Wafer level reliability of advanced CMOS devices and processes:
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
New York
Nova Science Publ.
2008
|
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | 195 S. |
| ISBN: | 9781604567137 |
Internformat
MARC
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| 245 | 1 | 0 | |a Wafer level reliability of advanced CMOS devices and processes |c Yi Zhao, ed. |
| 264 | 1 | |a New York |b Nova Science Publ. |c 2008 | |
| 300 | |a 195 S. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
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| 650 | 4 | |a Metal oxide semiconductors, Complementary | |
| 700 | 1 | |a Zhao, Yi |e Sonstige |4 oth | |
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Datensatz im Suchindex
| _version_ | 1804138051945889792 |
|---|---|
| adam_text | Contents
Preface
Chapter
1
Introduction
Yi Zhao
Chapter
2
Gate Dielectrics
Terence B. Hook
Chapter
3
Hot Carrier Effect
Xinggong Wan
Chapter
4
Electromigration
Yi Zhao
Chapter
5
Negative Bias Temperature Instability (NBTI)
Xinggong Wan
Chapter
6
Plasma Process-Induced Damage
Terence B. Hook
Chapter
7
Reliability of High-k Gate Dielectrics
Yanli Pei
Index
vii
1
19
41
85
105
135
159
189
|
| adam_txt |
Contents
Preface
Chapter
1
Introduction
Yi Zhao
Chapter
2
Gate Dielectrics
Terence B. Hook
Chapter
3
Hot Carrier Effect
Xinggong Wan
Chapter
4
Electromigration
Yi Zhao
Chapter
5
Negative Bias Temperature Instability (NBTI)
Xinggong Wan
Chapter
6
Plasma Process-Induced Damage
Terence B. Hook
Chapter
7
Reliability of High-k Gate Dielectrics
Yanli Pei
Index
vii
1
19
41
85
105
135
159
189 |
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| illustrated | Not Illustrated |
| index_date | 2024-07-02T22:11:31Z |
| indexdate | 2024-07-09T21:22:03Z |
| institution | BVB |
| isbn | 9781604567137 |
| language | English |
| lccn | 2008018218 |
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| physical | 195 S. |
| publishDate | 2008 |
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| spelling | Wafer level reliability of advanced CMOS devices and processes Yi Zhao, ed. New York Nova Science Publ. 2008 195 S. txt rdacontent n rdamedia nc rdacarrier Metal oxide semiconductors, Complementary Zhao, Yi Sonstige oth Digitalisierung UB Bayreuth application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=016761718&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Wafer level reliability of advanced CMOS devices and processes Metal oxide semiconductors, Complementary |
| title | Wafer level reliability of advanced CMOS devices and processes |
| title_auth | Wafer level reliability of advanced CMOS devices and processes |
| title_exact_search | Wafer level reliability of advanced CMOS devices and processes |
| title_exact_search_txtP | Wafer level reliability of advanced CMOS devices and processes |
| title_full | Wafer level reliability of advanced CMOS devices and processes Yi Zhao, ed. |
| title_fullStr | Wafer level reliability of advanced CMOS devices and processes Yi Zhao, ed. |
| title_full_unstemmed | Wafer level reliability of advanced CMOS devices and processes Yi Zhao, ed. |
| title_short | Wafer level reliability of advanced CMOS devices and processes |
| title_sort | wafer level reliability of advanced cmos devices and processes |
| topic | Metal oxide semiconductors, Complementary |
| topic_facet | Metal oxide semiconductors, Complementary |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=016761718&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT zhaoyi waferlevelreliabilityofadvancedcmosdevicesandprocesses |