Plasma processing for VLSI:
Gespeichert in:
| Weitere Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | Undetermined |
| Veröffentlicht: |
Orlando, Fla. <<[u.a.]>>
Acad. Pr.
1984
|
| Schriftenreihe: | VLSI electronics, microstructure science
8 |
| Schlagworte: | |
| Beschreibung: | XIV, 527 S. Ill., graph. Darst. |
| ISBN: | 0122341082 |
Internformat
MARC
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| 040 | |a DE-604 |b ger |e rakwb | ||
| 041 | |a und | ||
| 049 | |a DE-83 | ||
| 245 | 1 | 0 | |a Plasma processing for VLSI |c ed. by Norman G. Einspruch ... |
| 264 | 1 | |a Orlando, Fla. <<[u.a.]>> |b Acad. Pr. |c 1984 | |
| 300 | |a XIV, 527 S. |b Ill., graph. Darst. | ||
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Datensatz im Suchindex
| _version_ | 1804140326636486656 |
|---|---|
| any_adam_object | |
| author2 | Einspruch, Norman G. |
| author2_role | edt |
| author2_variant | n g e ng nge |
| author_facet | Einspruch, Norman G. |
| building | Verbundindex |
| bvnumber | BV024370874 |
| ctrlnum | (OCoLC)635804111 (DE-599)BVBBV024370874 |
| format | Book |
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| id | DE-604.BV024370874 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T21:58:12Z |
| institution | BVB |
| isbn | 0122341082 |
| language | Undetermined |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-018351439 |
| oclc_num | 635804111 |
| open_access_boolean | |
| owner | DE-83 |
| owner_facet | DE-83 |
| physical | XIV, 527 S. Ill., graph. Darst. |
| publishDate | 1984 |
| publishDateSearch | 1984 |
| publishDateSort | 1984 |
| publisher | Acad. Pr. |
| record_format | marc |
| series | VLSI electronics, microstructure science |
| series2 | VLSI electronics, microstructure science |
| spelling | Plasma processing for VLSI ed. by Norman G. Einspruch ... Orlando, Fla. <<[u.a.]>> Acad. Pr. 1984 XIV, 527 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier VLSI electronics, microstructure science 8 Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf VLSI (DE-588)4117388-0 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Plasmastrahlbearbeitung (DE-588)4136199-4 gnd rswk-swf Sputtern (DE-588)4182614-0 s DE-604 Plasmatechnik (DE-588)4140353-8 s Plasmastrahlbearbeitung (DE-588)4136199-4 s Plasmaätzen (DE-588)4174821-9 s VLSI (DE-588)4117388-0 s Lithografie Halbleitertechnologie (DE-588)4191584-7 s Mikroelektronik (DE-588)4039207-7 s Einspruch, Norman G. edt VLSI electronics, microstructure science 8 (DE-604)BV009495884 8 |
| spellingShingle | Plasma processing for VLSI VLSI electronics, microstructure science Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd VLSI (DE-588)4117388-0 gnd Mikroelektronik (DE-588)4039207-7 gnd Plasmatechnik (DE-588)4140353-8 gnd Sputtern (DE-588)4182614-0 gnd Plasmaätzen (DE-588)4174821-9 gnd Plasmastrahlbearbeitung (DE-588)4136199-4 gnd |
| subject_GND | (DE-588)4191584-7 (DE-588)4117388-0 (DE-588)4039207-7 (DE-588)4140353-8 (DE-588)4182614-0 (DE-588)4174821-9 (DE-588)4136199-4 |
| title | Plasma processing for VLSI |
| title_auth | Plasma processing for VLSI |
| title_exact_search | Plasma processing for VLSI |
| title_full | Plasma processing for VLSI ed. by Norman G. Einspruch ... |
| title_fullStr | Plasma processing for VLSI ed. by Norman G. Einspruch ... |
| title_full_unstemmed | Plasma processing for VLSI ed. by Norman G. Einspruch ... |
| title_short | Plasma processing for VLSI |
| title_sort | plasma processing for vlsi |
| topic | Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd VLSI (DE-588)4117388-0 gnd Mikroelektronik (DE-588)4039207-7 gnd Plasmatechnik (DE-588)4140353-8 gnd Sputtern (DE-588)4182614-0 gnd Plasmaätzen (DE-588)4174821-9 gnd Plasmastrahlbearbeitung (DE-588)4136199-4 gnd |
| topic_facet | Lithografie Halbleitertechnologie VLSI Mikroelektronik Plasmatechnik Sputtern Plasmaätzen Plasmastrahlbearbeitung |
| volume_link | (DE-604)BV009495884 |
| work_keys_str_mv | AT einspruchnormang plasmaprocessingforvlsi |