Models for flow systems and chemical reactors:
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Buch |
Sprache: | Undetermined |
Veröffentlicht: |
New York
Dekker
1975
|
Ausgabe: | 2. print |
Schriftenreihe: | Chemical processing and engineering
3 |
Schlagworte: | |
Beschreibung: | Fotokopie. - Ann Arbor, Mich. : UMI, 1990 |
Beschreibung: | IX, 570 S. graph. Darst. |
ISBN: | 0824763467 |
Internformat
MARC
LEADER | 00000nam a2200000 cb4500 | ||
---|---|---|---|
001 | BV024598601 | ||
003 | DE-604 | ||
005 | 20090910 | ||
007 | t | ||
008 | 090924s1975 d||| |||| 00||| und d | ||
020 | |a 0824763467 |9 0-8247-6346-7 | ||
035 | |a (OCoLC)636215930 | ||
035 | |a (DE-599)BVBBV024598601 | ||
040 | |a DE-604 |b ger |e rakwb | ||
041 | |a und | ||
049 | |a DE-83 | ||
100 | 1 | |a Wen, Chin-Yung |e Verfasser |4 aut | |
245 | 1 | 0 | |a Models for flow systems and chemical reactors |c C. Y. Wen ; L. T. Fan |
250 | |a 2. print | ||
264 | 1 | |a New York |b Dekker |c 1975 | |
300 | |a IX, 570 S. |b graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 0 | |a Chemical processing and engineering |v 3 | |
500 | |a Fotokopie. - Ann Arbor, Mich. : UMI, 1990 | ||
650 | 0 | 7 | |a Chemischer Reaktor |0 (DE-588)4121085-2 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a Chemischer Reaktor |0 (DE-588)4121085-2 |D s |
689 | 0 | |8 1\p |5 DE-604 | |
700 | 1 | |a Fan, Liang-tseng |e Verfasser |4 aut | |
940 | 1 | |q TUB-nve | |
999 | |a oai:aleph.bib-bvb.de:BVB01-018571906 | ||
883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk |
Datensatz im Suchindex
_version_ | 1804140612739399680 |
---|---|
any_adam_object | |
author | Wen, Chin-Yung Fan, Liang-tseng |
author_facet | Wen, Chin-Yung Fan, Liang-tseng |
author_role | aut aut |
author_sort | Wen, Chin-Yung |
author_variant | c y w cyw l t f ltf |
building | Verbundindex |
bvnumber | BV024598601 |
ctrlnum | (OCoLC)636215930 (DE-599)BVBBV024598601 |
edition | 2. print |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01164nam a2200361 cb4500</leader><controlfield tag="001">BV024598601</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20090910 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">090924s1975 d||| |||| 00||| und d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0824763467</subfield><subfield code="9">0-8247-6346-7</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)636215930</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV024598601</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">und</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-83</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Wen, Chin-Yung</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Models for flow systems and chemical reactors</subfield><subfield code="c">C. Y. Wen ; L. T. Fan</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">2. print</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York</subfield><subfield code="b">Dekker</subfield><subfield code="c">1975</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">IX, 570 S.</subfield><subfield code="b">graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Chemical processing and engineering</subfield><subfield code="v">3</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Fotokopie. - Ann Arbor, Mich. : UMI, 1990</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Chemischer Reaktor</subfield><subfield code="0">(DE-588)4121085-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Chemischer Reaktor</subfield><subfield code="0">(DE-588)4121085-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Fan, Liang-tseng</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">TUB-nve</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-018571906</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield></record></collection> |
id | DE-604.BV024598601 |
illustrated | Illustrated |
indexdate | 2024-07-09T22:02:45Z |
institution | BVB |
isbn | 0824763467 |
language | Undetermined |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-018571906 |
oclc_num | 636215930 |
open_access_boolean | |
owner | DE-83 |
owner_facet | DE-83 |
physical | IX, 570 S. graph. Darst. |
psigel | TUB-nve |
publishDate | 1975 |
publishDateSearch | 1975 |
publishDateSort | 1975 |
publisher | Dekker |
record_format | marc |
series2 | Chemical processing and engineering |
spelling | Wen, Chin-Yung Verfasser aut Models for flow systems and chemical reactors C. Y. Wen ; L. T. Fan 2. print New York Dekker 1975 IX, 570 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Chemical processing and engineering 3 Fotokopie. - Ann Arbor, Mich. : UMI, 1990 Chemischer Reaktor (DE-588)4121085-2 gnd rswk-swf Chemischer Reaktor (DE-588)4121085-2 s 1\p DE-604 Fan, Liang-tseng Verfasser aut 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
spellingShingle | Wen, Chin-Yung Fan, Liang-tseng Models for flow systems and chemical reactors Chemischer Reaktor (DE-588)4121085-2 gnd |
subject_GND | (DE-588)4121085-2 |
title | Models for flow systems and chemical reactors |
title_auth | Models for flow systems and chemical reactors |
title_exact_search | Models for flow systems and chemical reactors |
title_full | Models for flow systems and chemical reactors C. Y. Wen ; L. T. Fan |
title_fullStr | Models for flow systems and chemical reactors C. Y. Wen ; L. T. Fan |
title_full_unstemmed | Models for flow systems and chemical reactors C. Y. Wen ; L. T. Fan |
title_short | Models for flow systems and chemical reactors |
title_sort | models for flow systems and chemical reactors |
topic | Chemischer Reaktor (DE-588)4121085-2 gnd |
topic_facet | Chemischer Reaktor |
work_keys_str_mv | AT wenchinyung modelsforflowsystemsandchemicalreactors AT fanliangtseng modelsforflowsystemsandchemicalreactors |