Current and future silicon based thin film structures for electronic applications: epitaxy and crystalline deposition on amorphous substrates
Gespeichert in:
| 1. Verfasser: | |
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| Format: | Abschlussarbeit Buch |
| Sprache: | English |
| Veröffentlicht: |
2001
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| Schlagworte: | |
| Beschreibung: | 307 S. Ill., graph. Darst. |
Internformat
MARC
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| 264 | 1 | |c 2001 | |
| 300 | |a 307 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
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| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
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Datensatz im Suchindex
| _version_ | 1804140498926960640 |
|---|---|
| any_adam_object | |
| author | Christiansen, Silke H. |
| author_facet | Christiansen, Silke H. |
| author_role | aut |
| author_sort | Christiansen, Silke H. |
| author_variant | s h c sh shc |
| building | Verbundindex |
| bvnumber | BV024502278 |
| classification_rvk | UP 7570 ZN 3460 |
| ctrlnum | (OCoLC)916628855 (DE-599)BVBBV024502278 |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Thesis Book |
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| illustrated | Illustrated |
| indexdate | 2024-07-09T22:00:56Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-018476966 |
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| physical | 307 S. Ill., graph. Darst. |
| publishDate | 2001 |
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| spelling | Christiansen, Silke H. Verfasser aut Current and future silicon based thin film structures for electronic applications epitaxy and crystalline deposition on amorphous substrates vorgelegt von Silke H. Christiansen 2001 307 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Erlangen-Nürnberg, Univ., Diss. Epitaxieschicht (DE-588)4152546-2 gnd rswk-swf Silicium (DE-588)4077445-4 gnd rswk-swf Germanium (DE-588)4135644-5 gnd rswk-swf Laserinduziertes Verfahren (DE-588)4476754-7 gnd rswk-swf Heterostruktur (DE-588)4123378-5 gnd rswk-swf Kristallisation (DE-588)4033215-9 gnd rswk-swf Gitterbaufehler (DE-588)4125030-8 gnd rswk-swf Amorpher Zustand (DE-588)4306087-0 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Silicium (DE-588)4077445-4 s Germanium (DE-588)4135644-5 s Heterostruktur (DE-588)4123378-5 s Epitaxieschicht (DE-588)4152546-2 s Gitterbaufehler (DE-588)4125030-8 s DE-604 Amorpher Zustand (DE-588)4306087-0 s Kristallisation (DE-588)4033215-9 s Laserinduziertes Verfahren (DE-588)4476754-7 s |
| spellingShingle | Christiansen, Silke H. Current and future silicon based thin film structures for electronic applications epitaxy and crystalline deposition on amorphous substrates Epitaxieschicht (DE-588)4152546-2 gnd Silicium (DE-588)4077445-4 gnd Germanium (DE-588)4135644-5 gnd Laserinduziertes Verfahren (DE-588)4476754-7 gnd Heterostruktur (DE-588)4123378-5 gnd Kristallisation (DE-588)4033215-9 gnd Gitterbaufehler (DE-588)4125030-8 gnd Amorpher Zustand (DE-588)4306087-0 gnd |
| subject_GND | (DE-588)4152546-2 (DE-588)4077445-4 (DE-588)4135644-5 (DE-588)4476754-7 (DE-588)4123378-5 (DE-588)4033215-9 (DE-588)4125030-8 (DE-588)4306087-0 (DE-588)4113937-9 |
| title | Current and future silicon based thin film structures for electronic applications epitaxy and crystalline deposition on amorphous substrates |
| title_auth | Current and future silicon based thin film structures for electronic applications epitaxy and crystalline deposition on amorphous substrates |
| title_exact_search | Current and future silicon based thin film structures for electronic applications epitaxy and crystalline deposition on amorphous substrates |
| title_full | Current and future silicon based thin film structures for electronic applications epitaxy and crystalline deposition on amorphous substrates vorgelegt von Silke H. Christiansen |
| title_fullStr | Current and future silicon based thin film structures for electronic applications epitaxy and crystalline deposition on amorphous substrates vorgelegt von Silke H. Christiansen |
| title_full_unstemmed | Current and future silicon based thin film structures for electronic applications epitaxy and crystalline deposition on amorphous substrates vorgelegt von Silke H. Christiansen |
| title_short | Current and future silicon based thin film structures for electronic applications |
| title_sort | current and future silicon based thin film structures for electronic applications epitaxy and crystalline deposition on amorphous substrates |
| title_sub | epitaxy and crystalline deposition on amorphous substrates |
| topic | Epitaxieschicht (DE-588)4152546-2 gnd Silicium (DE-588)4077445-4 gnd Germanium (DE-588)4135644-5 gnd Laserinduziertes Verfahren (DE-588)4476754-7 gnd Heterostruktur (DE-588)4123378-5 gnd Kristallisation (DE-588)4033215-9 gnd Gitterbaufehler (DE-588)4125030-8 gnd Amorpher Zustand (DE-588)4306087-0 gnd |
| topic_facet | Epitaxieschicht Silicium Germanium Laserinduziertes Verfahren Heterostruktur Kristallisation Gitterbaufehler Amorpher Zustand Hochschulschrift |
| work_keys_str_mv | AT christiansensilkeh currentandfuturesiliconbasedthinfilmstructuresforelectronicapplicationsepitaxyandcrystallinedepositiononamorphoussubstrates |