Ultra clean processing of silicon surfaces V: proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002
Gespeichert in:
Format: | Tagungsbericht Buch |
---|---|
Sprache: | English |
Veröffentlicht: |
Uetikon-Zürich
Scitec Publ.
2003
|
Schriftenreihe: | Diffusion and defect data
B, Solid state phenomena ; 92 |
Schlagworte: | |
Beschreibung: | Literaturangaben. -Falsche Kongreßzählung auf dem Titelblatt |
Beschreibung: | XIII, 311 S. Ill., graph. Darst. |
ISBN: | 3908450780 |
Internformat
MARC
LEADER | 00000nam a2200000zcb4500 | ||
---|---|---|---|
001 | BV022029402 | ||
003 | DE-604 | ||
005 | 20110722 | ||
007 | t | ||
008 | 030617s2003 ad|| |||| 10||| eng d | ||
020 | |a 3908450780 |9 3-908450-78-0 | ||
035 | |a (OCoLC)635317778 | ||
035 | |a (DE-599)BVBBV022029402 | ||
040 | |a DE-604 |b ger | ||
041 | 0 | |a eng | |
049 | |a DE-706 | ||
245 | 1 | 0 | |a Ultra clean processing of silicon surfaces V |b proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002 |
264 | 1 | |a Uetikon-Zürich |b Scitec Publ. |c 2003 | |
300 | |a XIII, 311 S. |b Ill., graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 1 | |a Diffusion and defect data : B, Solid state phenomena |v 92 | |
500 | |a Literaturangaben. -Falsche Kongreßzählung auf dem Titelblatt | ||
650 | 0 | 7 | |a Oberflächenreinigung |0 (DE-588)4204243-4 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Silicium |0 (DE-588)4077445-4 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Reinraumtechnik |0 (DE-588)4177592-2 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Halbleiter |0 (DE-588)4022993-2 |2 gnd |9 rswk-swf |
655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |2 gnd-content | |
689 | 0 | 0 | |a Halbleiter |0 (DE-588)4022993-2 |D s |
689 | 0 | |5 DE-604 | |
689 | 1 | 0 | |a Silicium |0 (DE-588)4077445-4 |D s |
689 | 1 | |5 DE-604 | |
689 | 2 | 0 | |a Reinraumtechnik |0 (DE-588)4177592-2 |D s |
689 | 2 | |5 DE-604 | |
689 | 3 | 0 | |a Oberflächenreinigung |0 (DE-588)4204243-4 |D s |
689 | 3 | |5 DE-604 | |
700 | 1 | |a Heyns, Marc |e Sonstige |4 oth | |
711 | 2 | |a International Symposium on Ultra Clean Processing of Silicon Surfaces |n 6 |d 2002 |c Ostende |j Sonstige |0 (DE-588)6088689-4 |4 oth | |
830 | 0 | |a Diffusion and defect data |v B, Solid state phenomena ; 92 |w (DE-604)BV021637351 |9 92 | |
999 | |a oai:aleph.bib-bvb.de:BVB01-015244050 |
Datensatz im Suchindex
_version_ | 1804136003478224896 |
---|---|
adam_txt | |
any_adam_object | |
any_adam_object_boolean | |
building | Verbundindex |
bvnumber | BV022029402 |
ctrlnum | (OCoLC)635317778 (DE-599)BVBBV022029402 |
format | Conference Proceeding Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01865nam a2200457zcb4500</leader><controlfield tag="001">BV022029402</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20110722 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">030617s2003 ad|| |||| 10||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">3908450780</subfield><subfield code="9">3-908450-78-0</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)635317778</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV022029402</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-706</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Ultra clean processing of silicon surfaces V</subfield><subfield code="b">proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Uetikon-Zürich</subfield><subfield code="b">Scitec Publ.</subfield><subfield code="c">2003</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XIII, 311 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Diffusion and defect data : B, Solid state phenomena</subfield><subfield code="v">92</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Literaturangaben. -Falsche Kongreßzählung auf dem Titelblatt</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Oberflächenreinigung</subfield><subfield code="0">(DE-588)4204243-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Reinraumtechnik</subfield><subfield code="0">(DE-588)4177592-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Halbleiter</subfield><subfield code="0">(DE-588)4022993-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Halbleiter</subfield><subfield code="0">(DE-588)4022993-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Reinraumtechnik</subfield><subfield code="0">(DE-588)4177592-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="3" ind2="0"><subfield code="a">Oberflächenreinigung</subfield><subfield code="0">(DE-588)4204243-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Heyns, Marc</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="711" ind1="2" ind2=" "><subfield code="a">International Symposium on Ultra Clean Processing of Silicon Surfaces</subfield><subfield code="n">6</subfield><subfield code="d">2002</subfield><subfield code="c">Ostende</subfield><subfield code="j">Sonstige</subfield><subfield code="0">(DE-588)6088689-4</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Diffusion and defect data</subfield><subfield code="v">B, Solid state phenomena ; 92</subfield><subfield code="w">(DE-604)BV021637351</subfield><subfield code="9">92</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-015244050</subfield></datafield></record></collection> |
genre | (DE-588)1071861417 Konferenzschrift gnd-content |
genre_facet | Konferenzschrift |
id | DE-604.BV022029402 |
illustrated | Illustrated |
index_date | 2024-07-02T16:12:32Z |
indexdate | 2024-07-09T20:49:29Z |
institution | BVB |
institution_GND | (DE-588)6088689-4 |
isbn | 3908450780 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-015244050 |
oclc_num | 635317778 |
open_access_boolean | |
owner | DE-706 |
owner_facet | DE-706 |
physical | XIII, 311 S. Ill., graph. Darst. |
publishDate | 2003 |
publishDateSearch | 2003 |
publishDateSort | 2003 |
publisher | Scitec Publ. |
record_format | marc |
series | Diffusion and defect data |
series2 | Diffusion and defect data : B, Solid state phenomena |
spelling | Ultra clean processing of silicon surfaces V proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002 Uetikon-Zürich Scitec Publ. 2003 XIII, 311 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Diffusion and defect data : B, Solid state phenomena 92 Literaturangaben. -Falsche Kongreßzählung auf dem Titelblatt Oberflächenreinigung (DE-588)4204243-4 gnd rswk-swf Silicium (DE-588)4077445-4 gnd rswk-swf Reinraumtechnik (DE-588)4177592-2 gnd rswk-swf Halbleiter (DE-588)4022993-2 gnd rswk-swf (DE-588)1071861417 Konferenzschrift gnd-content Halbleiter (DE-588)4022993-2 s DE-604 Silicium (DE-588)4077445-4 s Reinraumtechnik (DE-588)4177592-2 s Oberflächenreinigung (DE-588)4204243-4 s Heyns, Marc Sonstige oth International Symposium on Ultra Clean Processing of Silicon Surfaces 6 2002 Ostende Sonstige (DE-588)6088689-4 oth Diffusion and defect data B, Solid state phenomena ; 92 (DE-604)BV021637351 92 |
spellingShingle | Ultra clean processing of silicon surfaces V proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002 Diffusion and defect data Oberflächenreinigung (DE-588)4204243-4 gnd Silicium (DE-588)4077445-4 gnd Reinraumtechnik (DE-588)4177592-2 gnd Halbleiter (DE-588)4022993-2 gnd |
subject_GND | (DE-588)4204243-4 (DE-588)4077445-4 (DE-588)4177592-2 (DE-588)4022993-2 (DE-588)1071861417 |
title | Ultra clean processing of silicon surfaces V proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002 |
title_auth | Ultra clean processing of silicon surfaces V proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002 |
title_exact_search | Ultra clean processing of silicon surfaces V proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002 |
title_exact_search_txtP | Ultra clean processing of silicon surfaces V proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002 |
title_full | Ultra clean processing of silicon surfaces V proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002 |
title_fullStr | Ultra clean processing of silicon surfaces V proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002 |
title_full_unstemmed | Ultra clean processing of silicon surfaces V proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002 |
title_short | Ultra clean processing of silicon surfaces V |
title_sort | ultra clean processing of silicon surfaces v proceedings of the fifth international symposium on ultra clean processing of silicon surfaces ucpss 2002 held in ostend belgium september 2002 |
title_sub | proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002) ; held in Ostend, Belgium, September 2002 |
topic | Oberflächenreinigung (DE-588)4204243-4 gnd Silicium (DE-588)4077445-4 gnd Reinraumtechnik (DE-588)4177592-2 gnd Halbleiter (DE-588)4022993-2 gnd |
topic_facet | Oberflächenreinigung Silicium Reinraumtechnik Halbleiter Konferenzschrift |
volume_link | (DE-604)BV021637351 |
work_keys_str_mv | AT heynsmarc ultracleanprocessingofsiliconsurfacesvproceedingsofthefifthinternationalsymposiumonultracleanprocessingofsiliconsurfacesucpss2002heldinostendbelgiumseptember2002 AT internationalsymposiumonultracleanprocessingofsiliconsurfacesostende ultracleanprocessingofsiliconsurfacesvproceedingsofthefifthinternationalsymposiumonultracleanprocessingofsiliconsurfacesucpss2002heldinostendbelgiumseptember2002 |