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-703</subfield><subfield code="a">DE-634</subfield><subfield code="a">DE-11</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7836</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/31</subfield><subfield code="2">22</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4150</subfield><subfield code="0">(DE-625)157360:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Microlithography</subfield><subfield code="b">science and technology</subfield><subfield code="c">ed. by Kazuaki Suzuki...</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">2. ed.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Boca Raton, Fla. [u.a.]</subfield><subfield code="b">CRC Press</subfield><subfield code="c">2007</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">848 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Optical science and engineering</subfield><subfield code="v">126</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Literaturangaben</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Microlithography / Industrial applications</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Integrated circuits / Masks</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Metal oxide semiconductors, Complementary / Design and construction</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Manufacturing processes</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Circuits intégrés - Masques</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Fabrication</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">MOS complémentaires - Conception et construction</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithographie - Applications industrielles</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits</subfield><subfield code="x">Masks</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Manufacturing processes</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Metal oxide semiconductors, Complementary</subfield><subfield code="x">Design and construction</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield><subfield code="x">Industrial applications</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Maskentechnik</subfield><subfield code="0">(DE-588)4125845-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Maskentechnik</subfield><subfield code="0">(DE-588)4125845-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Suzuki, Kazuaki</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Optical science and engineering</subfield><subfield code="v">126</subfield><subfield code="w">(DE-604)BV021746449</subfield><subfield code="9">126</subfield></datafield><datafield tag="856" ind1="4" ind2=" "><subfield code="u">http://www.gbv.de/dms/ilmenau/toc/518027945.PDF</subfield><subfield code="z">lizenzfrei</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="856" ind1="4" ind2=" "><subfield code="u">http://www.loc.gov/catdir/enhancements/fy0701/2006031516-d.html</subfield><subfield code="z">Publisher description</subfield><subfield code="z">lizenzfrei</subfield></datafield><datafield tag="856" ind1="4" ind2=" "><subfield code="u">http://www.loc.gov/catdir/toc/ecip071/2006031516.html</subfield><subfield code="z">lizenzfrei</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">GBV Datenaustausch</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=016805991&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-016805991</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield></record></collection> |
| id | DE-604.BV035138572 |
| illustrated | Illustrated |
| index_date | 2024-07-02T22:26:21Z |
| indexdate | 2024-07-09T21:23:09Z |
| institution | BVB |
| isbn | 0824790243 9780824790240 |
| language | English |
| lccn | 2006031516 |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-016805991 |
| oclc_num | 71581976 |
| open_access_boolean | |
| owner | DE-703 DE-634 DE-11 |
| owner_facet | DE-703 DE-634 DE-11 |
| physical | 848 S. Ill., graph. Darst. |
| publishDate | 2007 |
| publishDateSearch | 2007 |
| publishDateSort | 2007 |
| publisher | CRC Press |
| record_format | marc |
| series | Optical science and engineering |
| series2 | Optical science and engineering |
| spelling | Microlithography science and technology ed. by Kazuaki Suzuki... 2. ed. Boca Raton, Fla. [u.a.] CRC Press 2007 848 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Optical science and engineering 126 Literaturangaben Microlithography / Industrial applications Integrated circuits / Masks Metal oxide semiconductors, Complementary / Design and construction Manufacturing processes Circuits intégrés - Masques Fabrication MOS complémentaires - Conception et construction Microlithographie - Applications industrielles Integrated circuits Masks Metal oxide semiconductors, Complementary Design and construction Microlithography Industrial applications Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Maskentechnik (DE-588)4125845-9 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s Maskentechnik (DE-588)4125845-9 s 1\p DE-604 Suzuki, Kazuaki Sonstige oth Optical science and engineering 126 (DE-604)BV021746449 126 http://www.gbv.de/dms/ilmenau/toc/518027945.PDF lizenzfrei Inhaltsverzeichnis http://www.loc.gov/catdir/enhancements/fy0701/2006031516-d.html Publisher description lizenzfrei http://www.loc.gov/catdir/toc/ecip071/2006031516.html lizenzfrei Inhaltsverzeichnis GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=016805991&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Microlithography science and technology Optical science and engineering Microlithography / Industrial applications Integrated circuits / Masks Metal oxide semiconductors, Complementary / Design and construction Manufacturing processes Circuits intégrés - Masques Fabrication MOS complémentaires - Conception et construction Microlithographie - Applications industrielles Integrated circuits Masks Metal oxide semiconductors, Complementary Design and construction Microlithography Industrial applications Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Maskentechnik (DE-588)4125845-9 gnd |
| subject_GND | (DE-588)4191584-7 (DE-588)4125845-9 |
| title | Microlithography science and technology |
| title_auth | Microlithography science and technology |
| title_exact_search | Microlithography science and technology |
| title_exact_search_txtP | Microlithography science and technology |
| title_full | Microlithography science and technology ed. by Kazuaki Suzuki... |
| title_fullStr | Microlithography science and technology ed. by Kazuaki Suzuki... |
| title_full_unstemmed | Microlithography science and technology ed. by Kazuaki Suzuki... |
| title_short | Microlithography |
| title_sort | microlithography science and technology |
| title_sub | science and technology |
| topic | Microlithography / Industrial applications Integrated circuits / Masks Metal oxide semiconductors, Complementary / Design and construction Manufacturing processes Circuits intégrés - Masques Fabrication MOS complémentaires - Conception et construction Microlithographie - Applications industrielles Integrated circuits Masks Metal oxide semiconductors, Complementary Design and construction Microlithography Industrial applications Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Maskentechnik (DE-588)4125845-9 gnd |
| topic_facet | Microlithography / Industrial applications Integrated circuits / Masks Metal oxide semiconductors, Complementary / Design and construction Manufacturing processes Circuits intégrés - Masques Fabrication MOS complémentaires - Conception et construction Microlithographie - Applications industrielles Integrated circuits Masks Metal oxide semiconductors, Complementary Design and construction Microlithography Industrial applications Lithografie Halbleitertechnologie Maskentechnik |
| url | http://www.gbv.de/dms/ilmenau/toc/518027945.PDF http://www.loc.gov/catdir/enhancements/fy0701/2006031516-d.html http://www.loc.gov/catdir/toc/ecip071/2006031516.html http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=016805991&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| volume_link | (DE-604)BV021746449 |
| work_keys_str_mv | AT suzukikazuaki microlithographyscienceandtechnology |
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