Principles of plasma discharges and materials processing:
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
New York [u.a.]
Wiley
2005
|
| Ausgabe: | 2. ed. |
| Schlagworte: | |
| Beschreibung: | Hier auch später erschienene, unveränderte Nachdrucke |
| Beschreibung: | XXXV, 757 S. graph. Darst. |
| ISBN: | 0471720011 9780471720010 |
Internformat
MARC
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| 020 | |a 9780471720010 |9 978-0-471-72001-0 | ||
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| 035 | |a (DE-599)BVBBV022934060 | ||
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| 100 | 1 | |a Lieberman, Michael A. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Principles of plasma discharges and materials processing |c Michael A. Lieberman ; Allan J. Lichtenberg |
| 250 | |a 2. ed. | ||
| 264 | 1 | |a New York [u.a.] |b Wiley |c 2005 | |
| 300 | |a XXXV, 757 S. |b graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Hier auch später erschienene, unveränderte Nachdrucke | ||
| 650 | 4 | |a Plasma chemistry |x Industrial applications | |
| 650 | 4 | |a Plasma dynamics | |
| 650 | 4 | |a Plasma etching | |
| 650 | 4 | |a Thin films |x Surfaces | |
| 650 | 0 | 7 | |a Plasmadynamik |0 (DE-588)4123952-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Niederdruckplasma |0 (DE-588)4274388-6 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Festkörperoberfläche |0 (DE-588)4127823-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Dünne Schicht |0 (DE-588)4136925-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Plasmadynamik |0 (DE-588)4123952-0 |D s |
| 689 | 0 | 1 | |a Festkörperoberfläche |0 (DE-588)4127823-9 |D s |
| 689 | 0 | 2 | |a Dünne Schicht |0 (DE-588)4136925-7 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Niederdruckplasma |0 (DE-588)4274388-6 |D s |
| 689 | 1 | 1 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |D s |
| 689 | 1 | |5 DE-604 | |
| 700 | 1 | |a Lichtenberg, Allan J. |e Verfasser |4 aut | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-016138838 | ||
Datensatz im Suchindex
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| author | Lieberman, Michael A. Lichtenberg, Allan J. |
| author_facet | Lieberman, Michael A. Lichtenberg, Allan J. |
| author_role | aut aut |
| author_sort | Lieberman, Michael A. |
| author_variant | m a l ma mal a j l aj ajl |
| building | Verbundindex |
| bvnumber | BV022934060 |
| callnumber-first | Q - Science |
| callnumber-label | QC718 |
| callnumber-raw | QC718.5.D9 |
| callnumber-search | QC718.5.D9 |
| callnumber-sort | QC 3718.5 D9 |
| callnumber-subject | QC - Physics |
| classification_rvk | UR 8000 |
| classification_tum | ELT 279f PHY 570f FER 786f |
| ctrlnum | (OCoLC)56752658 (DE-599)BVBBV022934060 |
| dewey-full | 530.4/4 |
| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 530 - Physics |
| dewey-raw | 530.4/4 |
| dewey-search | 530.4/4 |
| dewey-sort | 3530.4 14 |
| dewey-tens | 530 - Physics |
| discipline | Physik Elektrotechnik Fertigungstechnik |
| discipline_str_mv | Physik Elektrotechnik Fertigungstechnik |
| edition | 2. ed. |
| format | Book |
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| id | DE-604.BV022934060 |
| illustrated | Illustrated |
| index_date | 2024-07-02T18:55:37Z |
| indexdate | 2024-07-09T21:07:59Z |
| institution | BVB |
| isbn | 0471720011 9780471720010 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-016138838 |
| oclc_num | 56752658 |
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| owner_facet | DE-M347 DE-19 DE-BY-UBM DE-526 DE-1051 DE-20 DE-384 DE-91 DE-BY-TUM |
| physical | XXXV, 757 S. graph. Darst. |
| publishDate | 2005 |
| publishDateSearch | 2005 |
| publishDateSort | 2005 |
| publisher | Wiley |
| record_format | marc |
| spelling | Lieberman, Michael A. Verfasser aut Principles of plasma discharges and materials processing Michael A. Lieberman ; Allan J. Lichtenberg 2. ed. New York [u.a.] Wiley 2005 XXXV, 757 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Hier auch später erschienene, unveränderte Nachdrucke Plasma chemistry Industrial applications Plasma dynamics Plasma etching Thin films Surfaces Plasmadynamik (DE-588)4123952-0 gnd rswk-swf Niederdruckplasma (DE-588)4274388-6 gnd rswk-swf Festkörperoberfläche (DE-588)4127823-9 gnd rswk-swf Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 gnd rswk-swf Plasmadynamik (DE-588)4123952-0 s Festkörperoberfläche (DE-588)4127823-9 s Dünne Schicht (DE-588)4136925-7 s DE-604 Niederdruckplasma (DE-588)4274388-6 s Dünnschichttechnik (DE-588)4136339-5 s Lichtenberg, Allan J. Verfasser aut |
| spellingShingle | Lieberman, Michael A. Lichtenberg, Allan J. Principles of plasma discharges and materials processing Plasma chemistry Industrial applications Plasma dynamics Plasma etching Thin films Surfaces Plasmadynamik (DE-588)4123952-0 gnd Niederdruckplasma (DE-588)4274388-6 gnd Festkörperoberfläche (DE-588)4127823-9 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Dünne Schicht (DE-588)4136925-7 gnd |
| subject_GND | (DE-588)4123952-0 (DE-588)4274388-6 (DE-588)4127823-9 (DE-588)4136339-5 (DE-588)4136925-7 |
| title | Principles of plasma discharges and materials processing |
| title_auth | Principles of plasma discharges and materials processing |
| title_exact_search | Principles of plasma discharges and materials processing |
| title_exact_search_txtP | Principles of plasma discharges and materials processing |
| title_full | Principles of plasma discharges and materials processing Michael A. Lieberman ; Allan J. Lichtenberg |
| title_fullStr | Principles of plasma discharges and materials processing Michael A. Lieberman ; Allan J. Lichtenberg |
| title_full_unstemmed | Principles of plasma discharges and materials processing Michael A. Lieberman ; Allan J. Lichtenberg |
| title_short | Principles of plasma discharges and materials processing |
| title_sort | principles of plasma discharges and materials processing |
| topic | Plasma chemistry Industrial applications Plasma dynamics Plasma etching Thin films Surfaces Plasmadynamik (DE-588)4123952-0 gnd Niederdruckplasma (DE-588)4274388-6 gnd Festkörperoberfläche (DE-588)4127823-9 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Dünne Schicht (DE-588)4136925-7 gnd |
| topic_facet | Plasma chemistry Industrial applications Plasma dynamics Plasma etching Thin films Surfaces Plasmadynamik Niederdruckplasma Festkörperoberfläche Dünnschichttechnik Dünne Schicht |
| work_keys_str_mv | AT liebermanmichaela principlesofplasmadischargesandmaterialsprocessing AT lichtenbergallanj principlesofplasmadischargesandmaterialsprocessing |