Pulsed and pulsed bias sputtering: principles and applications
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Boston <<[u.a.]>>
Kluwer
2003
|
| ISBN: | 140207543X |
Internformat
MARC
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| 041 | 0 | |a eng | |
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| 082 | 0 | |a 621.38152 | |
| 100 | 1 | |a Barnat, Edward V. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Pulsed and pulsed bias sputtering |b principles and applications |c by Edward V. Barnat ; Toh-Ming Lu |
| 264 | 1 | |a Boston <<[u.a.]>> |b Kluwer |c 2003 | |
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| 700 | 1 | |a Lu, Toh-Ming |e Verfasser |4 aut | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-018481053 | ||
Datensatz im Suchindex
| _version_ | 1804140504579833856 |
|---|---|
| any_adam_object | |
| author | Barnat, Edward V. Lu, Toh-Ming |
| author_facet | Barnat, Edward V. Lu, Toh-Ming |
| author_role | aut aut |
| author_sort | Barnat, Edward V. |
| author_variant | e v b ev evb t m l tml |
| building | Verbundindex |
| bvnumber | BV024506563 |
| ctrlnum | (OCoLC)248893676 (DE-599)BVBBV024506563 |
| dewey-full | 621.38152 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.38152 |
| dewey-search | 621.38152 |
| dewey-sort | 3621.38152 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV024506563 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-09T22:01:02Z |
| institution | BVB |
| isbn | 140207543X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-018481053 |
| oclc_num | 248893676 |
| open_access_boolean | |
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| owner_facet | DE-83 |
| publishDate | 2003 |
| publishDateSearch | 2003 |
| publishDateSort | 2003 |
| publisher | Kluwer |
| record_format | marc |
| spelling | Barnat, Edward V. Verfasser aut Pulsed and pulsed bias sputtering principles and applications by Edward V. Barnat ; Toh-Ming Lu Boston <<[u.a.]>> Kluwer 2003 txt rdacontent n rdamedia nc rdacarrier Lu, Toh-Ming Verfasser aut |
| spellingShingle | Barnat, Edward V. Lu, Toh-Ming Pulsed and pulsed bias sputtering principles and applications |
| title | Pulsed and pulsed bias sputtering principles and applications |
| title_auth | Pulsed and pulsed bias sputtering principles and applications |
| title_exact_search | Pulsed and pulsed bias sputtering principles and applications |
| title_full | Pulsed and pulsed bias sputtering principles and applications by Edward V. Barnat ; Toh-Ming Lu |
| title_fullStr | Pulsed and pulsed bias sputtering principles and applications by Edward V. Barnat ; Toh-Ming Lu |
| title_full_unstemmed | Pulsed and pulsed bias sputtering principles and applications by Edward V. Barnat ; Toh-Ming Lu |
| title_short | Pulsed and pulsed bias sputtering |
| title_sort | pulsed and pulsed bias sputtering principles and applications |
| title_sub | principles and applications |
| work_keys_str_mv | AT barnatedwardv pulsedandpulsedbiassputteringprinciplesandapplications AT lutohming pulsedandpulsedbiassputteringprinciplesandapplications |