64- to 256-megabit reticle generation: technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California
Saved in:
| Other Authors: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Wash.
SPIE Optical Engineering Press
c 1994
|
| Series: | Critical reviews of optical science and technology
51 |
| Subjects: | |
| Physical Description: | VII, 273 S. graph. Darst. |
| ISBN: | 0819413585 |
Staff View
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| id | DE-604.BV023825401 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T21:37:30Z |
| institution | BVB |
| isbn | 0819413585 |
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| publisher | SPIE Optical Engineering Press |
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| series | Critical reviews of optical science and technology |
| series2 | Critical reviews of optical science and technology |
| spelling | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California Gregory K. Hearn, ed. Bellingham, Wash. SPIE Optical Engineering Press c 1994 VII, 273 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Critical reviews of optical science and technology 51 Maskentechnik (DE-588)4125845-9 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1993 Santa Clara Calif. gnd-content Lithografie Halbleitertechnologie (DE-588)4191584-7 s Maskentechnik (DE-588)4125845-9 s DE-604 Hearn, Gregory K. edt Critical reviews of optical science and technology 51 (DE-604)BV005490642 51 |
| spellingShingle | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California Critical reviews of optical science and technology Maskentechnik (DE-588)4125845-9 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| subject_GND | (DE-588)4125845-9 (DE-588)4191584-7 (DE-588)1071861417 |
| title | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California |
| title_auth | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California |
| title_exact_search | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California |
| title_full | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California Gregory K. Hearn, ed. |
| title_fullStr | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California Gregory K. Hearn, ed. |
| title_full_unstemmed | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California Gregory K. Hearn, ed. |
| title_short | 64- to 256-megabit reticle generation |
| title_sort | 64 to 256 megabit reticle generation technology requirements and approaches proceeding of a conference held 24 september 1993 santa clara california |
| title_sub | technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California |
| topic | Maskentechnik (DE-588)4125845-9 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| topic_facet | Maskentechnik Lithografie Halbleitertechnologie Konferenzschrift 1993 Santa Clara Calif. |
| volume_link | (DE-604)BV005490642 |
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