Electron-beam technology in microelectronic fabrication:
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
New York [u.a.]
Acad. Press
1980
|
| Ausgabe: | 1. print. |
| Schlagworte: | |
| Beschreibung: | 362 S. |
| ISBN: | 012133550X |
Internformat
MARC
| LEADER | 00000nam a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV021920208 | ||
| 003 | DE-604 | ||
| 005 | 20040301000000.0 | ||
| 007 | t | ||
| 008 | 940913s1980 |||| 00||| eng d | ||
| 020 | |a 012133550X |9 0-12-133550-X | ||
| 035 | |a (OCoLC)6223500 | ||
| 035 | |a (DE-599)BVBBV021920208 | ||
| 040 | |a DE-604 |b ger | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-706 | ||
| 050 | 0 | |a TK7874 | |
| 082 | 0 | |a 621.381/7 |2 19 | |
| 245 | 1 | 0 | |a Electron-beam technology in microelectronic fabrication |c ed. by George R. Brewer |
| 250 | |a 1. print. | ||
| 264 | 1 | |a New York [u.a.] |b Acad. Press |c 1980 | |
| 300 | |a 362 S. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 650 | 4 | |a Lithographie par faisceau d'électrons | |
| 650 | 4 | |a Microélectronique | |
| 650 | 4 | |a Lithography, Electron beam | |
| 650 | 4 | |a Microelectronics | |
| 650 | 0 | 7 | |a Mikroelektronik |0 (DE-588)4039207-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Mikroelektronik |0 (DE-588)4039207-7 |D s |
| 689 | 0 | 1 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |D s |
| 689 | 0 | |8 1\p |5 DE-604 | |
| 689 | 1 | 0 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |D s |
| 689 | 1 | |5 DE-604 | |
| 700 | 1 | |a Brewer, George R. |e Sonstige |4 oth | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-015135370 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
Datensatz im Suchindex
| _version_ | 1804135873130790912 |
|---|---|
| adam_txt | |
| any_adam_object | |
| any_adam_object_boolean | |
| building | Verbundindex |
| bvnumber | BV021920208 |
| callnumber-first | T - Technology |
| callnumber-label | TK7874 |
| callnumber-raw | TK7874 |
| callnumber-search | TK7874 |
| callnumber-sort | TK 47874 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| ctrlnum | (OCoLC)6223500 (DE-599)BVBBV021920208 |
| dewey-full | 621.381/7 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/7 |
| dewey-search | 621.381/7 |
| dewey-sort | 3621.381 17 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| discipline_str_mv | Elektrotechnik / Elektronik / Nachrichtentechnik |
| edition | 1. print. |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01424nam a2200433zc 4500</leader><controlfield tag="001">BV021920208</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20040301000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">940913s1980 |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">012133550X</subfield><subfield code="9">0-12-133550-X</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)6223500</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV021920208</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-706</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7874</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.381/7</subfield><subfield code="2">19</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Electron-beam technology in microelectronic fabrication</subfield><subfield code="c">ed. by George R. Brewer</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">1. print.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York [u.a.]</subfield><subfield code="b">Acad. Press</subfield><subfield code="c">1980</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">362 S.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithographie par faisceau d'électrons</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microélectronique</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithography, Electron beam</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microelectronics</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Brewer, George R.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-015135370</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield></record></collection> |
| id | DE-604.BV021920208 |
| illustrated | Not Illustrated |
| index_date | 2024-07-02T16:05:42Z |
| indexdate | 2024-07-09T20:47:25Z |
| institution | BVB |
| isbn | 012133550X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-015135370 |
| oclc_num | 6223500 |
| open_access_boolean | |
| owner | DE-706 |
| owner_facet | DE-706 |
| physical | 362 S. |
| publishDate | 1980 |
| publishDateSearch | 1980 |
| publishDateSort | 1980 |
| publisher | Acad. Press |
| record_format | marc |
| spelling | Electron-beam technology in microelectronic fabrication ed. by George R. Brewer 1. print. New York [u.a.] Acad. Press 1980 362 S. txt rdacontent n rdamedia nc rdacarrier Lithographie par faisceau d'électrons Microélectronique Lithography, Electron beam Microelectronics Mikroelektronik (DE-588)4039207-7 gnd rswk-swf Elektronenstrahllithografie (DE-588)4151897-4 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 s Elektronenstrahllithografie (DE-588)4151897-4 s 1\p DE-604 DE-604 Brewer, George R. Sonstige oth 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Electron-beam technology in microelectronic fabrication Lithographie par faisceau d'électrons Microélectronique Lithography, Electron beam Microelectronics Mikroelektronik (DE-588)4039207-7 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd |
| subject_GND | (DE-588)4039207-7 (DE-588)4151897-4 |
| title | Electron-beam technology in microelectronic fabrication |
| title_auth | Electron-beam technology in microelectronic fabrication |
| title_exact_search | Electron-beam technology in microelectronic fabrication |
| title_exact_search_txtP | Electron-beam technology in microelectronic fabrication |
| title_full | Electron-beam technology in microelectronic fabrication ed. by George R. Brewer |
| title_fullStr | Electron-beam technology in microelectronic fabrication ed. by George R. Brewer |
| title_full_unstemmed | Electron-beam technology in microelectronic fabrication ed. by George R. Brewer |
| title_short | Electron-beam technology in microelectronic fabrication |
| title_sort | electron beam technology in microelectronic fabrication |
| topic | Lithographie par faisceau d'électrons Microélectronique Lithography, Electron beam Microelectronics Mikroelektronik (DE-588)4039207-7 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd |
| topic_facet | Lithographie par faisceau d'électrons Microélectronique Lithography, Electron beam Microelectronics Mikroelektronik Elektronenstrahllithografie |
| work_keys_str_mv | AT brewergeorger electronbeamtechnologyinmicroelectronicfabrication |