Optical microlithography III: technology for the next decade ; march 14-15, 1984, Santa Clara, Calif.
Gespeichert in:
| Weitere Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | Undetermined |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
1984
|
| Schriftenreihe: | Proceedings of the SPIE
470 |
| Schlagworte: | |
| Beschreibung: | VI, 269 S. Ill. |
| ISBN: | 0892525053 |
Internformat
MARC
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| 245 | 1 | 0 | |a Optical microlithography III |b technology for the next decade ; march 14-15, 1984, Santa Clara, Calif. |c Ed.: Harry L. Stover |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c 1984 | |
| 300 | |a VI, 269 S. |b Ill. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Proceedings of the SPIE |v 470 | |
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| 650 | 0 | 7 | |a Mikrosystemtechnik |0 (DE-588)4221617-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Toleranz |g Technik |0 (DE-588)4060356-8 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Optik |0 (DE-588)4043650-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Optik |0 (DE-588)4043650-0 |D s |
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| 700 | 1 | |a Stover, Harry L. |4 edt | |
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Datensatz im Suchindex
| _version_ | 1804142299671691264 |
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| author2 | Stover, Harry L. |
| author2_role | edt |
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| building | Verbundindex |
| bvnumber | BV025243192 |
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| id | DE-604.BV025243192 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T22:29:34Z |
| institution | BVB |
| isbn | 0892525053 |
| language | Undetermined |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-019881275 |
| oclc_num | 635603045 |
| open_access_boolean | |
| owner | DE-11 |
| owner_facet | DE-11 |
| physical | VI, 269 S. Ill. |
| publishDate | 1984 |
| publishDateSearch | 1984 |
| publishDateSort | 1984 |
| publisher | SPIE |
| record_format | marc |
| series2 | Proceedings of the SPIE |
| spelling | Optical microlithography III technology for the next decade ; march 14-15, 1984, Santa Clara, Calif. Ed.: Harry L. Stover Bellingham, Wash. SPIE 1984 VI, 269 S. Ill. txt rdacontent n rdamedia nc rdacarrier Proceedings of the SPIE 470 Metrologie (DE-588)4169749-2 gnd rswk-swf Mikrosystemtechnik (DE-588)4221617-5 gnd rswk-swf Toleranz Technik (DE-588)4060356-8 gnd rswk-swf Optik (DE-588)4043650-0 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Optik (DE-588)4043650-0 s DE-604 Mikrosystemtechnik (DE-588)4221617-5 s Lithografie Halbleitertechnologie (DE-588)4191584-7 s Metrologie (DE-588)4169749-2 s Toleranz Technik (DE-588)4060356-8 s Stover, Harry L. edt Society of Photo-Optical Instrumentation Engineers Proceedings of the SPIE 470 (DE-604)BV000010887 470 |
| spellingShingle | Optical microlithography III technology for the next decade ; march 14-15, 1984, Santa Clara, Calif. Metrologie (DE-588)4169749-2 gnd Mikrosystemtechnik (DE-588)4221617-5 gnd Toleranz Technik (DE-588)4060356-8 gnd Optik (DE-588)4043650-0 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| subject_GND | (DE-588)4169749-2 (DE-588)4221617-5 (DE-588)4060356-8 (DE-588)4043650-0 (DE-588)4191584-7 |
| title | Optical microlithography III technology for the next decade ; march 14-15, 1984, Santa Clara, Calif. |
| title_auth | Optical microlithography III technology for the next decade ; march 14-15, 1984, Santa Clara, Calif. |
| title_exact_search | Optical microlithography III technology for the next decade ; march 14-15, 1984, Santa Clara, Calif. |
| title_full | Optical microlithography III technology for the next decade ; march 14-15, 1984, Santa Clara, Calif. Ed.: Harry L. Stover |
| title_fullStr | Optical microlithography III technology for the next decade ; march 14-15, 1984, Santa Clara, Calif. Ed.: Harry L. Stover |
| title_full_unstemmed | Optical microlithography III technology for the next decade ; march 14-15, 1984, Santa Clara, Calif. Ed.: Harry L. Stover |
| title_short | Optical microlithography III |
| title_sort | optical microlithography iii technology for the next decade march 14 15 1984 santa clara calif |
| title_sub | technology for the next decade ; march 14-15, 1984, Santa Clara, Calif. |
| topic | Metrologie (DE-588)4169749-2 gnd Mikrosystemtechnik (DE-588)4221617-5 gnd Toleranz Technik (DE-588)4060356-8 gnd Optik (DE-588)4043650-0 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| topic_facet | Metrologie Mikrosystemtechnik Toleranz Technik Optik Lithografie Halbleitertechnologie |
| volume_link | (DE-604)BV000010887 |
| work_keys_str_mv | AT stoverharryl opticalmicrolithographyiiitechnologyforthenextdecademarch14151984santaclaracalif |