Handbook of sputter deposition technology: principles, technology and applications
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Park Ridge, NJ
Noyes
1992
|
| Ausgabe: | 2. print. |
| Schlagworte: | |
| Beschreibung: | XII, 304 S. |
| ISBN: | 0815512805 |
Internformat
MARC
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| 245 | 1 | 0 | |a Handbook of sputter deposition technology |b principles, technology and applications |
| 250 | |a 2. print. | ||
| 264 | 1 | |a Park Ridge, NJ |b Noyes |c 1992 | |
| 300 | |a XII, 304 S. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 650 | 7 | |a Materiais e dispositivos semicondutores |2 larpcal | |
| 650 | 4 | |a Cathode sputtering (Plating process) | |
| 650 | 4 | |a Thin films | |
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| 650 | 0 | 7 | |a Dünne Schicht |0 (DE-588)4136925-7 |2 gnd |9 rswk-swf |
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Datensatz im Suchindex
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| building | Verbundindex |
| bvnumber | BV021919639 |
| callnumber-first | T - Technology |
| callnumber-label | TS695 |
| callnumber-raw | TS695 |
| callnumber-search | TS695 |
| callnumber-sort | TS 3695 |
| callnumber-subject | TS - Manufactures |
| classification_rvk | UP 7550 ZM 7620 |
| ctrlnum | (OCoLC)22953508 (DE-599)BVBBV021919639 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik |
| discipline_str_mv | Physik Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik |
| edition | 2. print. |
| format | Book |
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| id | DE-604.BV021919639 |
| illustrated | Not Illustrated |
| index_date | 2024-07-02T16:05:41Z |
| indexdate | 2024-07-09T20:47:24Z |
| institution | BVB |
| isbn | 0815512805 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-015134802 |
| oclc_num | 22953508 |
| open_access_boolean | |
| owner | DE-706 |
| owner_facet | DE-706 |
| physical | XII, 304 S. |
| publishDate | 1992 |
| publishDateSearch | 1992 |
| publishDateSort | 1992 |
| publisher | Noyes |
| record_format | marc |
| spelling | Handbook of sputter deposition technology principles, technology and applications 2. print. Park Ridge, NJ Noyes 1992 XII, 304 S. txt rdacontent n rdamedia nc rdacarrier Materiais e dispositivos semicondutores larpcal Cathode sputtering (Plating process) Thin films Zerstäubung (DE-588)4067687-0 gnd rswk-swf Beschichten (DE-588)4005996-0 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf Kathode (DE-588)4163451-2 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 s DE-604 Zerstäubung (DE-588)4067687-0 s Dünne Schicht (DE-588)4136925-7 s Kathode (DE-588)4163451-2 s Sputtern (DE-588)4182614-0 s Beschichten (DE-588)4005996-0 s 1\p DE-604 Dünnschichttechnik (DE-588)4136339-5 s 2\p DE-604 Wasa, Kiyotaka Sonstige oth 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Handbook of sputter deposition technology principles, technology and applications Materiais e dispositivos semicondutores larpcal Cathode sputtering (Plating process) Thin films Zerstäubung (DE-588)4067687-0 gnd Beschichten (DE-588)4005996-0 gnd Mikroelektronik (DE-588)4039207-7 gnd Kathode (DE-588)4163451-2 gnd Sputtern (DE-588)4182614-0 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Dünne Schicht (DE-588)4136925-7 gnd |
| subject_GND | (DE-588)4067687-0 (DE-588)4005996-0 (DE-588)4039207-7 (DE-588)4163451-2 (DE-588)4182614-0 (DE-588)4136339-5 (DE-588)4136925-7 |
| title | Handbook of sputter deposition technology principles, technology and applications |
| title_auth | Handbook of sputter deposition technology principles, technology and applications |
| title_exact_search | Handbook of sputter deposition technology principles, technology and applications |
| title_exact_search_txtP | Handbook of sputter deposition technology principles, technology and applications |
| title_full | Handbook of sputter deposition technology principles, technology and applications |
| title_fullStr | Handbook of sputter deposition technology principles, technology and applications |
| title_full_unstemmed | Handbook of sputter deposition technology principles, technology and applications |
| title_short | Handbook of sputter deposition technology |
| title_sort | handbook of sputter deposition technology principles technology and applications |
| title_sub | principles, technology and applications |
| topic | Materiais e dispositivos semicondutores larpcal Cathode sputtering (Plating process) Thin films Zerstäubung (DE-588)4067687-0 gnd Beschichten (DE-588)4005996-0 gnd Mikroelektronik (DE-588)4039207-7 gnd Kathode (DE-588)4163451-2 gnd Sputtern (DE-588)4182614-0 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Dünne Schicht (DE-588)4136925-7 gnd |
| topic_facet | Materiais e dispositivos semicondutores Cathode sputtering (Plating process) Thin films Zerstäubung Beschichten Mikroelektronik Kathode Sputtern Dünnschichttechnik Dünne Schicht |
| work_keys_str_mv | AT wasakiyotaka handbookofsputterdepositiontechnologyprinciplestechnologyandapplications |