Der elektrische Feldgradient in Silicium, Germanium und Graphit nach 19F-Rückstossimplantation [F-Rückstossimplantation]:
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Bibliographic Details
Main Author: Röseler, Burkhard (Author)
Format: Thesis Book
Language:Undetermined
Published: 1988
Subjects:
Physical Description:107 S. graph. Darst.

There is no print copy available.

Interlibrary loan Place Request Caution: Not in THWS collection!