Applied charged particle optics: B
Gespeichert in:
Format: | Buch |
---|---|
Sprache: | English |
Veröffentlicht: |
New York
Acad. Pr.
(1980)
|
Schriftenreihe: | Advances in electronics and electron physics Supplement
13 |
Schlagworte: | |
Beschreibung: | XVII, 392 S. Ill. |
ISBN: | 012014574X |
Internformat
MARC
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041 | 0 | |a eng | |
049 | |a DE-11 |a DE-12 | ||
245 | 1 | 0 | |a Applied charged particle optics |n B |c Hrsg. von Albert Septier* |
264 | 1 | |a New York |b Acad. Pr. |c (1980) | |
300 | |a XVII, 392 S. |b Ill. | ||
336 | |b txt |2 rdacontent | ||
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490 | 1 | |a Advances in electronics and electron physics : Supplement |v 13,B | |
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Datensatz im Suchindex
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id | DE-604.BV025956805 |
illustrated | Illustrated |
indexdate | 2024-07-09T22:15:32Z |
institution | BVB |
isbn | 012014574X |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-019200152 |
oclc_num | 174192748 |
open_access_boolean | |
owner | DE-11 DE-12 |
owner_facet | DE-11 DE-12 |
physical | XVII, 392 S. Ill. |
psigel | IFKMB1101 |
publishDate | 1980 |
publishDateSearch | 1980 |
publishDateSort | 1980 |
publisher | Acad. Pr. |
record_format | marc |
series | Advances in electronics and electron physics Supplement |
series2 | Advances in electronics and electron physics : Supplement Advances in electronics and electron physics. Supplement. |
spelling | Applied charged particle optics B Hrsg. von Albert Septier* New York Acad. Pr. (1980) XVII, 392 S. Ill. txt rdacontent n rdamedia nc rdacarrier Advances in electronics and electron physics : Supplement 13,B Advances in electronics and electron physics. Supplement. ... Elektronenspektroskopie (DE-588)4014332-6 gnd rswk-swf Teilchenoptik (DE-588)4184613-8 gnd rswk-swf Mikroanalyse (DE-588)4169804-6 gnd rswk-swf Elektronenstrahl (DE-588)4151894-9 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Massenspektrometrie (DE-588)4037882-2 gnd rswk-swf Ionenimplantation (DE-588)4027606-5 gnd rswk-swf Mikroanalyse (DE-588)4169804-6 s DE-604 Teilchenoptik (DE-588)4184613-8 s Ionenimplantation (DE-588)4027606-5 s Elektronenstrahl (DE-588)4151894-9 s Lithografie Halbleitertechnologie (DE-588)4191584-7 s Massenspektrometrie (DE-588)4037882-2 s Elektronenspektroskopie (DE-588)4014332-6 s Septier, Albert Sonstige oth (DE-604)BV002406202 B Advances in electronics and electron physics Supplement 13 (DE-604)BV001889378 13 |
spellingShingle | Applied charged particle optics Advances in electronics and electron physics Supplement Elektronenspektroskopie (DE-588)4014332-6 gnd Teilchenoptik (DE-588)4184613-8 gnd Mikroanalyse (DE-588)4169804-6 gnd Elektronenstrahl (DE-588)4151894-9 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Massenspektrometrie (DE-588)4037882-2 gnd Ionenimplantation (DE-588)4027606-5 gnd |
subject_GND | (DE-588)4014332-6 (DE-588)4184613-8 (DE-588)4169804-6 (DE-588)4151894-9 (DE-588)4191584-7 (DE-588)4037882-2 (DE-588)4027606-5 |
title | Applied charged particle optics |
title_auth | Applied charged particle optics |
title_exact_search | Applied charged particle optics |
title_full | Applied charged particle optics B Hrsg. von Albert Septier* |
title_fullStr | Applied charged particle optics B Hrsg. von Albert Septier* |
title_full_unstemmed | Applied charged particle optics B Hrsg. von Albert Septier* |
title_short | Applied charged particle optics |
title_sort | applied charged particle optics |
topic | Elektronenspektroskopie (DE-588)4014332-6 gnd Teilchenoptik (DE-588)4184613-8 gnd Mikroanalyse (DE-588)4169804-6 gnd Elektronenstrahl (DE-588)4151894-9 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Massenspektrometrie (DE-588)4037882-2 gnd Ionenimplantation (DE-588)4027606-5 gnd |
topic_facet | Elektronenspektroskopie Teilchenoptik Mikroanalyse Elektronenstrahl Lithografie Halbleitertechnologie Massenspektrometrie Ionenimplantation |
volume_link | (DE-604)BV002406202 (DE-604)BV001889378 |
work_keys_str_mv | AT septieralbert appliedchargedparticleopticsb |