Handbook of plasma processing technology: fundamentals, etching, deposition, and surface interactions
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Park Ridge, NJ
Noyes
1990
|
| Ausgabe: | 2.print. |
| Schlagworte: | |
| Beschreibung: | XXIII, 523 S. |
| ISBN: | 0815512201 |
Internformat
MARC
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| 245 | 1 | 0 | |a Handbook of plasma processing technology |b fundamentals, etching, deposition, and surface interactions |
| 250 | |a 2.print. | ||
| 264 | 1 | |a Park Ridge, NJ |b Noyes |c 1990 | |
| 300 | |a XXIII, 523 S. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 650 | 4 | |a Ingeniería del plasma | |
| 650 | 4 | |a Plasma - Erosión selectiva | |
| 650 | 4 | |a Semiconductores - Ataque químico | |
| 650 | 4 | |a Plasma engineering | |
| 650 | 4 | |a Plasma etching | |
| 650 | 4 | |a Semiconductors |x Etching | |
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| 700 | 1 | |a Rossnagel, Stephen M. |e Sonstige |4 oth | |
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Datensatz im Suchindex
| _version_ | 1804135859682803712 |
|---|---|
| adam_txt | |
| any_adam_object | |
| any_adam_object_boolean | |
| building | Verbundindex |
| bvnumber | BV021910173 |
| callnumber-first | T - Technology |
| callnumber-label | TA2020 |
| callnumber-raw | TA2020 |
| callnumber-search | TA2020 |
| callnumber-sort | TA 42020 |
| callnumber-subject | TA - General and Civil Engineering |
| classification_rvk | ZM 7680 |
| ctrlnum | (OCoLC)53783848 (DE-599)BVBBV021910173 |
| discipline | Werkstoffwissenschaften / Fertigungstechnik |
| discipline_str_mv | Werkstoffwissenschaften / Fertigungstechnik |
| edition | 2.print. |
| format | Book |
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| id | DE-604.BV021910173 |
| illustrated | Not Illustrated |
| index_date | 2024-07-02T16:05:12Z |
| indexdate | 2024-07-09T20:47:12Z |
| institution | BVB |
| isbn | 0815512201 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-015125348 |
| oclc_num | 53783848 |
| open_access_boolean | |
| owner | DE-706 |
| owner_facet | DE-706 |
| physical | XXIII, 523 S. |
| publishDate | 1990 |
| publishDateSearch | 1990 |
| publishDateSort | 1990 |
| publisher | Noyes |
| record_format | marc |
| spelling | Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions 2.print. Park Ridge, NJ Noyes 1990 XXIII, 523 S. txt rdacontent n rdamedia nc rdacarrier Ingeniería del plasma Plasma - Erosión selectiva Semiconductores - Ataque químico Plasma engineering Plasma etching Semiconductors Etching Plasmastrahlbearbeitung (DE-588)4136199-4 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf Halbleiter (DE-588)4022993-2 gnd rswk-swf Ätzen (DE-588)4000648-7 gnd rswk-swf Plasma (DE-588)4046249-3 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 gnd rswk-swf Ätzen (DE-588)4000648-7 s DE-604 Plasma (DE-588)4046249-3 s Dünnschichttechnik (DE-588)4136339-5 s Halbleiter (DE-588)4022993-2 s Plasmastrahlbearbeitung (DE-588)4136199-4 s 1\p DE-604 Plasmatechnik (DE-588)4140353-8 s 2\p DE-604 Sputtern (DE-588)4182614-0 s 3\p DE-604 Plasmaätzen (DE-588)4174821-9 s 4\p DE-604 Rossnagel, Stephen M. Sonstige oth 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 4\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions Ingeniería del plasma Plasma - Erosión selectiva Semiconductores - Ataque químico Plasma engineering Plasma etching Semiconductors Etching Plasmastrahlbearbeitung (DE-588)4136199-4 gnd Sputtern (DE-588)4182614-0 gnd Plasmaätzen (DE-588)4174821-9 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Halbleiter (DE-588)4022993-2 gnd Ätzen (DE-588)4000648-7 gnd Plasma (DE-588)4046249-3 gnd Plasmatechnik (DE-588)4140353-8 gnd |
| subject_GND | (DE-588)4136199-4 (DE-588)4182614-0 (DE-588)4174821-9 (DE-588)4136339-5 (DE-588)4022993-2 (DE-588)4000648-7 (DE-588)4046249-3 (DE-588)4140353-8 |
| title | Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions |
| title_auth | Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions |
| title_exact_search | Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions |
| title_exact_search_txtP | Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions |
| title_full | Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions |
| title_fullStr | Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions |
| title_full_unstemmed | Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions |
| title_short | Handbook of plasma processing technology |
| title_sort | handbook of plasma processing technology fundamentals etching deposition and surface interactions |
| title_sub | fundamentals, etching, deposition, and surface interactions |
| topic | Ingeniería del plasma Plasma - Erosión selectiva Semiconductores - Ataque químico Plasma engineering Plasma etching Semiconductors Etching Plasmastrahlbearbeitung (DE-588)4136199-4 gnd Sputtern (DE-588)4182614-0 gnd Plasmaätzen (DE-588)4174821-9 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Halbleiter (DE-588)4022993-2 gnd Ätzen (DE-588)4000648-7 gnd Plasma (DE-588)4046249-3 gnd Plasmatechnik (DE-588)4140353-8 gnd |
| topic_facet | Ingeniería del plasma Plasma - Erosión selectiva Semiconductores - Ataque químico Plasma engineering Plasma etching Semiconductors Etching Plasmastrahlbearbeitung Sputtern Plasmaätzen Dünnschichttechnik Halbleiter Ätzen Plasma Plasmatechnik |
| work_keys_str_mv | AT rossnagelstephenm handbookofplasmaprocessingtechnologyfundamentalsetchingdepositionandsurfaceinteractions |