Chemical vapor deposition for microelectronics: principles, technology, and applications
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Park Ridge, NJ
Noyes
1987
|
| Ausgabe: | 5. print. |
| Schriftenreihe: | Materials science and process technology series
|
| Schlagworte: | |
| Beschreibung: | XI, 215 S. |
| ISBN: | 0815511361 |
Internformat
MARC
| LEADER | 00000nam a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV021919661 | ||
| 003 | DE-604 | ||
| 005 | 20040301000000.0 | ||
| 007 | t | ||
| 008 | 940811s1987 |||| 00||| eng d | ||
| 020 | |a 0815511361 |9 0-8155-1136-1 | ||
| 035 | |a (OCoLC)15657978 | ||
| 035 | |a (DE-599)BVBBV021919661 | ||
| 040 | |a DE-604 |b ger | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-706 | ||
| 050 | 0 | |a TS695 | |
| 082 | 0 | |a 621.381/7 |2 19 | |
| 084 | |a UP 7550 |0 (DE-625)146434: |2 rvk | ||
| 084 | |a ZM 7680 |0 (DE-625)160562: |2 rvk | ||
| 100 | 1 | |a Sherman, Arthur |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Chemical vapor deposition for microelectronics |b principles, technology, and applications |
| 250 | |a 5. print. | ||
| 264 | 1 | |a Park Ridge, NJ |b Noyes |c 1987 | |
| 300 | |a XI, 215 S. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Materials science and process technology series | |
| 650 | 4 | |a Integrated circuits |x Design and construction | |
| 650 | 4 | |a Vapor-plating | |
| 650 | 0 | 7 | |a Elektronische Schaltung |0 (DE-588)4113419-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Mikroelektronik |0 (DE-588)4039207-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Aufdampfen |0 (DE-588)4143379-8 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a CVD-Verfahren |0 (DE-588)4009846-1 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Aufdampfen |0 (DE-588)4143379-8 |D s |
| 689 | 0 | 1 | |a Mikroelektronik |0 (DE-588)4039207-7 |D s |
| 689 | 0 | |8 1\p |5 DE-604 | |
| 689 | 1 | 0 | |a CVD-Verfahren |0 (DE-588)4009846-1 |D s |
| 689 | 1 | 1 | |a Mikroelektronik |0 (DE-588)4039207-7 |D s |
| 689 | 1 | |8 2\p |5 DE-604 | |
| 689 | 2 | 0 | |a CVD-Verfahren |0 (DE-588)4009846-1 |D s |
| 689 | 2 | 1 | |a Elektronische Schaltung |0 (DE-588)4113419-9 |D s |
| 689 | 2 | |8 3\p |5 DE-604 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-015134824 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 883 | 1 | |8 2\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 883 | 1 | |8 3\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
Datensatz im Suchindex
| _version_ | 1804135872360087552 |
|---|---|
| adam_txt | |
| any_adam_object | |
| any_adam_object_boolean | |
| author | Sherman, Arthur |
| author_facet | Sherman, Arthur |
| author_role | aut |
| author_sort | Sherman, Arthur |
| author_variant | a s as |
| building | Verbundindex |
| bvnumber | BV021919661 |
| callnumber-first | T - Technology |
| callnumber-label | TS695 |
| callnumber-raw | TS695 |
| callnumber-search | TS695 |
| callnumber-sort | TS 3695 |
| callnumber-subject | TS - Manufactures |
| classification_rvk | UP 7550 ZM 7680 |
| ctrlnum | (OCoLC)15657978 (DE-599)BVBBV021919661 |
| dewey-full | 621.381/7 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/7 |
| dewey-search | 621.381/7 |
| dewey-sort | 3621.381 17 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik |
| discipline_str_mv | Physik Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik |
| edition | 5. print. |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01972nam a2200541zc 4500</leader><controlfield tag="001">BV021919661</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20040301000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">940811s1987 |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0815511361</subfield><subfield code="9">0-8155-1136-1</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)15657978</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV021919661</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-706</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TS695</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.381/7</subfield><subfield code="2">19</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 7550</subfield><subfield code="0">(DE-625)146434:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZM 7680</subfield><subfield code="0">(DE-625)160562:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Sherman, Arthur</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Chemical vapor deposition for microelectronics</subfield><subfield code="b">principles, technology, and applications</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">5. print.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Park Ridge, NJ</subfield><subfield code="b">Noyes</subfield><subfield code="c">1987</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XI, 215 S.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Materials science and process technology series</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits</subfield><subfield code="x">Design and construction</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Vapor-plating</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Elektronische Schaltung</subfield><subfield code="0">(DE-588)4113419-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Aufdampfen</subfield><subfield code="0">(DE-588)4143379-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Aufdampfen</subfield><subfield code="0">(DE-588)4143379-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="1"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2="1"><subfield code="a">Elektronische Schaltung</subfield><subfield code="0">(DE-588)4113419-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="8">3\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-015134824</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">3\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield></record></collection> |
| id | DE-604.BV021919661 |
| illustrated | Not Illustrated |
| index_date | 2024-07-02T16:05:41Z |
| indexdate | 2024-07-09T20:47:24Z |
| institution | BVB |
| isbn | 0815511361 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-015134824 |
| oclc_num | 15657978 |
| open_access_boolean | |
| owner | DE-706 |
| owner_facet | DE-706 |
| physical | XI, 215 S. |
| publishDate | 1987 |
| publishDateSearch | 1987 |
| publishDateSort | 1987 |
| publisher | Noyes |
| record_format | marc |
| series2 | Materials science and process technology series |
| spelling | Sherman, Arthur Verfasser aut Chemical vapor deposition for microelectronics principles, technology, and applications 5. print. Park Ridge, NJ Noyes 1987 XI, 215 S. txt rdacontent n rdamedia nc rdacarrier Materials science and process technology series Integrated circuits Design and construction Vapor-plating Elektronische Schaltung (DE-588)4113419-9 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf Aufdampfen (DE-588)4143379-8 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Aufdampfen (DE-588)4143379-8 s Mikroelektronik (DE-588)4039207-7 s 1\p DE-604 CVD-Verfahren (DE-588)4009846-1 s 2\p DE-604 Elektronische Schaltung (DE-588)4113419-9 s 3\p DE-604 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Sherman, Arthur Chemical vapor deposition for microelectronics principles, technology, and applications Integrated circuits Design and construction Vapor-plating Elektronische Schaltung (DE-588)4113419-9 gnd Mikroelektronik (DE-588)4039207-7 gnd Aufdampfen (DE-588)4143379-8 gnd CVD-Verfahren (DE-588)4009846-1 gnd |
| subject_GND | (DE-588)4113419-9 (DE-588)4039207-7 (DE-588)4143379-8 (DE-588)4009846-1 |
| title | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_auth | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_exact_search | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_exact_search_txtP | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_full | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_fullStr | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_full_unstemmed | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_short | Chemical vapor deposition for microelectronics |
| title_sort | chemical vapor deposition for microelectronics principles technology and applications |
| title_sub | principles, technology, and applications |
| topic | Integrated circuits Design and construction Vapor-plating Elektronische Schaltung (DE-588)4113419-9 gnd Mikroelektronik (DE-588)4039207-7 gnd Aufdampfen (DE-588)4143379-8 gnd CVD-Verfahren (DE-588)4009846-1 gnd |
| topic_facet | Integrated circuits Design and construction Vapor-plating Elektronische Schaltung Mikroelektronik Aufdampfen CVD-Verfahren |
| work_keys_str_mv | AT shermanarthur chemicalvapordepositionformicroelectronicsprinciplestechnologyandapplications |