Ellipsometry for industrial applications:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Abschlussarbeit Buch |
| Sprache: | English |
| Veröffentlicht: |
Wien [u.a.]
Springer
1988
|
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | XII, 99 S. Ill., graph. Darst. |
| ISBN: | 321182040X 038782040X |
Internformat
MARC
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| 100 | 1 | |a Riedling, Karl |d 1948- |e Verfasser |0 (DE-588)138847592 |4 aut | |
| 245 | 1 | 0 | |a Ellipsometry for industrial applications |c Karl Riedling |
| 264 | 1 | |a Wien [u.a.] |b Springer |c 1988 | |
| 300 | |a XII, 99 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 502 | |a Zugl.: Wien, Techn. Univ., Habil.-Schr., 1987 | ||
| 650 | 0 | 7 | |a Ellipsometrie |0 (DE-588)4152025-7 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 689 | 0 | 0 | |a Ellipsometrie |0 (DE-588)4152025-7 |D s |
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Datensatz im Suchindex
| _version_ | 1808588590550089728 |
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| adam_text |
CONTENTS
LIST OF ILLUSTRATIONS. IX
LIST OF TABLES.XIII
1. BASICS OF ELLIPSOMETRY. 1
1.1 PHYSICS. 1
1.2 INSTRUMENTATION. 7
1.2.1 NULL ELLIPSOMETRY. 7
1.2.2 PHOTOMETRIC ELLIPSOMETRY. 9
1.3 DEVELOPMENTS IN ELLIPSOMETRY.12
1.4 STATIC AND DYNAMIC ELLIPSOMETRY.14
2. ELLIPSOMETRY IN MICROELECTRONIC TECHNOLOGY.19
2.1 SEMICONDUCTOR SUBSTRATES AND FILMS.19
2.2 INSULATING FILMS.20
2.3 ETCHING PROCESSES.21
3. ERROR EFFECTS IN ELLIPSOMETRIC INVESTIGATIONS.23
3.1 RANDOM MEASUREMENT ERRORS.24
3.2 INSTRUMENTATION ERROR EFFECTS.30
3.2.1 NULL ELLIPSOMETERS.30
3.2.1.1 ERROR SOURCES.30
3.2.1.2 NUMERICAL ALIGNMENT.36
3.2.2 ROTATING ANALYZER ELLIPSOMETERS.43
3.2.2.1 INTRINSIC ACCURACY.45
3.2.2.2 ANGULAR ENCODER ORBITING.47
3.2.2.3 PERIODIC AND RANDOM NOISE.51
3.2.2.4 THE INFLUENCE OF THE ERROR EFFECTS DISCUSSED ON THE
ELLIPSOMETRIC ANGLES 'P AND A.57
3.2.2.5 DESIGN RULES FOR ROTATING ANALYZER ELLIPSOMETERS . 68
3.3 EFFECTS OF THE SAMPLE STRUCTURE.70
3.3.1 SUBSTRATE REFRACTIVE INDEX.70
3.3.2 INTERFACE LAYER BETWEEN SUBSTRATE AND FILM.72
BIBLIOGRAFISCHE INFORMATIONEN
HTTP://D-NB.INFO/871501120
CONTENTS
VIII
APPENDIX A: DESIGN CONSIDERATIONS FOR A HIGH-SPEED ROTATING
ANALYZER ELLIPSOMETER.81
A1 THE OPTICAL ASSEMBLY.82
A2 ELECTRONIC INTERFACE CIRCUITRY.85
A3 THE MICROCOMPUTER SYSTEM.86
A3.1 HARDWARE.86
A3.2 SOFTWARE.87
REFERENCES.91
SUBJECT INDEX.97
X
LIST OF ILLUSTRATIONS
FIG. 14: ANGLE OF INCIDENCE DETERMINATION: REAL AND IMAGI
NARY PARTS OF THE CALCULATED FILM THICKNESS DC AS
FUNCTIONS OF THE ANGLE OF INCIDENCE AC USED IN THE
CALCULATIONS.40
FIG. IS: ANGLE OF INCIDENCE DETERMINATION: CALCULATED ANGLE
OF INCIDENCE A,, AS A FUNCTION OF THE ACTUAL FILM
REFRACTIVE INDEX (NF)A.40
FIG. 16: ANGLE OF INCIDENCE DETERMINATION: FILM THICKNESS DC
COMPUTED AT THE CALCULATED ANGLE OF INCIDENCE
AC
AS
A FUNCTION OF THE ACTUAL FILM REFRACTIVE INDEX (NF)A. . 42
FIG. 17: INTRINSIC ACCURACY OF A ROTATING ANALYZER ELLIPSOME-
TER: RELATIVE ERRORS OF THE DC COMPONENT, AI0, AND
OF THE NORMALIZED AC AMPLITUDE, AE, AND STANDARD
DEVIATION OF THE PHASE ERROR A4 FOR E = 1 AS A
FUNCTION OF THE INITIAL MEAN INTENSITY I00 OR OF THE
RESOLUTION R OF THE DIGITIZED INTENSITY SIGNAL.46
FIG. 18: EFFECT OF ANGULAR ENCODER ORBITING: ERROR AE OF THE
NORMALIZED AC AMPLITUDE AS A FUNCTION OF THE PHASE
MODULATION DEPTH
S
FOR ONE (A) AND TWO (B) SIGNAL
PERIODS PROCESSED.49
FIG. 19: EFFECT OF ANGULAR ENCODER ORBITING: STANDARD DEVIA
TION OF THE PHASE ERROR A$ AS A FUNCTION OF THE
PHASE MODULATION DEPTH
6
FOR ONE (A) AND TWO (B)
SIGNAL PERIODS PROCESSED.50
FIG. 20: EFFECT OF ANGULAR ENCODER ORBITING: NORMALIZED AM
PLITUDE OF THE SECOND HARMONIC E2 AS A FUNCTION OF
THE PHASE MODULATION DEPTH
S
FOR ONE (A) AND TWO
(B) SIGNAL PERIODS PROCESSED.51
FIG. 21: VECTOR ADDITION OF PROBE BEAM INTENSITY (INDEX "O")
AND NOISE (INDEX "N") INDUCED SIGNALS.52
FIG. 22: EFFECT OF PERIODIC NOISE: DC (A) AND AC (B) AMPLI
TUDES OF THE DETECTED COMPONENT WITH THE FREQUENCY
2O
FOR A NOISE FREQUENCY 2XU AND FOR AN INTEGRATION
OVER ONE SIGNAL PERIOD.53
FIG. 23: EFFECT OF PERIODIC NOISE: DC (A) AND AC (B) AMPLI
TUDES OF THE DETECTED COMPONENT WITH THE FREQUENCY
2(0
FOR A NOISE FREQUENCY 2X O AND FOR AN INTEGRATION
OVER TWO SIGNAL PERIODS.54
FIG. 24: QUANTIZATION ERROR FOR SMALL SIGNALS.55
FIG. 25: EFFECT OF RANDOM NOISE: MEAN VALUE (A) AND STAN
DARD DEVIATION (B) OF THE ERROR OF THE DC COMPO
NENT FOR N = 1024 DATA SAMPLING POINTS.56
FIG. 26: EFFECT OF RANDOM NOISE ON THE NORMALIZED AMPLITUDE
ER OF THE DETECTED PERIODIC COMPONENT FOR N = 1024
DATA SAMPLING POINTS.
56
LIST OF ILLUSTRATIONS
FIG. 27: EFFECT OF RANDOM NOISE ON THE PERIODIC COMPONENT
WITH THE FREQUENCY 2W AS A FUNCTION OF THE NUMBER
N OF DATA POINTS PER PERIOD PROCESSED.57
FIG. 28: ROTATING ANALYZER ELLIPSOMETRY: ELLIPSOMETRIC ANGLES
(A) AND A (B) AS FUNCTIONS OF THE PHASE ANGLE $
FOR LINEARLY POLARIZED INCIDENT LIGHT; P = 45; PA
RAMETER: NORMALIZED AC AMPLITUDE E.59
FIG. 29: ROTATING ANALYZER ELLIPSOMETRY: ELLIPSOMETRIC ANGLES
AND A AS FUNCTIONS OF THE NORMALIZED AC AMPLI
TUDE E, AND OF THE PHASE ANGLE E FOR LINEARLY POLAR
IZED INCIDENT LIGHT AND A POLARIZER AZIMUTH P = 45". . 60
FIG. 30: ROTATING ANALYZER ELLIPSOMETRY: ELLIPSOMETRIC ANGLES
AND A AS FUNCTIONS OF THE NORMALIZED AC AMPLI
TUDE E, AND OF THE PHASE ANGLE I FOR LINEARLY POLAR
IZED INCIDENT LIGHT AND A POLARIZER AZIMUTH P = 15'. . 61
FIG. 31: ROTATING ANALYZER ELLIPSOMETRY: ELLIPSOMETRIC ANGLES
AND A AS FUNCTIONS OF THE NORMALIZED AC AMPLI
TUDE E, AND OF THE PHASE ANGLE T FOR CIRCULARLY
POLARIZED INCIDENT LIGHT.62
FIG. 32: ROTATING ANALYZER ELLIPSOMETRY: UNCERTAINTIES 5V
(A), (B) AND SA (C) OF THE ELLIPSOMETRIC ANGLES FOR AN
AMPLITUDE ERROR AE/E = 0.01 AS A FUNCTION OF THE
PHASE ANGLE $ FOR LINEARLY POLARIZED INCIDENT LIGHT
WITH P = 45' (A) AND P = 15' (B), OR FOR CIRCULARLY
POLARIZED INCIDENT LIGHT (A); PARAMETER: NORMALIZED
AC AMPLITUDE E. THE GRAPHS FOR A (C) APPLY TO ANY
POLARIZATION OF THE INCIDENT BEAM.63
FIG. 33: ROTATING ANALYZER ELLIPSOMETRY: UNCERTAINTIES I'P
(A), (B) AND SA (C) OF THE ELLIPSOMETRIC ANGLES FOR A
PHASE ERROR A3 = 1* AS A FUNCTION OF THE PHASE
ANGLE $ FOR LINEARLY POLARIZED INCIDENT LIGHT WITH P
= 45' (A) AND P = 15 (B), OR FOR CIRCULARLY POLAR
IZED INCIDENT LIGHT (A); PARAMETER: NORMALIZED AC
AMPLITUDE E. THE GRAPHS FOR SA (C) APPLY TO ANY
POLARIZATION OF THE INCIDENT BEAM.65
FIG. 34: ROTATING ANALYZER ELLIPSOMETRY: UNCERTAINTIES 5V
(A), (B) AND SA (C) OF THE ELLIPSOMETRIC ANGLES FOR AN
AMPLITUDE ERROR AE/E = 0.01 AM A PHASE ERROR A D =
L' AS A FUNCTION OF THE PHASE ANGLE L FOR LINEARLY
POLARIZED INCIDENT LIGHT WITH P = 45' (A) AND P =
15 (B), OR FOR CIRCULARLY POLARIZED INCIDENT LIGHT
(A); PARAMETER: NORMALIZED AC AMPLITUDE E. THE
GRAPHS FOR SA (C) APPLY TO ANY POLARIZATION OF THE
INCIDENT BEAM.
67
LIST OF ILLUSTRATIONS
FIG. 35: SUBSTRATE DATA: INFLUENCE OF THE SUBSTRATE REFRAC
TIVE INDEX (NS)C USED FOR THE CALCULATION OF FILM
THICKNESSES AND REFRACTIVE INDICES ON THE RELATIVE
ERROR X OF THE COMPUTED FILM THICKNESS (A), ON THE
CALCULATED FILM REFRACTIVE INDEX (NF)C (B), AND ON
THE ABSOLUTE ERROR OF THE THICKNESSES OF ULTRA-THIN
FILMS (C).71
FIG. 36: MODEL FOR THE ANALYSIS OF AN INHOMOGENEOUS INTER
FACE LAYER BETWEEN THE SUBSTRATE AND A DIELECTRIC
FILM.73
FIG. 37: VARIATION OF THE SIOJ VOLUME CONTENT X IN AN IN
HOMOGENEOUS INTERFACE LAYER BETWEEN A SILICON
SUBSTRATE AND AN ARBITRARY FILM FOR THE TWO MODELS
"A" AND "B".74
FIG. 38: VARIATIONS OF THE REAL AND IMAGINARY PARTS OF THE
REFRACTIVE INDEX OF AN INHOMOGENEOUS FILM OVER ITS
THICKNESS D| ACCORDING TO THE MODELS "A" AND "B".74
FIG. 39: INHOMOGENEOUS INTERFACE LAYER: DIFFERENCE BETWEEN
THE CALCULATED FILM THICKNESS DC AND THE ACTUAL DIS
TANCE Z BETWEEN THE SURFACES OF THE SUBSTRATE AND
OF THE DEPOSITED ULTRA-THIN SIOJ FILM FOR VARIOUS
THICKNESSES D; OF THE INHOMOGENEOUS INTERFACE LAYER
FOR THE TWO MODELS "A" (A) AND "B" (B).76
FIG. 40: INHOMOGENEOUS INTERFACE LAYER: ABSOLUTE ERRORS OF
THE CALCULATED THICKNESS DC (A) AND REFRACTIVE INDEX
(NF)C (B) OVER THE FIRST ELLIPSOMETRIC ORDER FOR THE
TWO MODELS "A" AND "B". CALCULATION BASED ON
FICTIVE SUBSTRATE REFRACTIVE INDICES.78
FIG. 41: INHOMOGENEOUS INTERFACE LAYER: ABSOLUTE ERRORS OF
THE CALCULATED THICKNESS DC (A) AND REFRACTIVE INDEX
(NF),, (B) OVER THE FIRST ELLIPSOMETRIC ORDER FOR THE
TWO MODELS "A" AND "B". CALCULATION BASED ON THE
ACTUAL SUBSTRATE REFRACTIVE INDEX.79
FIG. AL: OPTICAL ASSEMBLY OF A HIGH-SPEED ROTATING ANALYZER
ELLIPSOMETER.82
FIG. A2: DATA PROCESSING SYSTEM OF THE HIGH-SPEED ROTATING
ANALYZER ELLIPSOMETER.85 |
| any_adam_object | 1 |
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| author_GND | (DE-588)138847592 |
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| bvnumber | BV025862151 |
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| id | DE-604.BV025862151 |
| illustrated | Illustrated |
| indexdate | 2024-08-28T00:21:27Z |
| institution | BVB |
| isbn | 321182040X 038782040X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-019109807 |
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| physical | XII, 99 S. Ill., graph. Darst. |
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| publishDateSearch | 1988 |
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| publisher | Springer |
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| spelling | Riedling, Karl 1948- Verfasser (DE-588)138847592 aut Ellipsometry for industrial applications Karl Riedling Wien [u.a.] Springer 1988 XII, 99 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Zugl.: Wien, Techn. Univ., Habil.-Schr., 1987 Ellipsometrie (DE-588)4152025-7 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Ellipsometrie (DE-588)4152025-7 s DE-604 DNB Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=019109807&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Riedling, Karl 1948- Ellipsometry for industrial applications Ellipsometrie (DE-588)4152025-7 gnd |
| subject_GND | (DE-588)4152025-7 (DE-588)4113937-9 |
| title | Ellipsometry for industrial applications |
| title_auth | Ellipsometry for industrial applications |
| title_exact_search | Ellipsometry for industrial applications |
| title_full | Ellipsometry for industrial applications Karl Riedling |
| title_fullStr | Ellipsometry for industrial applications Karl Riedling |
| title_full_unstemmed | Ellipsometry for industrial applications Karl Riedling |
| title_short | Ellipsometry for industrial applications |
| title_sort | ellipsometry for industrial applications |
| topic | Ellipsometrie (DE-588)4152025-7 gnd |
| topic_facet | Ellipsometrie Hochschulschrift |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=019109807&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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