Evolution of thin film morphology: modeling and simulations
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Buch |
Sprache: | English |
Veröffentlicht: |
Berlin [u.a.]
Springer
2008
|
Schriftenreihe: | Springer series in materials science
108 |
Schlagworte: | |
Beschreibung: | Includes bibliographical references (p. [191]-200) and index |
Beschreibung: | xi, 204 p. ill. |
ISBN: | 9780387751085 0387751084 |
Internformat
MARC
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100 | 1 | |a Pelliccione, Matthew |e Verfasser |4 aut | |
245 | 1 | 0 | |a Evolution of thin film morphology |b modeling and simulations |c Matthew Pelliccione and Toh-Ming Lu |
264 | 1 | |a Berlin [u.a.] |b Springer |c 2008 | |
300 | |a xi, 204 p. |b ill. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 1 | |a Springer series in materials science |v 108 | |
500 | |a Includes bibliographical references (p. [191]-200) and index | ||
650 | 4 | |a Mathematisches Modell | |
650 | 4 | |a Thin film devices | |
650 | 4 | |a Thin films |x Microstructure | |
650 | 4 | |a Thin films |x Mathematical models | |
650 | 4 | |a Chemical vapor deposition | |
650 | 0 | 7 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |2 gnd |9 rswk-swf |
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689 | 0 | |5 DE-604 | |
700 | 1 | |a Lu, Toh-Ming |e Verfasser |4 aut | |
830 | 0 | |a Springer series in materials science |v 108 |w (DE-604)BV000683335 |9 108 | |
999 | |a oai:aleph.bib-bvb.de:BVB01-016743922 |
Datensatz im Suchindex
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author | Pelliccione, Matthew Lu, Toh-Ming |
author_facet | Pelliccione, Matthew Lu, Toh-Ming |
author_role | aut aut |
author_sort | Pelliccione, Matthew |
author_variant | m p mp t m l tml |
building | Verbundindex |
bvnumber | BV035075594 |
callnumber-first | T - Technology |
callnumber-label | TK7872 |
callnumber-raw | TK7872.T55 |
callnumber-search | TK7872.T55 |
callnumber-sort | TK 47872 T55 |
callnumber-subject | TK - Electrical and Nuclear Engineering |
classification_rvk | UP 7500 |
ctrlnum | (OCoLC)173718721 (DE-599)DNB98538252X |
dewey-full | 621.38152 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.38152 |
dewey-search | 621.38152 |
dewey-sort | 3621.38152 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
discipline_str_mv | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Book |
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id | DE-604.BV035075594 |
illustrated | Illustrated |
index_date | 2024-07-02T22:05:28Z |
indexdate | 2024-07-09T21:21:38Z |
institution | BVB |
isbn | 9780387751085 0387751084 |
language | English |
lccn | 2007940880 |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-016743922 |
oclc_num | 173718721 |
open_access_boolean | |
owner | DE-703 |
owner_facet | DE-703 |
physical | xi, 204 p. ill. |
publishDate | 2008 |
publishDateSearch | 2008 |
publishDateSort | 2008 |
publisher | Springer |
record_format | marc |
series | Springer series in materials science |
series2 | Springer series in materials science |
spelling | Pelliccione, Matthew Verfasser aut Evolution of thin film morphology modeling and simulations Matthew Pelliccione and Toh-Ming Lu Berlin [u.a.] Springer 2008 xi, 204 p. ill. txt rdacontent n rdamedia nc rdacarrier Springer series in materials science 108 Includes bibliographical references (p. [191]-200) and index Mathematisches Modell Thin film devices Thin films Microstructure Thin films Mathematical models Chemical vapor deposition Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf Morphologie (DE-588)4040289-7 gnd rswk-swf Morphologie (DE-588)4040289-7 s Dünnschichttechnik (DE-588)4136339-5 s DE-604 Lu, Toh-Ming Verfasser aut Springer series in materials science 108 (DE-604)BV000683335 108 |
spellingShingle | Pelliccione, Matthew Lu, Toh-Ming Evolution of thin film morphology modeling and simulations Springer series in materials science Mathematisches Modell Thin film devices Thin films Microstructure Thin films Mathematical models Chemical vapor deposition Dünnschichttechnik (DE-588)4136339-5 gnd Morphologie (DE-588)4040289-7 gnd |
subject_GND | (DE-588)4136339-5 (DE-588)4040289-7 |
title | Evolution of thin film morphology modeling and simulations |
title_auth | Evolution of thin film morphology modeling and simulations |
title_exact_search | Evolution of thin film morphology modeling and simulations |
title_exact_search_txtP | Evolution of thin film morphology modeling and simulations |
title_full | Evolution of thin film morphology modeling and simulations Matthew Pelliccione and Toh-Ming Lu |
title_fullStr | Evolution of thin film morphology modeling and simulations Matthew Pelliccione and Toh-Ming Lu |
title_full_unstemmed | Evolution of thin film morphology modeling and simulations Matthew Pelliccione and Toh-Ming Lu |
title_short | Evolution of thin film morphology |
title_sort | evolution of thin film morphology modeling and simulations |
title_sub | modeling and simulations |
topic | Mathematisches Modell Thin film devices Thin films Microstructure Thin films Mathematical models Chemical vapor deposition Dünnschichttechnik (DE-588)4136339-5 gnd Morphologie (DE-588)4040289-7 gnd |
topic_facet | Mathematisches Modell Thin film devices Thin films Microstructure Thin films Mathematical models Chemical vapor deposition Dünnschichttechnik Morphologie |
volume_link | (DE-604)BV000683335 |
work_keys_str_mv | AT pelliccionematthew evolutionofthinfilmmorphologymodelingandsimulations AT lutohming evolutionofthinfilmmorphologymodelingandsimulations |