Semiconductor lithography: principles, practices, and materials
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | Undetermined |
| Veröffentlicht: |
New York, NY <<[u.a.]>>
Plenum Pr.
1988
|
| Schriftenreihe: | Microdevices
|
| Schlagworte: | |
| Beschreibung: | XX, 931 S. Ill., zahlr. graph. Darst. |
| ISBN: | 0306421852 |
Internformat
MARC
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| 264 | 1 | |a New York, NY <<[u.a.]>> |b Plenum Pr. |c 1988 | |
| 300 | |a XX, 931 S. |b Ill., zahlr. graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
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| 490 | 0 | |a Microdevices | |
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| 689 | 0 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 0 | 1 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
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| 999 | |a oai:aleph.bib-bvb.de:BVB01-018045101 | ||
Datensatz im Suchindex
| _version_ | 1804140047672279040 |
|---|---|
| any_adam_object | |
| author | Moreau, Wayne M. |
| author_facet | Moreau, Wayne M. |
| author_role | aut |
| author_sort | Moreau, Wayne M. |
| author_variant | w m m wm wmm |
| building | Verbundindex |
| bvnumber | BV024632761 |
| classification_rvk | UP 3100 ZN 4170 |
| ctrlnum | (OCoLC)246864648 (DE-599)BVBBV024632761 |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV024632761 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T21:53:46Z |
| institution | BVB |
| isbn | 0306421852 |
| language | Undetermined |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-018045101 |
| oclc_num | 246864648 |
| open_access_boolean | |
| owner | DE-83 |
| owner_facet | DE-83 |
| physical | XX, 931 S. Ill., zahlr. graph. Darst. |
| publishDate | 1988 |
| publishDateSearch | 1988 |
| publishDateSort | 1988 |
| publisher | Plenum Pr. |
| record_format | marc |
| series2 | Microdevices |
| spelling | Moreau, Wayne M. Verfasser aut Semiconductor lithography principles, practices, and materials New York, NY <<[u.a.]>> Plenum Pr. 1988 XX, 931 S. Ill., zahlr. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Microdevices Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s Integrierte Schaltung (DE-588)4027242-4 s DE-604 |
| spellingShingle | Moreau, Wayne M. Semiconductor lithography principles, practices, and materials Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Integrierte Schaltung (DE-588)4027242-4 gnd |
| subject_GND | (DE-588)4174516-4 (DE-588)4027242-4 |
| title | Semiconductor lithography principles, practices, and materials |
| title_auth | Semiconductor lithography principles, practices, and materials |
| title_exact_search | Semiconductor lithography principles, practices, and materials |
| title_full | Semiconductor lithography principles, practices, and materials |
| title_fullStr | Semiconductor lithography principles, practices, and materials |
| title_full_unstemmed | Semiconductor lithography principles, practices, and materials |
| title_short | Semiconductor lithography |
| title_sort | semiconductor lithography principles practices and materials |
| title_sub | principles, practices, and materials |
| topic | Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Integrierte Schaltung (DE-588)4027242-4 gnd |
| topic_facet | Fotolithografie Halbleitertechnologie Integrierte Schaltung |
| work_keys_str_mv | AT moreauwaynem semiconductorlithographyprinciplespracticesandmaterials |