Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Abschlussarbeit Buch |
| Sprache: | English |
| Veröffentlicht: |
Jülich
Forschungszentrum, Zentralbibliothek
2007
|
| Schriftenreihe: | Berichte des Forschungszentrums Jülich
4254 |
| Schlagworte: | |
| Beschreibung: | 5, 144 S. Ill., graph. Darst. 30 cm |
Internformat
MARC
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| 245 | 1 | 0 | |a Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition |c Yaohua Mai. [Forschungszentrum Jülich in der Helmholtz-Gemeinschaft, Institute for Energy Research (IEF), Photovoltaics (IEF-5)] |
| 264 | 1 | |a Jülich |b Forschungszentrum, Zentralbibliothek |c 2007 | |
| 300 | |a 5, 144 S. |b Ill., graph. Darst. |c 30 cm | ||
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| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Berichte des Forschungszentrums Jülich |v 4254 | |
| 502 | |a Zugl.: Tianjin, Nankai Univ., Diss., 2006 | ||
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Datensatz im Suchindex
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| adam_txt | |
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| any_adam_object_boolean | |
| author | Mai, Yaohua |
| author_facet | Mai, Yaohua |
| author_role | aut |
| author_sort | Mai, Yaohua |
| author_variant | y m ym |
| building | Verbundindex |
| bvnumber | BV023393016 |
| ctrlnum | (OCoLC)500463058 (DE-599)DNB986400483 |
| dewey-full | 681.76 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 681 - Precision instruments and other devices |
| dewey-raw | 681.76 |
| dewey-search | 681.76 |
| dewey-sort | 3681.76 |
| dewey-tens | 680 - Manufacture of products for specific uses |
| discipline | Handwerk und Gewerbe / Verschiedene Technologien |
| discipline_str_mv | Handwerk und Gewerbe / Verschiedene Technologien |
| format | Thesis Book |
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| genre_facet | Hochschulschrift |
| id | DE-604.BV023393016 |
| illustrated | Illustrated |
| index_date | 2024-07-02T21:20:43Z |
| indexdate | 2024-07-09T21:17:35Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-016575924 |
| oclc_num | 500463058 |
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| physical | 5, 144 S. Ill., graph. Darst. 30 cm |
| publishDate | 2007 |
| publishDateSearch | 2007 |
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| publisher | Forschungszentrum, Zentralbibliothek |
| record_format | marc |
| series2 | Berichte des Forschungszentrums Jülich |
| spelling | Mai, Yaohua Verfasser aut Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition Yaohua Mai. [Forschungszentrum Jülich in der Helmholtz-Gemeinschaft, Institute for Energy Research (IEF), Photovoltaics (IEF-5)] Jülich Forschungszentrum, Zentralbibliothek 2007 5, 144 S. Ill., graph. Darst. 30 cm txt rdacontent n rdamedia nc rdacarrier Berichte des Forschungszentrums Jülich 4254 Zugl.: Tianjin, Nankai Univ., Diss., 2006 Mikrokristall (DE-588)4169828-9 gnd rswk-swf Silicium (DE-588)4077445-4 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Solarzelle (DE-588)4181740-0 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Solarzelle (DE-588)4181740-0 s Silicium (DE-588)4077445-4 s Mikrokristall (DE-588)4169828-9 s CVD-Verfahren (DE-588)4009846-1 s DE-604 Forschungszentrum <Jülich> Berichte des Forschungszentrums Jülich 4254 (DE-604)BV004194732 4254 |
| spellingShingle | Mai, Yaohua Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition Mikrokristall (DE-588)4169828-9 gnd Silicium (DE-588)4077445-4 gnd CVD-Verfahren (DE-588)4009846-1 gnd Solarzelle (DE-588)4181740-0 gnd |
| subject_GND | (DE-588)4169828-9 (DE-588)4077445-4 (DE-588)4009846-1 (DE-588)4181740-0 (DE-588)4113937-9 |
| title | Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition |
| title_auth | Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition |
| title_exact_search | Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition |
| title_exact_search_txtP | Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition |
| title_full | Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition Yaohua Mai. [Forschungszentrum Jülich in der Helmholtz-Gemeinschaft, Institute for Energy Research (IEF), Photovoltaics (IEF-5)] |
| title_fullStr | Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition Yaohua Mai. [Forschungszentrum Jülich in der Helmholtz-Gemeinschaft, Institute for Energy Research (IEF), Photovoltaics (IEF-5)] |
| title_full_unstemmed | Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition Yaohua Mai. [Forschungszentrum Jülich in der Helmholtz-Gemeinschaft, Institute for Energy Research (IEF), Photovoltaics (IEF-5)] |
| title_short | Microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition |
| title_sort | microcrystalline silicon layers for thin film solar cells prepared with hot wire chemical vapour deposition and plasma enhanced chemical vapour deposition |
| topic | Mikrokristall (DE-588)4169828-9 gnd Silicium (DE-588)4077445-4 gnd CVD-Verfahren (DE-588)4009846-1 gnd Solarzelle (DE-588)4181740-0 gnd |
| topic_facet | Mikrokristall Silicium CVD-Verfahren Solarzelle Hochschulschrift |
| volume_link | (DE-604)BV004194732 |
| work_keys_str_mv | AT maiyaohua microcrystallinesiliconlayersforthinfilmsolarcellspreparedwithhotwirechemicalvapourdepositionandplasmaenhancedchemicalvapourdeposition |