64- to 256-megabit reticle generation: technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California
Gespeichert in:
| Weitere Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE Optical Engineering Press
c 1994
|
| Schriftenreihe: | Critical reviews of optical science and technology
51 |
| Schlagworte: | |
| Beschreibung: | VII, 273 S. graph. Darst. |
| ISBN: | 0819413585 |
Internformat
MARC
| LEADER | 00000nam a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV023825401 | ||
| 003 | DE-604 | ||
| 005 | 20160210 | ||
| 007 | t | ||
| 008 | 940726s1994 d||| |||| 10||| eng d | ||
| 020 | |a 0819413585 |9 0-8194-1358-5 | ||
| 035 | |a (OCoLC)635627489 | ||
| 035 | |a (DE-599)BVBBV023825401 | ||
| 040 | |a DE-604 |b ger | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-634 | ||
| 245 | 1 | 0 | |a 64- to 256-megabit reticle generation |b technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California |c Gregory K. Hearn, ed. |
| 264 | 1 | |a Bellingham, Wash. |b SPIE Optical Engineering Press |c c 1994 | |
| 300 | |a VII, 273 S. |b graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Critical reviews of optical science and technology |v 51 | |
| 650 | 0 | 7 | |a Maskentechnik |0 (DE-588)4125845-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1993 |z Santa Clara Calif. |2 gnd-content | |
| 689 | 0 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 0 | 1 | |a Maskentechnik |0 (DE-588)4125845-9 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Hearn, Gregory K. |4 edt | |
| 830 | 0 | |a Critical reviews of optical science and technology |v 51 |w (DE-604)BV005490642 |9 51 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-017467593 | ||
Datensatz im Suchindex
| _version_ | 1804139024368009216 |
|---|---|
| any_adam_object | |
| author2 | Hearn, Gregory K. |
| author2_role | edt |
| author2_variant | g k h gk gkh |
| author_facet | Hearn, Gregory K. |
| building | Verbundindex |
| bvnumber | BV023825401 |
| ctrlnum | (OCoLC)635627489 (DE-599)BVBBV023825401 |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01400nam a2200349zcb4500</leader><controlfield tag="001">BV023825401</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20160210 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">940726s1994 d||| |||| 10||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0819413585</subfield><subfield code="9">0-8194-1358-5</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)635627489</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV023825401</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-634</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">64- to 256-megabit reticle generation</subfield><subfield code="b">technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California</subfield><subfield code="c">Gregory K. Hearn, ed.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE Optical Engineering Press</subfield><subfield code="c">c 1994</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">VII, 273 S.</subfield><subfield code="b">graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Critical reviews of optical science and technology</subfield><subfield code="v">51</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Maskentechnik</subfield><subfield code="0">(DE-588)4125845-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1993</subfield><subfield code="z">Santa Clara Calif.</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Maskentechnik</subfield><subfield code="0">(DE-588)4125845-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Hearn, Gregory K.</subfield><subfield code="4">edt</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Critical reviews of optical science and technology</subfield><subfield code="v">51</subfield><subfield code="w">(DE-604)BV005490642</subfield><subfield code="9">51</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-017467593</subfield></datafield></record></collection> |
| genre | (DE-588)1071861417 Konferenzschrift 1993 Santa Clara Calif. gnd-content |
| genre_facet | Konferenzschrift 1993 Santa Clara Calif. |
| id | DE-604.BV023825401 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T21:37:30Z |
| institution | BVB |
| isbn | 0819413585 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-017467593 |
| oclc_num | 635627489 |
| open_access_boolean | |
| owner | DE-634 |
| owner_facet | DE-634 |
| physical | VII, 273 S. graph. Darst. |
| publishDate | 1994 |
| publishDateSearch | 1994 |
| publishDateSort | 1994 |
| publisher | SPIE Optical Engineering Press |
| record_format | marc |
| series | Critical reviews of optical science and technology |
| series2 | Critical reviews of optical science and technology |
| spelling | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California Gregory K. Hearn, ed. Bellingham, Wash. SPIE Optical Engineering Press c 1994 VII, 273 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Critical reviews of optical science and technology 51 Maskentechnik (DE-588)4125845-9 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1993 Santa Clara Calif. gnd-content Lithografie Halbleitertechnologie (DE-588)4191584-7 s Maskentechnik (DE-588)4125845-9 s DE-604 Hearn, Gregory K. edt Critical reviews of optical science and technology 51 (DE-604)BV005490642 51 |
| spellingShingle | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California Critical reviews of optical science and technology Maskentechnik (DE-588)4125845-9 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| subject_GND | (DE-588)4125845-9 (DE-588)4191584-7 (DE-588)1071861417 |
| title | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California |
| title_auth | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California |
| title_exact_search | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California |
| title_full | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California Gregory K. Hearn, ed. |
| title_fullStr | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California Gregory K. Hearn, ed. |
| title_full_unstemmed | 64- to 256-megabit reticle generation technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California Gregory K. Hearn, ed. |
| title_short | 64- to 256-megabit reticle generation |
| title_sort | 64 to 256 megabit reticle generation technology requirements and approaches proceeding of a conference held 24 september 1993 santa clara california |
| title_sub | technology requirements and approaches ; proceeding of a conference held 24 September 1993, Santa Clara, California |
| topic | Maskentechnik (DE-588)4125845-9 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| topic_facet | Maskentechnik Lithografie Halbleitertechnologie Konferenzschrift 1993 Santa Clara Calif. |
| volume_link | (DE-604)BV005490642 |
| work_keys_str_mv | AT hearngregoryk 64to256megabitreticlegenerationtechnologyrequirementsandapproachesproceedingofaconferenceheld24september1993santaclaracalifornia |