Mesoscopic simulation of photoresist processing in optical lithography: = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie
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| Main Author: | |
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| Format: | Book |
| Language: | English |
| Published: |
2007
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| Subjects: | |
| Online Access: | Volltext http://d-nb.info/988688654/34 Volltext |
| Item Description: | Erlangen-Nürnberg, Univ., Diss., 2007 |
| Physical Description: | XII, 151 S. Ill., graph. Darst. |
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| 245 | 1 | 0 | |a Mesoscopic simulation of photoresist processing in optical lithography |b = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie |c von Thomas Schnattinger |
| 246 | 1 | 1 | |a Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie |
| 264 | 1 | |c 2007 | |
| 300 | |a XII, 151 S. |b Ill., graph. Darst. | ||
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Record in the Search Index
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| id | DE-604.BV023060211 |
| illustrated | Illustrated |
| index_date | 2024-07-02T19:28:27Z |
| indexdate | 2024-07-09T21:10:03Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-016263463 |
| oclc_num | 643342749 |
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| physical | XII, 151 S. Ill., graph. Darst. |
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| publishDate | 2007 |
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| spelling | Schnattinger, Thomas Verfasser (DE-588)133833534 aut Mesoscopic simulation of photoresist processing in optical lithography = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie von Thomas Schnattinger Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie 2007 XII, 151 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Erlangen-Nürnberg, Univ., Diss., 2007 Langzeitarchivierung Nationalbibliothek gewährleistet Photoresist (DE-588)4174545-0 gnd rswk-swf Linienbreite (DE-588)4287194-3 gnd rswk-swf Fotolithografie (DE-588)4274823-9 gnd rswk-swf Mesoskopisches System (DE-588)4280799-2 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Fotolithografie (DE-588)4274823-9 s Linienbreite (DE-588)4287194-3 s Photoresist (DE-588)4174545-0 s Mesoskopisches System (DE-588)4280799-2 s DE-604 Erscheint auch als Online-Ausgabe urn:nbn:de:bvb:29-opus-7432 https://open.fau.de/handle/openfau/554 Verlag kostenfrei Volltext http://d-nb.info/988688654/34 https://nbn-resolving.org/urn:nbn:de:bvb:29-opus-7432 Verlag kostenfrei Volltext |
| spellingShingle | Schnattinger, Thomas Mesoscopic simulation of photoresist processing in optical lithography = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie Photoresist (DE-588)4174545-0 gnd Linienbreite (DE-588)4287194-3 gnd Fotolithografie (DE-588)4274823-9 gnd Mesoskopisches System (DE-588)4280799-2 gnd |
| subject_GND | (DE-588)4174545-0 (DE-588)4287194-3 (DE-588)4274823-9 (DE-588)4280799-2 (DE-588)4113937-9 |
| title | Mesoscopic simulation of photoresist processing in optical lithography = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie |
| title_alt | Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie |
| title_auth | Mesoscopic simulation of photoresist processing in optical lithography = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie |
| title_exact_search | Mesoscopic simulation of photoresist processing in optical lithography = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie |
| title_exact_search_txtP | Mesoscopic simulation of photoresist processing in optical lithography = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie |
| title_full | Mesoscopic simulation of photoresist processing in optical lithography = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie von Thomas Schnattinger |
| title_fullStr | Mesoscopic simulation of photoresist processing in optical lithography = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie von Thomas Schnattinger |
| title_full_unstemmed | Mesoscopic simulation of photoresist processing in optical lithography = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie von Thomas Schnattinger |
| title_short | Mesoscopic simulation of photoresist processing in optical lithography |
| title_sort | mesoscopic simulation of photoresist processing in optical lithography mesoskopische simulation der photolackbearbeitung in der optischen lithographie |
| title_sub | = Mesoskopische Simulation der Photolackbearbeitung in der optischen Lithographie |
| topic | Photoresist (DE-588)4174545-0 gnd Linienbreite (DE-588)4287194-3 gnd Fotolithografie (DE-588)4274823-9 gnd Mesoskopisches System (DE-588)4280799-2 gnd |
| topic_facet | Photoresist Linienbreite Fotolithografie Mesoskopisches System Hochschulschrift |
| url | https://open.fau.de/handle/openfau/554 http://d-nb.info/988688654/34 https://nbn-resolving.org/urn:nbn:de:bvb:29-opus-7432 |
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