Holdings: Chemical vapor deposition for microelectronics

Chemical vapor deposition for microelectronics: principles, technology, and applications

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Bibliographic Details
Main Author:	Sherman, Arthur (Author)
Format:	Book
Language:	English
Published:	Park Ridge, NJ Noyes 1987
Edition:	5. print.
Series:	Materials science and process technology series
Subjects:	Integrated circuits > Design and construction Vapor-plating Elektronische Schaltung Mikroelektronik Aufdampfen CVD-Verfahren
Physical Description:	XI, 215 S.
ISBN:	0815511361

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MARC


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dewey-tens	620 - Engineering and allied operations
discipline	Physik Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik
discipline_str_mv	Physik Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik
edition	5. print.
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illustrated	Not Illustrated
index_date	2024-07-02T16:05:41Z
indexdate	2024-07-09T20:47:24Z
institution	BVB
isbn	0815511361
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-015134824
oclc_num	15657978
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owner	DE-706
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physical	XI, 215 S.
publishDate	1987
publishDateSearch	1987
publishDateSort	1987
publisher	Noyes
record_format	marc
series2	Materials science and process technology series
spelling	Sherman, Arthur Verfasser aut Chemical vapor deposition for microelectronics principles, technology, and applications 5. print. Park Ridge, NJ Noyes 1987 XI, 215 S. txt rdacontent n rdamedia nc rdacarrier Materials science and process technology series Integrated circuits Design and construction Vapor-plating Elektronische Schaltung (DE-588)4113419-9 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf Aufdampfen (DE-588)4143379-8 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Aufdampfen (DE-588)4143379-8 s Mikroelektronik (DE-588)4039207-7 s 1\p DE-604 CVD-Verfahren (DE-588)4009846-1 s 2\p DE-604 Elektronische Schaltung (DE-588)4113419-9 s 3\p DE-604 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk
spellingShingle	Sherman, Arthur Chemical vapor deposition for microelectronics principles, technology, and applications Integrated circuits Design and construction Vapor-plating Elektronische Schaltung (DE-588)4113419-9 gnd Mikroelektronik (DE-588)4039207-7 gnd Aufdampfen (DE-588)4143379-8 gnd CVD-Verfahren (DE-588)4009846-1 gnd
subject_GND	(DE-588)4113419-9 (DE-588)4039207-7 (DE-588)4143379-8 (DE-588)4009846-1
title	Chemical vapor deposition for microelectronics principles, technology, and applications
title_auth	Chemical vapor deposition for microelectronics principles, technology, and applications
title_exact_search	Chemical vapor deposition for microelectronics principles, technology, and applications
title_exact_search_txtP	Chemical vapor deposition for microelectronics principles, technology, and applications
title_full	Chemical vapor deposition for microelectronics principles, technology, and applications
title_fullStr	Chemical vapor deposition for microelectronics principles, technology, and applications
title_full_unstemmed	Chemical vapor deposition for microelectronics principles, technology, and applications
title_short	Chemical vapor deposition for microelectronics
title_sort	chemical vapor deposition for microelectronics principles technology and applications
title_sub	principles, technology, and applications
topic	Integrated circuits Design and construction Vapor-plating Elektronische Schaltung (DE-588)4113419-9 gnd Mikroelektronik (DE-588)4039207-7 gnd Aufdampfen (DE-588)4143379-8 gnd CVD-Verfahren (DE-588)4009846-1 gnd
topic_facet	Integrated circuits Design and construction Vapor-plating Elektronische Schaltung Mikroelektronik Aufdampfen CVD-Verfahren
work_keys_str_mv	AT shermanarthur chemicalvapordepositionformicroelectronicsprinciplestechnologyandapplications

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