VLSI electronics, microstructure science: 8 Plasma processing for VLSI
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | Undetermined |
| Veröffentlicht: |
Orlando u.a.
Acad. Pr.
1984
|
| Ausgabe: | 1. print |
| Schlagworte: | |
| Beschreibung: | XIV, 527 S. |
| ISBN: | 0122341082 |
Internformat
MARC
| LEADER | 00000nam a2200000zcc4500 | ||
|---|---|---|---|
| 001 | BV022030629 | ||
| 003 | DE-604 | ||
| 005 | 20060314000000.0 | ||
| 007 | t | ||
| 008 | 960614s1984 |||| 00||| und d | ||
| 020 | |a 0122341082 |9 0-12-234108-2 | ||
| 035 | |a (OCoLC)635329098 | ||
| 035 | |a (DE-599)BVBBV022030629 | ||
| 040 | |a DE-604 |b ger | ||
| 041 | |a und | ||
| 049 | |a DE-706 | ||
| 245 | 1 | 0 | |a VLSI electronics, microstructure science |n 8 |p Plasma processing for VLSI |c ed. by Norman G. Einspruch |
| 250 | |a 1. print | ||
| 264 | 1 | |a Orlando u.a. |b Acad. Pr. |c 1984 | |
| 300 | |a XIV, 527 S. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 650 | 0 | 7 | |a Plasmastrahlbearbeitung |0 (DE-588)4136199-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Plasmaätzen |0 (DE-588)4174821-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Sputtern |0 (DE-588)4182614-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Mikroelektronik |0 (DE-588)4039207-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a VLSI |0 (DE-588)4117388-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Plasmatechnik |0 (DE-588)4140353-8 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Sputtern |0 (DE-588)4182614-0 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Plasmatechnik |0 (DE-588)4140353-8 |D s |
| 689 | 1 | |5 DE-604 | |
| 689 | 2 | 0 | |a Plasmastrahlbearbeitung |0 (DE-588)4136199-4 |D s |
| 689 | 2 | |5 DE-604 | |
| 689 | 3 | 0 | |a Plasmaätzen |0 (DE-588)4174821-9 |D s |
| 689 | 3 | |5 DE-604 | |
| 689 | 4 | 0 | |a VLSI |0 (DE-588)4117388-0 |D s |
| 689 | 4 | |5 DE-604 | |
| 689 | 5 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 5 | |5 DE-604 | |
| 689 | 6 | 0 | |a Mikroelektronik |0 (DE-588)4039207-7 |D s |
| 689 | 6 | |5 DE-604 | |
| 700 | 1 | |a Einspruch, Norman G. |e Sonstige |4 oth | |
| 773 | 0 | 8 | |w (DE-604)BV009495884 |g 8 |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-015245284 | ||
Datensatz im Suchindex
| _version_ | 1804136004706107392 |
|---|---|
| adam_txt | |
| any_adam_object | |
| any_adam_object_boolean | |
| building | Verbundindex |
| bvnumber | BV022030629 |
| ctrlnum | (OCoLC)635329098 (DE-599)BVBBV022030629 |
| edition | 1. print |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01809nam a2200529zcc4500</leader><controlfield tag="001">BV022030629</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20060314000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">960614s1984 |||| 00||| und d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0122341082</subfield><subfield code="9">0-12-234108-2</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)635329098</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV022030629</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">und</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-706</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">VLSI electronics, microstructure science</subfield><subfield code="n">8</subfield><subfield code="p">Plasma processing for VLSI</subfield><subfield code="c">ed. by Norman G. Einspruch</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">1. print</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Orlando u.a.</subfield><subfield code="b">Acad. Pr.</subfield><subfield code="c">1984</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XIV, 527 S.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmastrahlbearbeitung</subfield><subfield code="0">(DE-588)4136199-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Sputtern</subfield><subfield code="0">(DE-588)4182614-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Sputtern</subfield><subfield code="0">(DE-588)4182614-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Plasmastrahlbearbeitung</subfield><subfield code="0">(DE-588)4136199-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="3" ind2="0"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="4" ind2="0"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="4" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="5" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="5" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="6" ind2="0"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="6" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Einspruch, Norman G.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="w">(DE-604)BV009495884</subfield><subfield code="g">8</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-015245284</subfield></datafield></record></collection> |
| id | DE-604.BV022030629 |
| illustrated | Not Illustrated |
| index_date | 2024-07-02T16:12:35Z |
| indexdate | 2024-07-09T20:49:30Z |
| institution | BVB |
| isbn | 0122341082 |
| language | Undetermined |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-015245284 |
| oclc_num | 635329098 |
| open_access_boolean | |
| owner | DE-706 |
| owner_facet | DE-706 |
| physical | XIV, 527 S. |
| publishDate | 1984 |
| publishDateSearch | 1984 |
| publishDateSort | 1984 |
| publisher | Acad. Pr. |
| record_format | marc |
| spelling | VLSI electronics, microstructure science 8 Plasma processing for VLSI ed. by Norman G. Einspruch 1. print Orlando u.a. Acad. Pr. 1984 XIV, 527 S. txt rdacontent n rdamedia nc rdacarrier Plasmastrahlbearbeitung (DE-588)4136199-4 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf VLSI (DE-588)4117388-0 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 gnd rswk-swf Sputtern (DE-588)4182614-0 s DE-604 Plasmatechnik (DE-588)4140353-8 s Plasmastrahlbearbeitung (DE-588)4136199-4 s Plasmaätzen (DE-588)4174821-9 s VLSI (DE-588)4117388-0 s Lithografie Halbleitertechnologie (DE-588)4191584-7 s Mikroelektronik (DE-588)4039207-7 s Einspruch, Norman G. Sonstige oth (DE-604)BV009495884 8 |
| spellingShingle | VLSI electronics, microstructure science Plasmastrahlbearbeitung (DE-588)4136199-4 gnd Plasmaätzen (DE-588)4174821-9 gnd Sputtern (DE-588)4182614-0 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Mikroelektronik (DE-588)4039207-7 gnd VLSI (DE-588)4117388-0 gnd Plasmatechnik (DE-588)4140353-8 gnd |
| subject_GND | (DE-588)4136199-4 (DE-588)4174821-9 (DE-588)4182614-0 (DE-588)4191584-7 (DE-588)4039207-7 (DE-588)4117388-0 (DE-588)4140353-8 |
| title | VLSI electronics, microstructure science |
| title_auth | VLSI electronics, microstructure science |
| title_exact_search | VLSI electronics, microstructure science |
| title_exact_search_txtP | VLSI electronics, microstructure science |
| title_full | VLSI electronics, microstructure science 8 Plasma processing for VLSI ed. by Norman G. Einspruch |
| title_fullStr | VLSI electronics, microstructure science 8 Plasma processing for VLSI ed. by Norman G. Einspruch |
| title_full_unstemmed | VLSI electronics, microstructure science 8 Plasma processing for VLSI ed. by Norman G. Einspruch |
| title_short | VLSI electronics, microstructure science |
| title_sort | vlsi electronics microstructure science plasma processing for vlsi |
| topic | Plasmastrahlbearbeitung (DE-588)4136199-4 gnd Plasmaätzen (DE-588)4174821-9 gnd Sputtern (DE-588)4182614-0 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Mikroelektronik (DE-588)4039207-7 gnd VLSI (DE-588)4117388-0 gnd Plasmatechnik (DE-588)4140353-8 gnd |
| topic_facet | Plasmastrahlbearbeitung Plasmaätzen Sputtern Lithografie Halbleitertechnologie Mikroelektronik VLSI Plasmatechnik |
| volume_link | (DE-604)BV009495884 |
| work_keys_str_mv | AT einspruchnormang vlsielectronicsmicrostructurescience8 |