A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Abschlussarbeit Buch |
| Sprache: | English |
| Veröffentlicht: |
1980
|
| Schlagworte: | |
| Beschreibung: | Ausz. |
| Beschreibung: | 11 S. |
Internformat
MARC
| LEADER | 00000nam a22000002c 4500 | ||
|---|---|---|---|
| 001 | BV024956707 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | t | ||
| 008 | 100417s1980 m||| 00||| eng d | ||
| 035 | |a (OCoLC)917010395 | ||
| 035 | |a (DE-599)BVBBV024956707 | ||
| 040 | |a DE-604 |b ger |e rakwb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-11 | ||
| 100 | 1 | |a Norström, Hans |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films |c Hans Norström |
| 264 | 1 | |c 1980 | |
| 300 | |a 11 S. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Ausz. | ||
| 502 | |a Uppsala, Univ., Diss., 1980 | ||
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-019625605 | ||
Datensatz im Suchindex
| _version_ | 1804141977641418752 |
|---|---|
| any_adam_object | |
| author | Norström, Hans |
| author_facet | Norström, Hans |
| author_role | aut |
| author_sort | Norström, Hans |
| author_variant | h n hn |
| building | Verbundindex |
| bvnumber | BV024956707 |
| ctrlnum | (OCoLC)917010395 (DE-599)BVBBV024956707 |
| format | Thesis Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>00836nam a22002772c 4500</leader><controlfield tag="001">BV024956707</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">100417s1980 m||| 00||| eng d</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)917010395</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV024956707</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-11</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Norström, Hans</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films</subfield><subfield code="c">Hans Norström</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">1980</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">11 S.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Ausz.</subfield></datafield><datafield tag="502" ind1=" " ind2=" "><subfield code="a">Uppsala, Univ., Diss., 1980</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)4113937-9</subfield><subfield code="a">Hochschulschrift</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-019625605</subfield></datafield></record></collection> |
| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV024956707 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-09T22:24:27Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-019625605 |
| oclc_num | 917010395 |
| open_access_boolean | |
| owner | DE-11 |
| owner_facet | DE-11 |
| physical | 11 S. |
| publishDate | 1980 |
| publishDateSearch | 1980 |
| publishDateSort | 1980 |
| record_format | marc |
| spelling | Norström, Hans Verfasser aut A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films Hans Norström 1980 11 S. txt rdacontent n rdamedia nc rdacarrier Ausz. Uppsala, Univ., Diss., 1980 (DE-588)4113937-9 Hochschulschrift gnd-content |
| spellingShingle | Norström, Hans A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films |
| subject_GND | (DE-588)4113937-9 |
| title | A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films |
| title_auth | A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films |
| title_exact_search | A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films |
| title_full | A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films Hans Norström |
| title_fullStr | A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films Hans Norström |
| title_full_unstemmed | A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films Hans Norström |
| title_short | A study of the sputtering process, applied to schottky barrier formation and plasma deposition of amorphus carbon films |
| title_sort | a study of the sputtering process applied to schottky barrier formation and plasma deposition of amorphus carbon films |
| topic_facet | Hochschulschrift |
| work_keys_str_mv | AT norstromhans astudyofthesputteringprocessappliedtoschottkybarrierformationandplasmadepositionofamorphuscarbonfilms |