Handbook of physical vapor deposition (PVD) processing: film formation, adhesion, surface preparation and contamination control
Gespeichert in:
Format: | Elektronisch E-Book |
---|---|
Sprache: | English |
Veröffentlicht: |
Westwood, NJ
Noyes Publ.
1998
|
Schriftenreihe: | Noyes publications in materials science, process technology and semiconductors
|
Schlagworte: | |
Online-Zugang: | Volltext |
Beschreibung: | 1 Online-Ressource (XXVII, 917 S. Ill., graph. Darst.) |
ISBN: | 9780815517634 9780815514220 |
Internformat
MARC
LEADER | 00000nmm a2200000 c 4500 | ||
---|---|---|---|
001 | BV023051928 | ||
003 | DE-604 | ||
005 | 20110607 | ||
007 | cr|uuu---uuuuu | ||
008 | 071214s1998 |||| o||u| ||||||eng d | ||
020 | |a 9780815517634 |c Online |9 978-0-8155-1763-4 | ||
020 | |a 9780815514220 |9 978-0-8155-1422-0 | ||
035 | |a (OCoLC)632999849 | ||
035 | |a (DE-599)BVBBV023051928 | ||
040 | |a DE-604 |b ger |e rakddb | ||
041 | 0 | |a eng | |
084 | |a UP 7550 |0 (DE-625)146434: |2 rvk | ||
245 | 1 | 0 | |a Handbook of physical vapor deposition (PVD) processing |b film formation, adhesion, surface preparation and contamination control |c by Donald M. Mattox |
264 | 1 | |a Westwood, NJ |b Noyes Publ. |c 1998 | |
300 | |a 1 Online-Ressource (XXVII, 917 S. |b Ill., graph. Darst.) | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
490 | 0 | |a Noyes publications in materials science, process technology and semiconductors | |
650 | 0 | 7 | |a PVD-Verfahren |0 (DE-588)4115673-0 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a PVD-Verfahren |0 (DE-588)4115673-0 |D s |
689 | 0 | |5 DE-604 | |
700 | 1 | |a Mattox, Donald M. |e Sonstige |4 oth | |
856 | 4 | 0 | |u http://knovel.com/knovel2/Toc.jsp?BookID=63 |3 Volltext |
912 | |a ZDB-10-ESC | ||
943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-016255290 |
Datensatz im Suchindex
_version_ | 1806054954035576832 |
---|---|
adam_text | |
adam_txt | |
any_adam_object | |
any_adam_object_boolean | |
building | Verbundindex |
bvnumber | BV023051928 |
classification_rvk | UP 7550 |
collection | ZDB-10-ESC |
ctrlnum | (OCoLC)632999849 (DE-599)BVBBV023051928 |
discipline | Physik |
discipline_str_mv | Physik |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>00000nmm a2200000 c 4500</leader><controlfield tag="001">BV023051928</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20110607</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">071214s1998 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780815517634</subfield><subfield code="c">Online</subfield><subfield code="9">978-0-8155-1763-4</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780815514220</subfield><subfield code="9">978-0-8155-1422-0</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)632999849</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV023051928</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 7550</subfield><subfield code="0">(DE-625)146434:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Handbook of physical vapor deposition (PVD) processing</subfield><subfield code="b">film formation, adhesion, surface preparation and contamination control</subfield><subfield code="c">by Donald M. Mattox</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Westwood, NJ</subfield><subfield code="b">Noyes Publ.</subfield><subfield code="c">1998</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (XXVII, 917 S.</subfield><subfield code="b">Ill., graph. Darst.)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Noyes publications in materials science, process technology and semiconductors</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">PVD-Verfahren</subfield><subfield code="0">(DE-588)4115673-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">PVD-Verfahren</subfield><subfield code="0">(DE-588)4115673-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Mattox, Donald M.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://knovel.com/knovel2/Toc.jsp?BookID=63</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-10-ESC</subfield></datafield><datafield tag="943" ind1="1" ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-016255290</subfield></datafield></record></collection> |
id | DE-604.BV023051928 |
illustrated | Illustrated |
index_date | 2024-07-02T19:24:55Z |
indexdate | 2024-07-31T01:10:23Z |
institution | BVB |
isbn | 9780815517634 9780815514220 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-016255290 |
oclc_num | 632999849 |
open_access_boolean | |
owner | DE-91 DE-BY-TUM |
owner_facet | DE-91 DE-BY-TUM |
physical | 1 Online-Ressource (XXVII, 917 S. Ill., graph. Darst.) |
psigel | ZDB-10-ESC |
publishDate | 1998 |
publishDateSearch | 1998 |
publishDateSort | 1998 |
publisher | Noyes Publ. |
record_format | marc |
series2 | Noyes publications in materials science, process technology and semiconductors |
spelling | Handbook of physical vapor deposition (PVD) processing film formation, adhesion, surface preparation and contamination control by Donald M. Mattox Westwood, NJ Noyes Publ. 1998 1 Online-Ressource (XXVII, 917 S. Ill., graph. Darst.) txt rdacontent c rdamedia cr rdacarrier Noyes publications in materials science, process technology and semiconductors PVD-Verfahren (DE-588)4115673-0 gnd rswk-swf PVD-Verfahren (DE-588)4115673-0 s DE-604 Mattox, Donald M. Sonstige oth http://knovel.com/knovel2/Toc.jsp?BookID=63 Volltext |
spellingShingle | Handbook of physical vapor deposition (PVD) processing film formation, adhesion, surface preparation and contamination control PVD-Verfahren (DE-588)4115673-0 gnd |
subject_GND | (DE-588)4115673-0 |
title | Handbook of physical vapor deposition (PVD) processing film formation, adhesion, surface preparation and contamination control |
title_auth | Handbook of physical vapor deposition (PVD) processing film formation, adhesion, surface preparation and contamination control |
title_exact_search | Handbook of physical vapor deposition (PVD) processing film formation, adhesion, surface preparation and contamination control |
title_exact_search_txtP | Handbook of physical vapor deposition (PVD) processing film formation, adhesion, surface preparation and contamination control |
title_full | Handbook of physical vapor deposition (PVD) processing film formation, adhesion, surface preparation and contamination control by Donald M. Mattox |
title_fullStr | Handbook of physical vapor deposition (PVD) processing film formation, adhesion, surface preparation and contamination control by Donald M. Mattox |
title_full_unstemmed | Handbook of physical vapor deposition (PVD) processing film formation, adhesion, surface preparation and contamination control by Donald M. Mattox |
title_short | Handbook of physical vapor deposition (PVD) processing |
title_sort | handbook of physical vapor deposition pvd processing film formation adhesion surface preparation and contamination control |
title_sub | film formation, adhesion, surface preparation and contamination control |
topic | PVD-Verfahren (DE-588)4115673-0 gnd |
topic_facet | PVD-Verfahren |
url | http://knovel.com/knovel2/Toc.jsp?BookID=63 |
work_keys_str_mv | AT mattoxdonaldm handbookofphysicalvapordepositionpvdprocessingfilmformationadhesionsurfacepreparationandcontaminationcontrol |