Instruments for quality control in lithography:
Gespeichert in:
1. Verfasser: | |
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Format: | Buch |
Sprache: | English |
Veröffentlicht: |
New York
Lithographic Technical Foundation
1963
|
Schlagworte: | |
Beschreibung: | XVII, 102 S. zahlr. Ill. |
Internformat
MARC
LEADER | 00000nam a2200000 c 4500 | ||
---|---|---|---|
001 | BV023246378 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | t | ||
008 | 080408s1963 a||| |||| 00||| eng d | ||
035 | |a (OCoLC)2952147 | ||
035 | |a (DE-599)BVBBV023246378 | ||
040 | |a DE-604 |b ger |e rakwb | ||
041 | 0 | |a eng | |
049 | |a DE-M347 | ||
050 | 0 | |a NE2490 | |
082 | 0 | |a 763 | |
100 | 1 | |a Reed, Robert Findley |e Verfasser |0 (DE-588)126804575 |4 aut | |
245 | 1 | 0 | |a Instruments for quality control in lithography |c Robert F. Reed |
264 | 1 | |a New York |b Lithographic Technical Foundation |c 1963 | |
300 | |a XVII, 102 S. |b zahlr. Ill. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
650 | 4 | |a Lithography |x Equipment and supplies | |
999 | |a oai:aleph.bib-bvb.de:BVB01-016431831 |
Datensatz im Suchindex
_version_ | 1804137546839490560 |
---|---|
adam_txt | |
any_adam_object | |
any_adam_object_boolean | |
author | Reed, Robert Findley |
author_GND | (DE-588)126804575 |
author_facet | Reed, Robert Findley |
author_role | aut |
author_sort | Reed, Robert Findley |
author_variant | r f r rf rfr |
building | Verbundindex |
bvnumber | BV023246378 |
callnumber-first | N - Fine Arts |
callnumber-label | NE2490 |
callnumber-raw | NE2490 |
callnumber-search | NE2490 |
callnumber-sort | NE 42490 |
callnumber-subject | NE - Print Media |
ctrlnum | (OCoLC)2952147 (DE-599)BVBBV023246378 |
dewey-full | 763 |
dewey-hundreds | 700 - The arts |
dewey-ones | 763 - Lithographic processes |
dewey-raw | 763 |
dewey-search | 763 |
dewey-sort | 3763 |
dewey-tens | 760 - Printmaking & prints |
discipline | Kunstgeschichte |
discipline_str_mv | Kunstgeschichte |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>00812nam a2200277 c 4500</leader><controlfield tag="001">BV023246378</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">080408s1963 a||| |||| 00||| eng d</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)2952147</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV023246378</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-M347</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">NE2490</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">763</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Reed, Robert Findley</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)126804575</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Instruments for quality control in lithography</subfield><subfield code="c">Robert F. Reed</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York</subfield><subfield code="b">Lithographic Technical Foundation</subfield><subfield code="c">1963</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XVII, 102 S.</subfield><subfield code="b">zahlr. Ill.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithography</subfield><subfield code="x">Equipment and supplies</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-016431831</subfield></datafield></record></collection> |
id | DE-604.BV023246378 |
illustrated | Illustrated |
index_date | 2024-07-02T20:25:57Z |
indexdate | 2024-07-09T21:14:01Z |
institution | BVB |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-016431831 |
oclc_num | 2952147 |
open_access_boolean | |
owner | DE-M347 |
owner_facet | DE-M347 |
physical | XVII, 102 S. zahlr. Ill. |
publishDate | 1963 |
publishDateSearch | 1963 |
publishDateSort | 1963 |
publisher | Lithographic Technical Foundation |
record_format | marc |
spelling | Reed, Robert Findley Verfasser (DE-588)126804575 aut Instruments for quality control in lithography Robert F. Reed New York Lithographic Technical Foundation 1963 XVII, 102 S. zahlr. Ill. txt rdacontent n rdamedia nc rdacarrier Lithography Equipment and supplies |
spellingShingle | Reed, Robert Findley Instruments for quality control in lithography Lithography Equipment and supplies |
title | Instruments for quality control in lithography |
title_auth | Instruments for quality control in lithography |
title_exact_search | Instruments for quality control in lithography |
title_exact_search_txtP | Instruments for quality control in lithography |
title_full | Instruments for quality control in lithography Robert F. Reed |
title_fullStr | Instruments for quality control in lithography Robert F. Reed |
title_full_unstemmed | Instruments for quality control in lithography Robert F. Reed |
title_short | Instruments for quality control in lithography |
title_sort | instruments for quality control in lithography |
topic | Lithography Equipment and supplies |
topic_facet | Lithography Equipment and supplies |
work_keys_str_mv | AT reedrobertfindley instrumentsforqualitycontrolinlithography |