Tungsten and other refractory metals for VLSI applications II: Proceedings of the 1986 Workshop held November 12-14, 1986 Palo Alto, California, USA
Gespeichert in:
Weitere Verfasser: | |
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Format: | Buch |
Sprache: | Undetermined |
Veröffentlicht: |
Pittsburgh, Pa.
MRS
1987
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Schriftenreihe: | Materials Research Society Conference Proceedings
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Schlagworte: | |
Beschreibung: | XVII, 426 S. |
ISBN: | 0931837669 |
Internformat
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Datensatz im Suchindex
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any_adam_object | |
author2 | Broadbent, Eliot K. |
author2_role | edt |
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author_facet | Broadbent, Eliot K. |
building | Verbundindex |
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illustrated | Not Illustrated |
indexdate | 2024-07-09T22:29:32Z |
institution | BVB |
isbn | 0931837669 |
language | Undetermined |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-019880176 |
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physical | XVII, 426 S. |
publishDate | 1987 |
publishDateSearch | 1987 |
publishDateSort | 1987 |
publisher | MRS |
record_format | marc |
series2 | Materials Research Society Conference Proceedings |
spelling | Tungsten and other refractory metals for VLSI applications II Proceedings of the 1986 Workshop held November 12-14, 1986 Palo Alto, California, USA Ed.: Eliot K. Broadbent Pittsburgh, Pa. MRS 1987 XVII, 426 S. txt rdacontent n rdamedia nc rdacarrier Materials Research Society Conference Proceedings Ätzen (DE-588)4000648-7 gnd rswk-swf Ionenstrahl (DE-588)4162347-2 gnd rswk-swf Nichtleiter (DE-588)4123451-0 gnd rswk-swf VLSI (DE-588)4117388-0 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Konferenz (DE-588)4032055-8 gnd rswk-swf (DE-588)1071861417 Konferenzschrift gnd-content VLSI (DE-588)4117388-0 s DE-604 Konferenz (DE-588)4032055-8 s Nichtleiter (DE-588)4123451-0 s Ionenstrahl (DE-588)4162347-2 s Ätzen (DE-588)4000648-7 s Dünne Schicht (DE-588)4136925-7 s Sputtern (DE-588)4182614-0 s CVD-Verfahren (DE-588)4009846-1 s Broadbent, Eliot K. edt |
spellingShingle | Tungsten and other refractory metals for VLSI applications II Proceedings of the 1986 Workshop held November 12-14, 1986 Palo Alto, California, USA Ätzen (DE-588)4000648-7 gnd Ionenstrahl (DE-588)4162347-2 gnd Nichtleiter (DE-588)4123451-0 gnd VLSI (DE-588)4117388-0 gnd Dünne Schicht (DE-588)4136925-7 gnd CVD-Verfahren (DE-588)4009846-1 gnd Sputtern (DE-588)4182614-0 gnd Konferenz (DE-588)4032055-8 gnd |
subject_GND | (DE-588)4000648-7 (DE-588)4162347-2 (DE-588)4123451-0 (DE-588)4117388-0 (DE-588)4136925-7 (DE-588)4009846-1 (DE-588)4182614-0 (DE-588)4032055-8 (DE-588)1071861417 |
title | Tungsten and other refractory metals for VLSI applications II Proceedings of the 1986 Workshop held November 12-14, 1986 Palo Alto, California, USA |
title_auth | Tungsten and other refractory metals for VLSI applications II Proceedings of the 1986 Workshop held November 12-14, 1986 Palo Alto, California, USA |
title_exact_search | Tungsten and other refractory metals for VLSI applications II Proceedings of the 1986 Workshop held November 12-14, 1986 Palo Alto, California, USA |
title_full | Tungsten and other refractory metals for VLSI applications II Proceedings of the 1986 Workshop held November 12-14, 1986 Palo Alto, California, USA Ed.: Eliot K. Broadbent |
title_fullStr | Tungsten and other refractory metals for VLSI applications II Proceedings of the 1986 Workshop held November 12-14, 1986 Palo Alto, California, USA Ed.: Eliot K. Broadbent |
title_full_unstemmed | Tungsten and other refractory metals for VLSI applications II Proceedings of the 1986 Workshop held November 12-14, 1986 Palo Alto, California, USA Ed.: Eliot K. Broadbent |
title_short | Tungsten and other refractory metals for VLSI applications II |
title_sort | tungsten and other refractory metals for vlsi applications ii proceedings of the 1986 workshop held november 12 14 1986 palo alto california usa |
title_sub | Proceedings of the 1986 Workshop held November 12-14, 1986 Palo Alto, California, USA |
topic | Ätzen (DE-588)4000648-7 gnd Ionenstrahl (DE-588)4162347-2 gnd Nichtleiter (DE-588)4123451-0 gnd VLSI (DE-588)4117388-0 gnd Dünne Schicht (DE-588)4136925-7 gnd CVD-Verfahren (DE-588)4009846-1 gnd Sputtern (DE-588)4182614-0 gnd Konferenz (DE-588)4032055-8 gnd |
topic_facet | Ätzen Ionenstrahl Nichtleiter VLSI Dünne Schicht CVD-Verfahren Sputtern Konferenz Konferenzschrift |
work_keys_str_mv | AT broadbenteliotk tungstenandotherrefractorymetalsforvlsiapplicationsiiproceedingsofthe1986workshopheldnovember12141986paloaltocaliforniausa |