Plasma Etching in semiconductor fabrication:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | Undetermined |
| Veröffentlicht: |
Amsterdam <<[u.a.]>>
Elsevier
1985
|
| Schriftenreihe: | Plasma technology
1 |
| Schlagworte: | |
| Beschreibung: | X, 316 S. Ill., graph. Darst. |
| ISBN: | 0444424199 |
Internformat
MARC
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| 100 | 1 | |a Morgan, Russ A. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Plasma Etching in semiconductor fabrication |
| 264 | 1 | |a Amsterdam <<[u.a.]>> |b Elsevier |c 1985 | |
| 300 | |a X, 316 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Plasma technology |v 1 | |
| 650 | 0 | 7 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Bearbeitung |0 (DE-588)4120981-3 |2 gnd |9 rswk-swf |
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| 650 | 0 | 7 | |a Halbleiterindustrie |0 (DE-588)4158803-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Halbleiter |0 (DE-588)4022993-2 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Plasmastrahl |0 (DE-588)4206366-8 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |D s |
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| 689 | 1 | 0 | |a Halbleiterindustrie |0 (DE-588)4158803-4 |D s |
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Datensatz im Suchindex
| _version_ | 1804140095833374720 |
|---|---|
| any_adam_object | |
| author | Morgan, Russ A. |
| author_facet | Morgan, Russ A. |
| author_role | aut |
| author_sort | Morgan, Russ A. |
| author_variant | r a m ra ram |
| building | Verbundindex |
| bvnumber | BV024683159 |
| classification_rvk | ZN 4150 |
| ctrlnum | (OCoLC)916422117 (DE-599)BVBBV024683159 |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV024683159 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T21:54:32Z |
| institution | BVB |
| isbn | 0444424199 |
| language | Undetermined |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-018094079 |
| oclc_num | 916422117 |
| open_access_boolean | |
| owner | DE-83 |
| owner_facet | DE-83 |
| physical | X, 316 S. Ill., graph. Darst. |
| psigel | TUB-nve |
| publishDate | 1985 |
| publishDateSearch | 1985 |
| publishDateSort | 1985 |
| publisher | Elsevier |
| record_format | marc |
| series2 | Plasma technology |
| spelling | Morgan, Russ A. Verfasser aut Plasma Etching in semiconductor fabrication Amsterdam <<[u.a.]>> Elsevier 1985 X, 316 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Plasma technology 1 Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf Bearbeitung (DE-588)4120981-3 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Halbleiterindustrie (DE-588)4158803-4 gnd rswk-swf Halbleiter (DE-588)4022993-2 gnd rswk-swf Plasmastrahl (DE-588)4206366-8 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 s Plasmaätzen (DE-588)4174821-9 s DE-604 Halbleiterindustrie (DE-588)4158803-4 s Plasmastrahl (DE-588)4206366-8 s Halbleiter (DE-588)4022993-2 s Bearbeitung (DE-588)4120981-3 s |
| spellingShingle | Morgan, Russ A. Plasma Etching in semiconductor fabrication Halbleitertechnologie (DE-588)4158814-9 gnd Bearbeitung (DE-588)4120981-3 gnd Plasmaätzen (DE-588)4174821-9 gnd Halbleiterindustrie (DE-588)4158803-4 gnd Halbleiter (DE-588)4022993-2 gnd Plasmastrahl (DE-588)4206366-8 gnd |
| subject_GND | (DE-588)4158814-9 (DE-588)4120981-3 (DE-588)4174821-9 (DE-588)4158803-4 (DE-588)4022993-2 (DE-588)4206366-8 |
| title | Plasma Etching in semiconductor fabrication |
| title_auth | Plasma Etching in semiconductor fabrication |
| title_exact_search | Plasma Etching in semiconductor fabrication |
| title_full | Plasma Etching in semiconductor fabrication |
| title_fullStr | Plasma Etching in semiconductor fabrication |
| title_full_unstemmed | Plasma Etching in semiconductor fabrication |
| title_short | Plasma Etching in semiconductor fabrication |
| title_sort | plasma etching in semiconductor fabrication |
| topic | Halbleitertechnologie (DE-588)4158814-9 gnd Bearbeitung (DE-588)4120981-3 gnd Plasmaätzen (DE-588)4174821-9 gnd Halbleiterindustrie (DE-588)4158803-4 gnd Halbleiter (DE-588)4022993-2 gnd Plasmastrahl (DE-588)4206366-8 gnd |
| topic_facet | Halbleitertechnologie Bearbeitung Plasmaätzen Halbleiterindustrie Halbleiter Plasmastrahl |
| work_keys_str_mv | AT morganrussa plasmaetchinginsemiconductorfabrication |