Fundamentals of silicon integrated device technology: 1. Oxidation, diffusion and epitaxy
Gespeichert in:
Format: | Buch |
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Sprache: | English |
Veröffentlicht: |
Englewood Cliffs, N.J.
Prentice-Hall
[1967]
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Schlagworte: | |
Beschreibung: | XIV, 345 S. Ill., graph.Darst. |
Internformat
MARC
LEADER | 00000nam a2200000zcc4500 | ||
---|---|---|---|
001 | BV023703852 | ||
003 | DE-604 | ||
005 | 20000510000000.0 | ||
007 | t | ||
008 | 000418s1967 ad|| |||| 00||| eng d | ||
035 | |a (OCoLC)915843624 | ||
035 | |a (DE-599)BVBBV023703852 | ||
040 | |a DE-604 |b ger | ||
041 | 0 | |a eng | |
049 | |a DE-11 | ||
245 | 1 | 0 | |a Fundamentals of silicon integrated device technology |n 1. |p Oxidation, diffusion and epitaxy |c ed. by Robert M. Burger |
264 | 1 | |a Englewood Cliffs, N.J. |b Prentice-Hall |c [1967] | |
300 | |a XIV, 345 S. |b Ill., graph.Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
650 | 0 | 7 | |a Oxidation |0 (DE-588)4137187-2 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Diffusion |0 (DE-588)4012277-3 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Epitaxie |0 (DE-588)4152545-0 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a Oxidation |0 (DE-588)4137187-2 |D s |
689 | 0 | |5 DE-604 | |
689 | 1 | 0 | |a Diffusion |0 (DE-588)4012277-3 |D s |
689 | 1 | |5 DE-604 | |
689 | 2 | 0 | |a Epitaxie |0 (DE-588)4152545-0 |D s |
689 | 2 | |5 DE-604 | |
700 | 1 | |a Burger, Robert M. |e Sonstige |4 oth | |
773 | 0 | 8 | |w (DE-604)BV002407094 |g 1 |
999 | |a oai:aleph.bib-bvb.de:BVB01-017204525 |
Datensatz im Suchindex
_version_ | 1804138727112441856 |
---|---|
any_adam_object | |
building | Verbundindex |
bvnumber | BV023703852 |
ctrlnum | (OCoLC)915843624 (DE-599)BVBBV023703852 |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01172nam a2200361zcc4500</leader><controlfield tag="001">BV023703852</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20000510000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">000418s1967 ad|| |||| 00||| eng d</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)915843624</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV023703852</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-11</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Fundamentals of silicon integrated device technology</subfield><subfield code="n">1.</subfield><subfield code="p">Oxidation, diffusion and epitaxy</subfield><subfield code="c">ed. by Robert M. Burger</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Englewood Cliffs, N.J.</subfield><subfield code="b">Prentice-Hall</subfield><subfield code="c">[1967]</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XIV, 345 S.</subfield><subfield code="b">Ill., graph.Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Oxidation</subfield><subfield code="0">(DE-588)4137187-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Diffusion</subfield><subfield code="0">(DE-588)4012277-3</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Epitaxie</subfield><subfield code="0">(DE-588)4152545-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Oxidation</subfield><subfield code="0">(DE-588)4137187-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Diffusion</subfield><subfield code="0">(DE-588)4012277-3</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Epitaxie</subfield><subfield code="0">(DE-588)4152545-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Burger, Robert M.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="w">(DE-604)BV002407094</subfield><subfield code="g">1</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-017204525</subfield></datafield></record></collection> |
id | DE-604.BV023703852 |
illustrated | Illustrated |
indexdate | 2024-07-09T21:32:47Z |
institution | BVB |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-017204525 |
oclc_num | 915843624 |
open_access_boolean | |
owner | DE-11 |
owner_facet | DE-11 |
physical | XIV, 345 S. Ill., graph.Darst. |
publishDate | 1967 |
publishDateSearch | 1967 |
publishDateSort | 1967 |
publisher | Prentice-Hall |
record_format | marc |
spelling | Fundamentals of silicon integrated device technology 1. Oxidation, diffusion and epitaxy ed. by Robert M. Burger Englewood Cliffs, N.J. Prentice-Hall [1967] XIV, 345 S. Ill., graph.Darst. txt rdacontent n rdamedia nc rdacarrier Oxidation (DE-588)4137187-2 gnd rswk-swf Diffusion (DE-588)4012277-3 gnd rswk-swf Epitaxie (DE-588)4152545-0 gnd rswk-swf Oxidation (DE-588)4137187-2 s DE-604 Diffusion (DE-588)4012277-3 s Epitaxie (DE-588)4152545-0 s Burger, Robert M. Sonstige oth (DE-604)BV002407094 1 |
spellingShingle | Fundamentals of silicon integrated device technology Oxidation (DE-588)4137187-2 gnd Diffusion (DE-588)4012277-3 gnd Epitaxie (DE-588)4152545-0 gnd |
subject_GND | (DE-588)4137187-2 (DE-588)4012277-3 (DE-588)4152545-0 |
title | Fundamentals of silicon integrated device technology |
title_auth | Fundamentals of silicon integrated device technology |
title_exact_search | Fundamentals of silicon integrated device technology |
title_full | Fundamentals of silicon integrated device technology 1. Oxidation, diffusion and epitaxy ed. by Robert M. Burger |
title_fullStr | Fundamentals of silicon integrated device technology 1. Oxidation, diffusion and epitaxy ed. by Robert M. Burger |
title_full_unstemmed | Fundamentals of silicon integrated device technology 1. Oxidation, diffusion and epitaxy ed. by Robert M. Burger |
title_short | Fundamentals of silicon integrated device technology |
title_sort | fundamentals of silicon integrated device technology oxidation diffusion and epitaxy |
topic | Oxidation (DE-588)4137187-2 gnd Diffusion (DE-588)4012277-3 gnd Epitaxie (DE-588)4152545-0 gnd |
topic_facet | Oxidation Diffusion Epitaxie |
volume_link | (DE-604)BV002407094 |
work_keys_str_mv | AT burgerrobertm fundamentalsofsiliconintegrateddevicetechnology1 |