Optical microlithography IV: March 13-14, 1985, Santa Clara, Calif.
Gespeichert in:
Weitere Verfasser: | |
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Format: | Buch |
Sprache: | Undetermined |
Veröffentlicht: |
Bellingham, Wash.
SPIE
1985
|
Schriftenreihe: | Proceedings of the SPIE
538 |
Schlagworte: | |
Beschreibung: | VI, 260 S. Ill. |
Internformat
MARC
LEADER | 00000nam a2200000 cb4500 | ||
---|---|---|---|
001 | BV025243176 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | t | ||
008 | 100417s1985 a||| |||| 00||| und d | ||
020 | |z 0892525378 |9 0-89252-537-8 | ||
035 | |a (OCoLC)833239198 | ||
035 | |a (DE-599)BVBBV025243176 | ||
040 | |a DE-604 |b ger |e rakwb | ||
041 | |a und | ||
049 | |a DE-11 | ||
082 | 0 | |a 621.38174 | |
245 | 1 | 0 | |a Optical microlithography IV |b March 13-14, 1985, Santa Clara, Calif. |c Ed.: Harry L. Stover |
264 | 1 | |a Bellingham, Wash. |b SPIE |c 1985 | |
300 | |a VI, 260 S. |b Ill. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 1 | |a Proceedings of the SPIE |v 538 | |
650 | 0 | 7 | |a Messung |0 (DE-588)4038852-9 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Optik |0 (DE-588)4043650-0 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Bildverarbeitung |0 (DE-588)4006684-8 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Modellierung |0 (DE-588)4170297-9 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Holografie |0 (DE-588)4025643-1 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a Optik |0 (DE-588)4043650-0 |D s |
689 | 0 | |5 DE-604 | |
689 | 1 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
689 | 1 | |5 DE-604 | |
689 | 2 | 0 | |a Bildverarbeitung |0 (DE-588)4006684-8 |D s |
689 | 2 | |5 DE-604 | |
689 | 3 | 0 | |a Holografie |0 (DE-588)4025643-1 |D s |
689 | 3 | |5 DE-604 | |
689 | 4 | 0 | |a Messung |0 (DE-588)4038852-9 |D s |
689 | 4 | |5 DE-604 | |
689 | 5 | 0 | |a Modellierung |0 (DE-588)4170297-9 |D s |
689 | 5 | |5 DE-604 | |
700 | 1 | |a Stover, Harry L. |4 edt | |
810 | 2 | |a Society of Photo-Optical Instrumentation Engineers |t Proceedings of the SPIE |v 538 |w (DE-604)BV000010887 |9 538 | |
999 | |a oai:aleph.bib-bvb.de:BVB01-019881259 |
Datensatz im Suchindex
_version_ | 1804142299646525440 |
---|---|
any_adam_object | |
author2 | Stover, Harry L. |
author2_role | edt |
author2_variant | h l s hl hls |
author_facet | Stover, Harry L. |
building | Verbundindex |
bvnumber | BV025243176 |
ctrlnum | (OCoLC)833239198 (DE-599)BVBBV025243176 |
dewey-full | 621.38174 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.38174 |
dewey-search | 621.38174 |
dewey-sort | 3621.38174 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01763nam a2200505 cb4500</leader><controlfield tag="001">BV025243176</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">100417s1985 a||| |||| 00||| und d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="z">0892525378</subfield><subfield code="9">0-89252-537-8</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)833239198</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV025243176</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">und</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-11</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.38174</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Optical microlithography IV</subfield><subfield code="b">March 13-14, 1985, Santa Clara, Calif.</subfield><subfield code="c">Ed.: Harry L. Stover</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE</subfield><subfield code="c">1985</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">VI, 260 S.</subfield><subfield code="b">Ill.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Proceedings of the SPIE</subfield><subfield code="v">538</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Messung</subfield><subfield code="0">(DE-588)4038852-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Optik</subfield><subfield code="0">(DE-588)4043650-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Bildverarbeitung</subfield><subfield code="0">(DE-588)4006684-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Modellierung</subfield><subfield code="0">(DE-588)4170297-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Holografie</subfield><subfield code="0">(DE-588)4025643-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Optik</subfield><subfield code="0">(DE-588)4043650-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Bildverarbeitung</subfield><subfield code="0">(DE-588)4006684-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="3" ind2="0"><subfield code="a">Holografie</subfield><subfield code="0">(DE-588)4025643-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="4" ind2="0"><subfield code="a">Messung</subfield><subfield code="0">(DE-588)4038852-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="4" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="5" ind2="0"><subfield code="a">Modellierung</subfield><subfield code="0">(DE-588)4170297-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="5" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Stover, Harry L.</subfield><subfield code="4">edt</subfield></datafield><datafield tag="810" ind1="2" ind2=" "><subfield code="a">Society of Photo-Optical Instrumentation Engineers</subfield><subfield code="t">Proceedings of the SPIE</subfield><subfield code="v">538</subfield><subfield code="w">(DE-604)BV000010887</subfield><subfield code="9">538</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-019881259</subfield></datafield></record></collection> |
id | DE-604.BV025243176 |
illustrated | Illustrated |
indexdate | 2024-07-09T22:29:34Z |
institution | BVB |
language | Undetermined |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-019881259 |
oclc_num | 833239198 |
open_access_boolean | |
owner | DE-11 |
owner_facet | DE-11 |
physical | VI, 260 S. Ill. |
publishDate | 1985 |
publishDateSearch | 1985 |
publishDateSort | 1985 |
publisher | SPIE |
record_format | marc |
series2 | Proceedings of the SPIE |
spelling | Optical microlithography IV March 13-14, 1985, Santa Clara, Calif. Ed.: Harry L. Stover Bellingham, Wash. SPIE 1985 VI, 260 S. Ill. txt rdacontent n rdamedia nc rdacarrier Proceedings of the SPIE 538 Messung (DE-588)4038852-9 gnd rswk-swf Optik (DE-588)4043650-0 gnd rswk-swf Bildverarbeitung (DE-588)4006684-8 gnd rswk-swf Modellierung (DE-588)4170297-9 gnd rswk-swf Holografie (DE-588)4025643-1 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Optik (DE-588)4043650-0 s DE-604 Lithografie Halbleitertechnologie (DE-588)4191584-7 s Bildverarbeitung (DE-588)4006684-8 s Holografie (DE-588)4025643-1 s Messung (DE-588)4038852-9 s Modellierung (DE-588)4170297-9 s Stover, Harry L. edt Society of Photo-Optical Instrumentation Engineers Proceedings of the SPIE 538 (DE-604)BV000010887 538 |
spellingShingle | Optical microlithography IV March 13-14, 1985, Santa Clara, Calif. Messung (DE-588)4038852-9 gnd Optik (DE-588)4043650-0 gnd Bildverarbeitung (DE-588)4006684-8 gnd Modellierung (DE-588)4170297-9 gnd Holografie (DE-588)4025643-1 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
subject_GND | (DE-588)4038852-9 (DE-588)4043650-0 (DE-588)4006684-8 (DE-588)4170297-9 (DE-588)4025643-1 (DE-588)4191584-7 |
title | Optical microlithography IV March 13-14, 1985, Santa Clara, Calif. |
title_auth | Optical microlithography IV March 13-14, 1985, Santa Clara, Calif. |
title_exact_search | Optical microlithography IV March 13-14, 1985, Santa Clara, Calif. |
title_full | Optical microlithography IV March 13-14, 1985, Santa Clara, Calif. Ed.: Harry L. Stover |
title_fullStr | Optical microlithography IV March 13-14, 1985, Santa Clara, Calif. Ed.: Harry L. Stover |
title_full_unstemmed | Optical microlithography IV March 13-14, 1985, Santa Clara, Calif. Ed.: Harry L. Stover |
title_short | Optical microlithography IV |
title_sort | optical microlithography iv march 13 14 1985 santa clara calif |
title_sub | March 13-14, 1985, Santa Clara, Calif. |
topic | Messung (DE-588)4038852-9 gnd Optik (DE-588)4043650-0 gnd Bildverarbeitung (DE-588)4006684-8 gnd Modellierung (DE-588)4170297-9 gnd Holografie (DE-588)4025643-1 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
topic_facet | Messung Optik Bildverarbeitung Modellierung Holografie Lithografie Halbleitertechnologie |
volume_link | (DE-604)BV000010887 |
work_keys_str_mv | AT stoverharryl opticalmicrolithographyivmarch13141985santaclaracalif |