Far-field beam shaping elements for deep UV lithography:
Saved in:
Bibliographic Details
Main Author: Ripoll, Olivier (Author)
Format: Book
Language:English
Published: Allensbach UFO Atelier für Gestaltung & Verlag 2003
Edition:1. Aufl.
Series:UFO-Dissertation 428
Subjects:
Item Description:Zugl.: Neuchâtel, Univ., Diss., 2003
Physical Description:IV, 140 S. Ill., graph. Darst.
ISBN:3935511299

There is no print copy available.

Interlibrary loan Place Request Caution: Not in THWS collection!