Focused ion beam systems: basics and applications
he focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting...
Saved in:
| Format: | Book |
|---|---|
| Language: | English |
| Published: |
Cambridge [u.a.]
Cambridge Univ. Press
2007
|
| Edition: | 1. publ. |
| Subjects: | |
| Online Access: | Inhaltsverzeichnis |
| Summary: | he focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology. |
| Physical Description: | XI, 395 S. Ill., graph. Darst. |
| ISBN: | 9780521831994 |
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| 520 | 3 | |a he focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology. | |
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Record in the Search Index
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Titel: Focused ion beam systems
Autor: Yao, Nan
Jahr: 2007
Contents
List of contributors page vii
Preface xi
1 Introduction to the focused ion beam system 1
Nan Yao
2 Interaction of ions with matter 31
Nobutsugu Imanishi
3 Gas assisted ion beam etching and deposition 67
Hyoung Ho (Chris) Kang, Clive Chandler, and Matthew Weschler
4 Imaging using electrons and ion beams 87
Kaoru Ohya and Tohru Ishitani
5 Characterization methods using FIB/SEM DualBeam
instrumentation 126
Steve Reyntjens and Lucille A. Giannuzzi
6 High-density FIB-SEM 3D nanotomography: with applications
of real-time imaging during FIB milling 146
E. L. Principe
1 Fabrication of nanoscale structures using ion beams 187
Ampere A. Tseng
8 Preparation for physico-chemical analysis 215
Richard Langford
9 In-situ sample manipulation and imaging 250
T. Kamino, T. Yaguchi, T. Ohnishi and T. Ishitani
vi Contents
10 Micro-machining and mask repair 268
Mark Utlaut
11 Three-dimensional visualization of nanostractured materials
using focused ion beam tomography 295
Derren Dunn, Alan J. Kubis, and Robert Hull
12 Ion beam implantation of surface layers 318
Daniel Recht and Nan Yao
13 Applications for biological materials 337
Kirk Hou and Nan Yao
14 Focused ion beam systems as a multifunctional tool for
nanotechnology 355
Toshiaki Fujii, Tatsuya Asahata, and Takashi Kaito
Index 391 |
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| spelling | Focused ion beam systems basics and applications ed. by Nan Yao 1. publ. Cambridge [u.a.] Cambridge Univ. Press 2007 XI, 395 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier he focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology. Focused ion beams Focused ion beams Industrial applications Ionenstrahl (DE-588)4162347-2 gnd rswk-swf (DE-588)4143413-4 Aufsatzsammlung gnd-content Ionenstrahl (DE-588)4162347-2 s DE-604 Yao, Nan Sonstige (DE-588)1302846140 oth HBZ Datenaustausch https://bvbr.bib-bvb.de:443/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=015959477&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
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| title | Focused ion beam systems basics and applications |
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| title_short | Focused ion beam systems |
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