Vacuum electronics: components and devices
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Berlin ; Heidelberg ; New York
Springer
2008
|
| Schlagworte: | |
| Online-Zugang: | Inhaltstext Inhaltsverzeichnis |
| Beschreibung: | Literaturangaben |
| Beschreibung: | XVII, 535 S. Ill., graph. Darst. |
| ISBN: | 9783540719281 |
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Datensatz im Suchindex
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|---|---|
| adam_text |
CONTENTS LISTOF CONTRIBUTORS XV 1 MICROWAVE TUBES , 1 G. FAILLON, G.
KORNFELD, E. BOSCH, AND M.K, THUMM I 1.1 INTRODUCTION 1 1.1.1 REVIEW OF
STATE-OF-THE-ART AND PRESENT SITUATION 1 1.1.2 HISTORICAL DEVELOPMENT 1
1.1.3 BASIC OPERATING PRINCIPLES AND DEFINITIONS 4 L2 KLYSTRONS 12 1.2.1
KLYSTRON AMPLIFIERS 12 1.2.2 MULTIBEAM KLYSTRONS 20 1.2.3 INDUCTIVE
OUTPUT TUBES (IOT) 22 1.3 TRAVELING WAVE TUBE (TWT) 24 1.3.1
INTRODUCTION 24 1.3.2 TWT DESIGN AND OPERATION PRINCIPLE 25 1.3.3 TWT
PHYSICS 29 1.3.4 TWT APPLICATIONS 45 1.4 EXTENDED INTERACTION KLYSTRON
EIK 50 1.4.1 INTRODUCTION 50 1.4.2 EXTENDED INTERACTION CIRCUIT DESIGN
50 1.4.3 TYPICAL PERFORMANCE AND APPLICATIONS . 50 1.5 BACKWARD WAVE
OSCILLATOR (BWO) 52 1.5.1 INTRODUCTION 52 1.5.2 BWO OPERATION PRINCIPLE
52 1.5.3 BWO APPLICATIONS , 54 GESCANNT DURCH BIBLIOGRAFISCHE
INFORMATIONEN HTTP://D-NB.INFO/98478635X DIGITALISIERT DURCH * * * * * *
* * * * * * * * * * * * * * * * * * * * * * INDEX 521 XIV CONTENTS
11.2.2 THE IDEAL GAS LAW 484 11.2.3 THE PRESSURE RANGES IN VACUUM
TECHNOLOGY 485 11.2.4 SURFACE INTERACTIONS AND OUTGASSING 487 11.3
VACUUMPUMPS 487 11.3.1 INTRODUCTION 487 11.3.2 PUMPS FOR ROUGH AND
MEDIUM VACUUM 488 11.3.3 PUMPS FOR HIGH VACUUM (HV) AND ULTRAHIGH VACUUM
(UHV) . 490 11.3.4 PUMP SELECTION 497 11.4 VACUUM PRESSURE MEASUREMENT
497 11.4.1 INTRODUCTION 497 11.4.2 TOTAL PRESSURE GAUGES 498 11.4.3
PARTIAL PRESSURE GAUGES 506 11.5 VACUUM MATERIALS AND COMPONENTS 508
11.5.1 MATERIAL PROPERTIES FOR VACUUM APPLICATIONS 508 11.5.2 COMPONENT
STANDARDS AND CONSTRUCTIONS 511 11.5.3 CLEANING PROCEDURES 512 11.6 LEAK
AND LEAK DETECTION 514 11.6.1 INTRODUCTION 514 11.6.2 LEAK TESTING
METHODS 514 11.6.3 HELIUM LEAK DETECTORS 515 11.6.4 LEAK TESTING OF
VACUUM MICROELECTRONIC DEVICES 517 11.7 EXAMPLES OF VACUUM SYSTEMS 517
11.7.1 UHV SYSTEM FOR FIELD EMISSION CHARACTERISATION 517 REFERENCES 519 |
| adam_txt |
CONTENTS LISTOF CONTRIBUTORS XV 1 MICROWAVE TUBES , 1 G. FAILLON, G.
KORNFELD, E. BOSCH, AND M.K, THUMM I 1.1 INTRODUCTION 1 1.1.1 REVIEW OF
STATE-OF-THE-ART AND PRESENT SITUATION 1 1.1.2 HISTORICAL DEVELOPMENT 1
1.1.3 BASIC OPERATING PRINCIPLES AND DEFINITIONS 4 L2 KLYSTRONS 12 1.2.1
KLYSTRON AMPLIFIERS 12 1.2.2 MULTIBEAM KLYSTRONS 20 1.2.3 INDUCTIVE
OUTPUT TUBES (IOT) 22 1.3 TRAVELING WAVE TUBE (TWT) 24 1.3.1
INTRODUCTION 24 1.3.2 TWT DESIGN AND OPERATION PRINCIPLE 25 1.3.3 TWT
PHYSICS 29 1.3.4 TWT APPLICATIONS 45 1.4 EXTENDED INTERACTION KLYSTRON
EIK 50 1.4.1 INTRODUCTION 50 1.4.2 EXTENDED INTERACTION CIRCUIT DESIGN
50 1.4.3 TYPICAL PERFORMANCE AND APPLICATIONS . 50 1.5 BACKWARD WAVE
OSCILLATOR (BWO) 52 1.5.1 INTRODUCTION 52 1.5.2 BWO OPERATION PRINCIPLE
52 1.5.3 BWO APPLICATIONS , 54 GESCANNT DURCH BIBLIOGRAFISCHE
INFORMATIONEN HTTP://D-NB.INFO/98478635X DIGITALISIERT DURCH * * * * * *
* * * * * * * * * * * * * * * * * * * * * * INDEX 521 XIV CONTENTS
11.2.2 THE IDEAL GAS LAW 484 11.2.3 THE PRESSURE RANGES IN VACUUM
TECHNOLOGY 485 11.2.4 SURFACE INTERACTIONS AND OUTGASSING 487 11.3
VACUUMPUMPS 487 11.3.1 INTRODUCTION 487 11.3.2 PUMPS FOR ROUGH AND
MEDIUM VACUUM 488 11.3.3 PUMPS FOR HIGH VACUUM (HV) AND ULTRAHIGH VACUUM
(UHV) . 490 11.3.4 PUMP SELECTION 497 11.4 VACUUM PRESSURE MEASUREMENT
497 11.4.1 INTRODUCTION 497 11.4.2 TOTAL PRESSURE GAUGES 498 11.4.3
PARTIAL PRESSURE GAUGES 506 11.5 VACUUM MATERIALS AND COMPONENTS 508
11.5.1 MATERIAL PROPERTIES FOR VACUUM APPLICATIONS 508 11.5.2 COMPONENT
STANDARDS AND CONSTRUCTIONS 511 11.5.3 CLEANING PROCEDURES 512 11.6 LEAK
AND LEAK DETECTION 514 11.6.1 INTRODUCTION 514 11.6.2 LEAK TESTING
METHODS 514 11.6.3 HELIUM LEAK DETECTORS 515 11.6.4 LEAK TESTING OF
VACUUM MICROELECTRONIC DEVICES 517 11.7 EXAMPLES OF VACUUM SYSTEMS 517
11.7.1 UHV SYSTEM FOR FIELD EMISSION CHARACTERISATION 517 REFERENCES 519 |
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| discipline | Maschinenbau / Maschinenwesen Elektrotechnik / Elektronik / Nachrichtentechnik |
| discipline_str_mv | Maschinenbau / Maschinenwesen Elektrotechnik / Elektronik / Nachrichtentechnik |
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| spellingShingle | Vacuum electronics components and devices Microwave tubes Vacuum microelectronics Vacuum-tubes Vakuumtechnik (DE-588)4062270-8 gnd Vakuumelektronik (DE-588)4214651-3 gnd Vakuumröhre (DE-588)4235887-5 gnd Mikrowellenröhre (DE-588)4191468-5 gnd |
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| title | Vacuum electronics components and devices |
| title_auth | Vacuum electronics components and devices |
| title_exact_search | Vacuum electronics components and devices |
| title_exact_search_txtP | Vacuum electronics components and devices |
| title_full | Vacuum electronics components and devices Joseph A. Eichmeier ... (ed.) |
| title_fullStr | Vacuum electronics components and devices Joseph A. Eichmeier ... (ed.) |
| title_full_unstemmed | Vacuum electronics components and devices Joseph A. Eichmeier ... (ed.) |
| title_short | Vacuum electronics |
| title_sort | vacuum electronics components and devices |
| title_sub | components and devices |
| topic | Microwave tubes Vacuum microelectronics Vacuum-tubes Vakuumtechnik (DE-588)4062270-8 gnd Vakuumelektronik (DE-588)4214651-3 gnd Vakuumröhre (DE-588)4235887-5 gnd Mikrowellenröhre (DE-588)4191468-5 gnd |
| topic_facet | Microwave tubes Vacuum microelectronics Vacuum-tubes Vakuumtechnik Vakuumelektronik Vakuumröhre Mikrowellenröhre Aufsatzsammlung |
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