Structure evolution, properties, and application of alumina films deposited by PECVD:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Abschlussarbeit Buch |
| Sprache: | English |
| Veröffentlicht: |
Aachen
Shaker
2005
|
| Schriftenreihe: | Materials chemistry dissertation
2 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | III, 133 S. Ill., graph. Darst. 21 cm, 212 gr. |
| ISBN: | 3832241760 |
Internformat
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV021323398 | ||
| 003 | DE-604 | ||
| 005 | 20060209 | ||
| 007 | t | ||
| 008 | 060206s2005 gw ad|| m||| 00||| eng d | ||
| 015 | |a 05,N30,0617 |2 dnb | ||
| 015 | |a 05,H10,0975 |2 dnb | ||
| 016 | 7 | |a 975576100 |2 DE-101 | |
| 020 | |a 3832241760 |c kart. : EUR 45.80, sfr 91.60 |9 3-8322-4176-0 | ||
| 024 | 3 | |a 9783832241766 | |
| 035 | |a (OCoLC)76773930 | ||
| 035 | |a (DE-599)BVBBV021323398 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 044 | |a gw |c XA-DE-NW | ||
| 049 | |a DE-91 | ||
| 082 | 0 | |a 540 | |
| 084 | |a CHE 364d |2 stub | ||
| 084 | |a 540 |2 sdnb | ||
| 084 | |a WER 312d |2 stub | ||
| 100 | 1 | |a Kurapov, Denis |d 1977- |e Verfasser |0 (DE-588)130201499 |4 aut | |
| 245 | 1 | 0 | |a Structure evolution, properties, and application of alumina films deposited by PECVD |c Denis Kurapov |
| 264 | 1 | |a Aachen |b Shaker |c 2005 | |
| 300 | |a III, 133 S. |b Ill., graph. Darst. |c 21 cm, 212 gr. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Materials chemistry dissertation |v 2 | |
| 502 | |a Zugl.: Aachen, Techn. Hochsch., Diss., 2005 | ||
| 650 | 0 | 7 | |a Aluminiumoxide |0 (DE-588)4001590-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Dünne Schicht |0 (DE-588)4136925-7 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 689 | 0 | 0 | |a Aluminiumoxide |0 (DE-588)4001590-7 |D s |
| 689 | 0 | 1 | |a Dünne Schicht |0 (DE-588)4136925-7 |D s |
| 689 | 0 | 2 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |D s |
| 689 | 0 | |5 DE-604 | |
| 830 | 0 | |a Materials chemistry dissertation |v 2 |w (DE-604)BV021323383 |9 2 | |
| 856 | 4 | 2 | |m HEBIS Datenaustausch Darmstadt |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=014643764&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-014643764 | ||
Datensatz im Suchindex
| _version_ | 1804135133224108032 |
|---|---|
| adam_text | MATERIALS CHEMISTRY DISSERTATION NO.: 02 (2005) DENIS KURAPOV STRUCTURE
EVOLUTION, PROPERTIES, AND APPLICATION OF ALUMINA FILMS DEPOSITED BY
PECVD SHAKER VERLAG AACHEN 2005 TABLE OF CONTENTS TABLE OF CONTENTS 1.
INTRODUCTION 1 1.1. SCIENTIFIC BACKGROUND 1 1.2. OBJECTIVES 2 1.3.
RESEARCH STRATEGY 2 2. ALUMINA POLYMORPHS 4 3. APPLICATION POTENTIAL OF
ALUMINA 5 4. SURVEY OF THE DEPOSITION OF AL-O THIN FILMS 6 4.1. CHEMICAL
VAPOR DEPOSITION (CVD) 6 4.2. PHYSICAL VAPOR DEPOSITION (PVD) 7 4.3.
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) 10 4.4. SUMMARY 11 5.
THIN FILMS SYNTHESIS 11 5.1. GLOW DISCHARGE 12 5.2. PLASMA ENHANCED
CHEMICAL VAPOR DEPOSITION (PECVD) 13 5.3. PLASMA ASSISTED DEPOSITION OF
INSULATING COATINGS 18 6. EXPERIMENTAL 20 6.1. PECVD DEPOSITION
APPARATUS 20 6.2. OPTICAL EMISSION SPECTROSCOPY (OES) 24 6.3. METHODS
FOR THE CHARACTERIZATION OF THE FILMS CONSTITUTION 25 6.3.1. X-RAYS
PHOTOELECTRON ANALYSIS (XPS) 25 6.3.2. X-RAY DIFFRACTION (XRD) 26 6.3.3.
TRANSMISSION ELECTRON MICROSCOPY (TEM) 28 6.4. SURFACE TOPOGRAPHY
CHARACTERIZATION 28 6.4.1. ATOMIC FORCE MICROSCOPY 28 6.4.2. OPTICAL
PROFILOMETRY 29 6.5. SEM AND EDX ANALYSIS OF THE FILMS 29 6.6.
CHARACTERIZATION OF THE MECHANICAL PROPERTIES 30 6.6.1. NANOINDENTATION
30 6.6.2. EVALUATION OF TRIBOLOGICAL PROPERTIES BY TRIBOMETER 35 6.6.3.
ADHESION MEASUREMENTS BY SCRATCH TEST METHOD 36 6.7. FILM THICKNESS
MEASUREMENTS BY THE BALL CRATER METHOD 37 6.8. APPLICATION ORIENTED
INVESTIGATIONS 38 TABLE OF CONTENTS 6.8.1. THERMAL SHOCK EXPERIMENTS 38
6.8.2. HIGH TEMPERATURE COMPRESSION TEST 39 RESULTS 42 7.1. OES PLASMA
ANALYSIS 42 7.2. INFLUENCE OF THE (O2+AICI3) CONTENT IN A GAS MIXTURE ON
THE GROWTH OF ALUMINA THIN FILMS 44 7.2.1. DEPOSITION PROCESS 44 7.2.2.
OES PLASMA ANALYSIS 47 7.2.3. CHEMICAL COMPOSITION AS MEASURED BY XPS 48
7.2.4. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 50 7.2.5. TEM
INVESTIGATIONS 51 7.2.6. TOPOGRAPHY OF THE DEPOSITED FILMS 53 7.2.7.
HARDNESS AND ELASTIC MODULUS EVALUATION 55 7.3. INFLUENCE OF THE
DEPOSITION TEMPERATURE 56 7.3.1. OES PLASMA ANALYSIS 57 7.3.2. ANALYSIS
OF THE CRYSTALLOGRAPHIC STRUCTURE 58 7.3.3. TOPOGRAPHY OF THE DEPOSITED
FILMS 61 7.3.4. HARDNESS AND ELASTIC MODULUS EVALUATION 64 7.4.
INFLUENCE OF AR CONTENT IN THE GAS MIXTURE 66 7.4.1. OES PLASMA ANALYSIS
66 7.4.2. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 68 7.4.3.
TOPOGRAPHY OF THE DEPOSITED FILMS 70 7.4.4. HARDNESS AND ELASTIC MODULUS
EVALUATION 72 7.5. INFLUENCE OF THEPRESSURE 74 7.5.1. OES PLASMA
ANALYSIS 74 7.5.2. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 75 7.5.3.
TOPOGRAPHY OF THE DEPOSITED FILMS 76 7.5.4. HARDNESS AND ELASTIC MODULUS
EVALUATION 77 7.6. INFLUENCE OF THE AICI3/O2 RATIO 78 7.6.1. OES PLASMA
ANALYSIS 78 7.6.2. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 80 7.6.3.
TOPOGRAPHY OF THE DEPOSITED FILMS 83 7.6.4. HARDNESS AND ELASTIC MODULUS
EVALUATION 85 TABLE OF CONTENTS III 7.7. INFLUENCE OF THE SUBSTRATE
MATERIALS 86 7.7.1. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 86 7.7.2.
TOPOGRAPHY OF THE DEPOSITED FILMS 87 7.8. INFLUENCE OF THE TEMPLATE
LAYER 88 7.8.1. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 88 7.8.2.
TOPOGRAPHY OF THE DEPOSITED FILMS 89 7.9. APPLICATION ORIENTED
INVESTIGATIONS 90 7.9.1. ADHESIONOF THE ALUMINA FILMS 90 7.9.2.
TRIBOLOGICAL PROPERTIES 91 7.9.3. THERMAL SHOCK RESISTANCE 92 7.9.4.
BEHAVIOROF THE ALUMINA FILMS IN THE HIGH TEMPERATURE COMPRESSION TESTS
94 8. DISCUSSION 98 8.1. PLASMA-SURFACE INTERACTION 98 8.2. INFLUENCE OF
THE (O2+AICI3) CONTENT IN THE GAS MIXTURE 101 8.2.1. GROWTH OFA-AL2O 3
FILMS UNDER ION IRRADIATION 105 8.3. INFLUENCE OF THE DEPOSITION
TEMPERATURE 109 8.4. INFLUENCE OF ARGON CONTENT IN THE GAS MIXTURE 110
8.5. INFLUENCE OF THE PRESSURE 112 8.6. INFLUENCE OF AICI3/O2 RATIO 113
8.7. DEPOSITION OF ALUMINA FILMS ON DIFFERENT SUBSTRATE MATERIALS 115
8.8. TEMPLATE INFLUENCE 116 8.9. APPLICATION ORIENTED INVESTIGATIONS 117
9. SUMMARY 121 10. OUTLOOK 124 11. BIBIIOGRAPHY 125 12. ACKNOWLEDGEMENTS
133
|
| adam_txt |
MATERIALS CHEMISTRY DISSERTATION NO.: 02 (2005) DENIS KURAPOV STRUCTURE
EVOLUTION, PROPERTIES, AND APPLICATION OF ALUMINA FILMS DEPOSITED BY
PECVD SHAKER VERLAG AACHEN 2005 TABLE OF CONTENTS TABLE OF CONTENTS 1.
INTRODUCTION 1 1.1. SCIENTIFIC BACKGROUND 1 1.2. OBJECTIVES 2 1.3.
RESEARCH STRATEGY 2 2. ALUMINA POLYMORPHS 4 3. APPLICATION POTENTIAL OF
ALUMINA 5 4. SURVEY OF THE DEPOSITION OF AL-O THIN FILMS 6 4.1. CHEMICAL
VAPOR DEPOSITION (CVD) 6 4.2. PHYSICAL VAPOR DEPOSITION (PVD) 7 4.3.
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) 10 4.4. SUMMARY 11 5.
THIN FILMS SYNTHESIS 11 5.1. GLOW DISCHARGE 12 5.2. PLASMA ENHANCED
CHEMICAL VAPOR DEPOSITION (PECVD) 13 5.3. PLASMA ASSISTED DEPOSITION OF
INSULATING COATINGS 18 6. EXPERIMENTAL 20 6.1. PECVD DEPOSITION
APPARATUS 20 6.2. OPTICAL EMISSION SPECTROSCOPY (OES) 24 6.3. METHODS
FOR THE CHARACTERIZATION OF THE FILMS CONSTITUTION 25 6.3.1. X-RAYS
PHOTOELECTRON ANALYSIS (XPS) 25 6.3.2. X-RAY DIFFRACTION (XRD) 26 6.3.3.
TRANSMISSION ELECTRON MICROSCOPY (TEM) 28 6.4. SURFACE TOPOGRAPHY
CHARACTERIZATION 28 6.4.1. ATOMIC FORCE MICROSCOPY 28 6.4.2. OPTICAL
PROFILOMETRY 29 6.5. SEM AND EDX ANALYSIS OF THE FILMS 29 6.6.
CHARACTERIZATION OF THE MECHANICAL PROPERTIES 30 6.6.1. NANOINDENTATION
30 6.6.2. EVALUATION OF TRIBOLOGICAL PROPERTIES BY TRIBOMETER 35 6.6.3.
ADHESION MEASUREMENTS BY SCRATCH TEST METHOD 36 6.7. FILM THICKNESS
MEASUREMENTS BY THE BALL CRATER METHOD 37 6.8. APPLICATION ORIENTED
INVESTIGATIONS 38 TABLE OF CONTENTS 6.8.1. THERMAL SHOCK EXPERIMENTS 38
6.8.2. HIGH TEMPERATURE COMPRESSION TEST 39 RESULTS 42 7.1. OES PLASMA
ANALYSIS 42 7.2. INFLUENCE OF THE (O2+AICI3) CONTENT IN A GAS MIXTURE ON
THE GROWTH OF ALUMINA THIN FILMS 44 7.2.1. DEPOSITION PROCESS 44 7.2.2.
OES PLASMA ANALYSIS 47 7.2.3. CHEMICAL COMPOSITION AS MEASURED BY XPS 48
7.2.4. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 50 7.2.5. TEM
INVESTIGATIONS 51 7.2.6. TOPOGRAPHY OF THE DEPOSITED FILMS 53 7.2.7.
HARDNESS AND ELASTIC MODULUS EVALUATION 55 7.3. INFLUENCE OF THE
DEPOSITION TEMPERATURE 56 7.3.1. OES PLASMA ANALYSIS 57 7.3.2. ANALYSIS
OF THE CRYSTALLOGRAPHIC STRUCTURE 58 7.3.3. TOPOGRAPHY OF THE DEPOSITED
FILMS 61 7.3.4. HARDNESS AND ELASTIC MODULUS EVALUATION 64 7.4.
INFLUENCE OF AR CONTENT IN THE GAS MIXTURE 66 7.4.1. OES PLASMA ANALYSIS
66 7.4.2. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 68 7.4.3.
TOPOGRAPHY OF THE DEPOSITED FILMS 70 7.4.4. HARDNESS AND ELASTIC MODULUS
EVALUATION 72 7.5. INFLUENCE OF THEPRESSURE 74 7.5.1. OES PLASMA
ANALYSIS 74 7.5.2. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 75 7.5.3.
TOPOGRAPHY OF THE DEPOSITED FILMS 76 7.5.4. HARDNESS AND ELASTIC MODULUS
EVALUATION 77 7.6. INFLUENCE OF THE AICI3/O2 RATIO 78 7.6.1. OES PLASMA
ANALYSIS 78 7.6.2. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 80 7.6.3.
TOPOGRAPHY OF THE DEPOSITED FILMS 83 7.6.4. HARDNESS AND ELASTIC MODULUS
EVALUATION 85 TABLE OF CONTENTS III 7.7. INFLUENCE OF THE SUBSTRATE
MATERIALS 86 7.7.1. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 86 7.7.2.
TOPOGRAPHY OF THE DEPOSITED FILMS 87 7.8. INFLUENCE OF THE TEMPLATE
LAYER 88 7.8.1. ANALYSIS OF THE CRYSTALLOGRAPHIC STRUCTURE 88 7.8.2.
TOPOGRAPHY OF THE DEPOSITED FILMS 89 7.9. APPLICATION ORIENTED
INVESTIGATIONS 90 7.9.1. ADHESIONOF THE ALUMINA FILMS 90 7.9.2.
TRIBOLOGICAL PROPERTIES 91 7.9.3. THERMAL SHOCK RESISTANCE 92 7.9.4.
BEHAVIOROF THE ALUMINA FILMS IN THE HIGH TEMPERATURE COMPRESSION TESTS
94 8. DISCUSSION 98 8.1. PLASMA-SURFACE INTERACTION 98 8.2. INFLUENCE OF
THE (O2+AICI3) CONTENT IN THE GAS MIXTURE 101 8.2.1. GROWTH OFA-AL2O 3
FILMS UNDER ION IRRADIATION 105 8.3. INFLUENCE OF THE DEPOSITION
TEMPERATURE 109 8.4. INFLUENCE OF ARGON CONTENT IN THE GAS MIXTURE 110
8.5. INFLUENCE OF THE PRESSURE 112 8.6. INFLUENCE OF AICI3/O2 RATIO 113
8.7. DEPOSITION OF ALUMINA FILMS ON DIFFERENT SUBSTRATE MATERIALS 115
8.8. TEMPLATE INFLUENCE 116 8.9. APPLICATION ORIENTED INVESTIGATIONS 117
9. SUMMARY 121 10. OUTLOOK 124 11. BIBIIOGRAPHY 125 12. ACKNOWLEDGEMENTS
133 |
| any_adam_object | 1 |
| any_adam_object_boolean | 1 |
| author | Kurapov, Denis 1977- |
| author_GND | (DE-588)130201499 |
| author_facet | Kurapov, Denis 1977- |
| author_role | aut |
| author_sort | Kurapov, Denis 1977- |
| author_variant | d k dk |
| building | Verbundindex |
| bvnumber | BV021323398 |
| classification_tum | CHE 364d WER 312d |
| ctrlnum | (OCoLC)76773930 (DE-599)BVBBV021323398 |
| dewey-full | 540 |
| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 540 - Chemistry and allied sciences |
| dewey-raw | 540 |
| dewey-search | 540 |
| dewey-sort | 3540 |
| dewey-tens | 540 - Chemistry and allied sciences |
| discipline | Chemie / Pharmazie Chemie Werkstoffwissenschaften |
| discipline_str_mv | Chemie / Pharmazie Chemie Werkstoffwissenschaften |
| format | Thesis Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01977nam a2200505 cb4500</leader><controlfield tag="001">BV021323398</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20060209 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">060206s2005 gw ad|| m||| 00||| eng d</controlfield><datafield tag="015" ind1=" " ind2=" "><subfield code="a">05,N30,0617</subfield><subfield code="2">dnb</subfield></datafield><datafield tag="015" ind1=" " ind2=" "><subfield code="a">05,H10,0975</subfield><subfield code="2">dnb</subfield></datafield><datafield tag="016" ind1="7" ind2=" "><subfield code="a">975576100</subfield><subfield code="2">DE-101</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">3832241760</subfield><subfield code="c">kart. : EUR 45.80, sfr 91.60</subfield><subfield code="9">3-8322-4176-0</subfield></datafield><datafield tag="024" ind1="3" ind2=" "><subfield code="a">9783832241766</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)76773930</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV021323398</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="044" ind1=" " ind2=" "><subfield code="a">gw</subfield><subfield code="c">XA-DE-NW</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">540</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">CHE 364d</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">540</subfield><subfield code="2">sdnb</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">WER 312d</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Kurapov, Denis</subfield><subfield code="d">1977-</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)130201499</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Structure evolution, properties, and application of alumina films deposited by PECVD</subfield><subfield code="c">Denis Kurapov</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Aachen</subfield><subfield code="b">Shaker</subfield><subfield code="c">2005</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">III, 133 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield><subfield code="c">21 cm, 212 gr.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Materials chemistry dissertation</subfield><subfield code="v">2</subfield></datafield><datafield tag="502" ind1=" " ind2=" "><subfield code="a">Zugl.: Aachen, Techn. Hochsch., Diss., 2005</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Aluminiumoxide</subfield><subfield code="0">(DE-588)4001590-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">PECVD-Verfahren</subfield><subfield code="0">(DE-588)4267316-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)4113937-9</subfield><subfield code="a">Hochschulschrift</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Aluminiumoxide</subfield><subfield code="0">(DE-588)4001590-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">PECVD-Verfahren</subfield><subfield code="0">(DE-588)4267316-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Materials chemistry dissertation</subfield><subfield code="v">2</subfield><subfield code="w">(DE-604)BV021323383</subfield><subfield code="9">2</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">HEBIS Datenaustausch Darmstadt</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=014643764&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-014643764</subfield></datafield></record></collection> |
| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV021323398 |
| illustrated | Illustrated |
| index_date | 2024-07-02T13:59:35Z |
| indexdate | 2024-07-09T20:35:39Z |
| institution | BVB |
| isbn | 3832241760 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-014643764 |
| oclc_num | 76773930 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM |
| owner_facet | DE-91 DE-BY-TUM |
| physical | III, 133 S. Ill., graph. Darst. 21 cm, 212 gr. |
| publishDate | 2005 |
| publishDateSearch | 2005 |
| publishDateSort | 2005 |
| publisher | Shaker |
| record_format | marc |
| series | Materials chemistry dissertation |
| series2 | Materials chemistry dissertation |
| spelling | Kurapov, Denis 1977- Verfasser (DE-588)130201499 aut Structure evolution, properties, and application of alumina films deposited by PECVD Denis Kurapov Aachen Shaker 2005 III, 133 S. Ill., graph. Darst. 21 cm, 212 gr. txt rdacontent n rdamedia nc rdacarrier Materials chemistry dissertation 2 Zugl.: Aachen, Techn. Hochsch., Diss., 2005 Aluminiumoxide (DE-588)4001590-7 gnd rswk-swf PECVD-Verfahren (DE-588)4267316-1 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Aluminiumoxide (DE-588)4001590-7 s Dünne Schicht (DE-588)4136925-7 s PECVD-Verfahren (DE-588)4267316-1 s DE-604 Materials chemistry dissertation 2 (DE-604)BV021323383 2 HEBIS Datenaustausch Darmstadt application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=014643764&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Kurapov, Denis 1977- Structure evolution, properties, and application of alumina films deposited by PECVD Materials chemistry dissertation Aluminiumoxide (DE-588)4001590-7 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Dünne Schicht (DE-588)4136925-7 gnd |
| subject_GND | (DE-588)4001590-7 (DE-588)4267316-1 (DE-588)4136925-7 (DE-588)4113937-9 |
| title | Structure evolution, properties, and application of alumina films deposited by PECVD |
| title_auth | Structure evolution, properties, and application of alumina films deposited by PECVD |
| title_exact_search | Structure evolution, properties, and application of alumina films deposited by PECVD |
| title_exact_search_txtP | Structure evolution, properties, and application of alumina films deposited by PECVD |
| title_full | Structure evolution, properties, and application of alumina films deposited by PECVD Denis Kurapov |
| title_fullStr | Structure evolution, properties, and application of alumina films deposited by PECVD Denis Kurapov |
| title_full_unstemmed | Structure evolution, properties, and application of alumina films deposited by PECVD Denis Kurapov |
| title_short | Structure evolution, properties, and application of alumina films deposited by PECVD |
| title_sort | structure evolution properties and application of alumina films deposited by pecvd |
| topic | Aluminiumoxide (DE-588)4001590-7 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Dünne Schicht (DE-588)4136925-7 gnd |
| topic_facet | Aluminiumoxide PECVD-Verfahren Dünne Schicht Hochschulschrift |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=014643764&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| volume_link | (DE-604)BV021323383 |
| work_keys_str_mv | AT kurapovdenis structureevolutionpropertiesandapplicationofaluminafilmsdepositedbypecvd |